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Article: Surface plasmon interference nanolithography

TitleSurface plasmon interference nanolithography
Authors
Issue Date2005
Citation
Nano Letters, 2005, v. 5, n. 5, p. 957-961 How to Cite?
AbstractA new nanophotolithography technique based on the interference of surface plasmon waves is proposed and demonstrated by using computer simulations. The wavelengths of the surface plasmon waves at metal and dielectric interfaces can reach the nanometer scale while their frequencies remain in the optical range. As a result, the resolution of this surface plasmon interference nanolithography (SPIN) can go far beyond the free-space diffraction limit of the light. Simulation results show that one-dimensional and two-dimensional periodical structures of 40-100 nm features can be patterned using interfering surface plasmons launched by 1D gratings. Detailed characteristics of SPIN such as field distribution and contrast are also investigated. © 2005 American Chemical Society.
Persistent Identifierhttp://hdl.handle.net/10722/256904
ISSN
2015 Impact Factor: 13.779
2015 SCImago Journal Rankings: 9.006

 

DC FieldValueLanguage
dc.contributor.authorLiu, Zhao Wei-
dc.contributor.authorWei, Qi Huo-
dc.contributor.authorZhang, Xiang-
dc.date.accessioned2018-07-24T08:58:17Z-
dc.date.available2018-07-24T08:58:17Z-
dc.date.issued2005-
dc.identifier.citationNano Letters, 2005, v. 5, n. 5, p. 957-961-
dc.identifier.issn1530-6984-
dc.identifier.urihttp://hdl.handle.net/10722/256904-
dc.description.abstractA new nanophotolithography technique based on the interference of surface plasmon waves is proposed and demonstrated by using computer simulations. The wavelengths of the surface plasmon waves at metal and dielectric interfaces can reach the nanometer scale while their frequencies remain in the optical range. As a result, the resolution of this surface plasmon interference nanolithography (SPIN) can go far beyond the free-space diffraction limit of the light. Simulation results show that one-dimensional and two-dimensional periodical structures of 40-100 nm features can be patterned using interfering surface plasmons launched by 1D gratings. Detailed characteristics of SPIN such as field distribution and contrast are also investigated. © 2005 American Chemical Society.-
dc.languageeng-
dc.relation.ispartofNano Letters-
dc.titleSurface plasmon interference nanolithography-
dc.typeArticle-
dc.description.natureLink_to_subscribed_fulltext-
dc.identifier.doi10.1021/nl0506094-
dc.identifier.pmid15884902-
dc.identifier.scopuseid_2-s2.0-19944402188-
dc.identifier.volume5-
dc.identifier.issue5-
dc.identifier.spage957-
dc.identifier.epage961-

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