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Article: Design, fabrication and characterization of a Far-field Superlens

TitleDesign, fabrication and characterization of a Far-field Superlens
Authors
KeywordsD. Optical properties
B. Nanofabrications
A. Nanostructures
Issue Date2008
Citation
Solid State Communications, 2008, v. 146, n. 5-6, p. 202-207 How to Cite?
AbstractThe fabrication process as well as the optical characterization of a Far-field Superlens (FSL) is presented in detail. A FSL is capable of optically imaging well below the diffraction limit and works by enhancing and scattering evanescent waves to the far field which is then used to numerically reconstruct the object image [S. Durant, J. Opt. Soc. Am. B. 23(2006) 2383; Z. Liu, S. Durant, H. Lee, Y. Pikus, N. Fang, Y. Xiong, C. Sun, X. Zhang, Nano Lett. 7 (2007) 403]. We demonstrate the resolution of 70 nm gap distance of a three-line object in the far field. Also, a full optical imaging scheme, without the need for numerical processing, for a direct real-time subdiffraction-limited imaging is presented. Such remarkable imaging capability of FSL will revolutionize the optical imaging technique in the field of bio-imaging and nanolithography. © 2008 Elsevier Ltd. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/256962
ISSN
2017 Impact Factor: 1.549
2015 SCImago Journal Rankings: 0.776
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorLee, Hyesog-
dc.contributor.authorLiu, Zhaowei-
dc.contributor.authorXiong, Yi-
dc.contributor.authorSun, Cheng-
dc.contributor.authorZhang, Xiang-
dc.date.accessioned2018-07-24T08:58:27Z-
dc.date.available2018-07-24T08:58:27Z-
dc.date.issued2008-
dc.identifier.citationSolid State Communications, 2008, v. 146, n. 5-6, p. 202-207-
dc.identifier.issn0038-1098-
dc.identifier.urihttp://hdl.handle.net/10722/256962-
dc.description.abstractThe fabrication process as well as the optical characterization of a Far-field Superlens (FSL) is presented in detail. A FSL is capable of optically imaging well below the diffraction limit and works by enhancing and scattering evanescent waves to the far field which is then used to numerically reconstruct the object image [S. Durant, J. Opt. Soc. Am. B. 23(2006) 2383; Z. Liu, S. Durant, H. Lee, Y. Pikus, N. Fang, Y. Xiong, C. Sun, X. Zhang, Nano Lett. 7 (2007) 403]. We demonstrate the resolution of 70 nm gap distance of a three-line object in the far field. Also, a full optical imaging scheme, without the need for numerical processing, for a direct real-time subdiffraction-limited imaging is presented. Such remarkable imaging capability of FSL will revolutionize the optical imaging technique in the field of bio-imaging and nanolithography. © 2008 Elsevier Ltd. All rights reserved.-
dc.languageeng-
dc.relation.ispartofSolid State Communications-
dc.subjectD. Optical properties-
dc.subjectB. Nanofabrications-
dc.subjectA. Nanostructures-
dc.titleDesign, fabrication and characterization of a Far-field Superlens-
dc.typeArticle-
dc.description.natureLink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.ssc.2007.10.043-
dc.identifier.scopuseid_2-s2.0-41249087199-
dc.identifier.volume146-
dc.identifier.issue5-6-
dc.identifier.spage202-
dc.identifier.epage207-
dc.identifier.isiWOS:000255916100003-

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