File Download
Supplementary

postgraduate thesis: Fiber based interference lithography for large-area nanopatterning

TitleFiber based interference lithography for large-area nanopatterning
Authors
Issue Date2015
PublisherThe University of Hong Kong (Pokfulam, Hong Kong)
Citation
Qu, T. [屈拓]. (2015). Fiber based interference lithography for large-area nanopatterning. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b5610996
AbstractThe research work during my MPhil study, a fiber optic interference lithography system, is concluded and presented in this thesis. The first part of this thesis introduces the establishment of this system, which is named All-Fiber Interference Lithography (AFIL) due to its main novelty and advantages. These features benefit from fiber-optic components, instead of discrete optical components which tend to be bulky, expensive and vulnerable. As a result, the flexibility and usability of the two-beam laser interference lithography (LIL) could be greatly enhanced. A novel interference fringe stabilization technique that directly moves a piezoelectric actuated stage carrying one of the two fiber ends to compensate the relative phase shifts between two laser beams, was also realized by the hard ware circuits and software programming, so as to enable stable and long-time exposure. The second part of this thesis presents the systematic fabrication results. Two 2-inch diameter photoresist samples were fabricated with and without relative light phase stabilization. In addition to the atomic force microscopy (AFM) characterizations at different spots on the two samples, the relative phase shifts during the exposure and the light intensity distribution profiles were considered together to simulate the contrast of the patterns at different spots. Moreover, grating and complex periodic nanostructures with pitches as small as 240 nm were fabricated in photoresist coated on silicon and glass substrates with size up to 4-inch diameter. Challenges and operation procedures to obtain high-quality nanopatterns using AFIL are also emphasized in this part. The last part of this thesis briefly demonstrates a number of applications. The molds of novel three-level surface enhanced Raman spectroscopy (SERS) substrates were fabricated by double AFIL exposure, and followed by silver evaporation and ultraviolet nanoimprint lithography (UV-NIL) pattern transfer. The SERS signal and enhancement performance were evaluated. The AFIL photoresist nanopatterns on indium tin oxide (ITO) glass substrates could act as masks to electroplate nanostructured nickel for making high-temperature thermal nanoimprint molds. Besides, the soft lithography mold was fabricated through transferring the photoresist nanopatterns to Polydimethylsiloxane (PDMS).
DegreeMaster of Philosophy
SubjectPhotolithography
Dept/ProgramMechanical Engineering
Persistent Identifierhttp://hdl.handle.net/10722/221197

 

DC FieldValueLanguage
dc.contributor.authorQu, Tuo-
dc.contributor.author屈拓-
dc.date.accessioned2015-11-04T23:11:58Z-
dc.date.available2015-11-04T23:11:58Z-
dc.date.issued2015-
dc.identifier.citationQu, T. [屈拓]. (2015). Fiber based interference lithography for large-area nanopatterning. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b5610996-
dc.identifier.urihttp://hdl.handle.net/10722/221197-
dc.description.abstractThe research work during my MPhil study, a fiber optic interference lithography system, is concluded and presented in this thesis. The first part of this thesis introduces the establishment of this system, which is named All-Fiber Interference Lithography (AFIL) due to its main novelty and advantages. These features benefit from fiber-optic components, instead of discrete optical components which tend to be bulky, expensive and vulnerable. As a result, the flexibility and usability of the two-beam laser interference lithography (LIL) could be greatly enhanced. A novel interference fringe stabilization technique that directly moves a piezoelectric actuated stage carrying one of the two fiber ends to compensate the relative phase shifts between two laser beams, was also realized by the hard ware circuits and software programming, so as to enable stable and long-time exposure. The second part of this thesis presents the systematic fabrication results. Two 2-inch diameter photoresist samples were fabricated with and without relative light phase stabilization. In addition to the atomic force microscopy (AFM) characterizations at different spots on the two samples, the relative phase shifts during the exposure and the light intensity distribution profiles were considered together to simulate the contrast of the patterns at different spots. Moreover, grating and complex periodic nanostructures with pitches as small as 240 nm were fabricated in photoresist coated on silicon and glass substrates with size up to 4-inch diameter. Challenges and operation procedures to obtain high-quality nanopatterns using AFIL are also emphasized in this part. The last part of this thesis briefly demonstrates a number of applications. The molds of novel three-level surface enhanced Raman spectroscopy (SERS) substrates were fabricated by double AFIL exposure, and followed by silver evaporation and ultraviolet nanoimprint lithography (UV-NIL) pattern transfer. The SERS signal and enhancement performance were evaluated. The AFIL photoresist nanopatterns on indium tin oxide (ITO) glass substrates could act as masks to electroplate nanostructured nickel for making high-temperature thermal nanoimprint molds. Besides, the soft lithography mold was fabricated through transferring the photoresist nanopatterns to Polydimethylsiloxane (PDMS).-
dc.languageeng-
dc.publisherThe University of Hong Kong (Pokfulam, Hong Kong)-
dc.relation.ispartofHKU Theses Online (HKUTO)-
dc.rightsThe author retains all proprietary rights, (such as patent rights) and the right to use in future works.-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.subject.lcshPhotolithography-
dc.titleFiber based interference lithography for large-area nanopatterning-
dc.typePG_Thesis-
dc.identifier.hkulb5610996-
dc.description.thesisnameMaster of Philosophy-
dc.description.thesislevelMaster-
dc.description.thesisdisciplineMechanical Engineering-
dc.description.naturepublished_or_final_version-

Export via OAI-PMH Interface in XML Formats


OR


Export to Other Non-XML Formats