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Article: Electrochemical characteristics of La-Ni-Al thin films

TitleElectrochemical characteristics of La-Ni-Al thin films
Authors
KeywordsMagnetron sputtering
Thin films
Discharge capacity
Electrochemical properties
Hydrogen storage
Issue Date2008
Citation
Journal of Alloys and Compounds, 2008, v. 456, n. 1-2, p. 407-412 How to Cite?
AbstractAB5 based hydrogen storage thin films (LaNi4.25Al0.75), deposited on Cu substrate by dc magnetron sputtering, have been investigated in this paper. X-ray diffraction (XRD) revealed that the microstructure of the film was in crystal form. SEM, AFM and FIB analyses proved that on the surface there were many pores of approximately 15-40 nm in diameter of random size. The cross section of the film revealed that it was rather dense and defect-free, with a uniform thickness of about 4.2 μm. Electrochemical properties of the films were measured by simulated battery tests. The single layer LaNi4.25Al0.75 film undergoes a longer activation period than typical AB5 alloys in bulk and the maximum discharge capacity of the film was about 220 mAh/g. Two electrochemical behaviour (distinct to the bulk materials) were observed for the film electrode in which there was an apparent increase in intermediate potential for each discharge process, as well as a local increase of discharge potential during its activation period. © 2007 Elsevier B.V. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/222616
ISSN
2015 Impact Factor: 3.014
2015 SCImago Journal Rankings: 1.006

 

DC FieldValueLanguage
dc.contributor.authorLi, Chi Ying Vanessa-
dc.contributor.authorWang, Zhong Min-
dc.contributor.authorLiu, Shi-
dc.contributor.authorChan, Sammy Lap Ip-
dc.date.accessioned2016-01-19T03:36:33Z-
dc.date.available2016-01-19T03:36:33Z-
dc.date.issued2008-
dc.identifier.citationJournal of Alloys and Compounds, 2008, v. 456, n. 1-2, p. 407-412-
dc.identifier.issn0925-8388-
dc.identifier.urihttp://hdl.handle.net/10722/222616-
dc.description.abstractAB5 based hydrogen storage thin films (LaNi4.25Al0.75), deposited on Cu substrate by dc magnetron sputtering, have been investigated in this paper. X-ray diffraction (XRD) revealed that the microstructure of the film was in crystal form. SEM, AFM and FIB analyses proved that on the surface there were many pores of approximately 15-40 nm in diameter of random size. The cross section of the film revealed that it was rather dense and defect-free, with a uniform thickness of about 4.2 μm. Electrochemical properties of the films were measured by simulated battery tests. The single layer LaNi4.25Al0.75 film undergoes a longer activation period than typical AB5 alloys in bulk and the maximum discharge capacity of the film was about 220 mAh/g. Two electrochemical behaviour (distinct to the bulk materials) were observed for the film electrode in which there was an apparent increase in intermediate potential for each discharge process, as well as a local increase of discharge potential during its activation period. © 2007 Elsevier B.V. All rights reserved.-
dc.languageeng-
dc.relation.ispartofJournal of Alloys and Compounds-
dc.subjectMagnetron sputtering-
dc.subjectThin films-
dc.subjectDischarge capacity-
dc.subjectElectrochemical properties-
dc.subjectHydrogen storage-
dc.titleElectrochemical characteristics of La-Ni-Al thin films-
dc.typeArticle-
dc.description.natureLink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.jallcom.2007.02.058-
dc.identifier.scopuseid_2-s2.0-41549126606-
dc.identifier.volume456-
dc.identifier.issue1-2-
dc.identifier.spage407-
dc.identifier.epage412-

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