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Book Chapter: Theoretical Pore Growth Models for Nanoporous Alumina

TitleTheoretical Pore Growth Models for Nanoporous Alumina
Authors
Issue Date2015
PublisherSpringer
Citation
Theoretical Pore Growth Models for Nanoporous Alumina. In Dusan Losic & Abel Santos (Eds.), Nanoporous Alumina: Fabrication, Structure, Properties and Applications, p. 31-60. Cham: Springer, 2015 How to Cite?
AbstractNanoporous alumina has been extensively used in a wide range of applications, including template materials for various types of nanomaterials, high surface-area structures for energy conversation and storage, bio/chemo sensors, electronic/photonic devices, and so on. However, the formation mechanism of the nanopores and the subsequent pore growth process towards self-ordered pore arrangements have been under investigation for several decades without clear conclusions. The present models may be divided into two main groups in terms of the driving force for pore initialization, as well as the subsequent pore growth process. One group considers that the driving force is the high electric field across the oxide barrier layer at the bottom of the pore channels, which assists metal oxidation at the metal/oxide interface, and oxide dissolution at the oxide/electrolyte interface. The other group of models assumes that the driving force is mechanical stress originating from the volume expansion of the metal oxidation process. This chapter reviews the development of these models for nanoporous alumina formation, and discusses their advantages and shortcomings. A recent model proposed by us is also described, and potential directions for further development are discussed.
Persistent Identifierhttp://hdl.handle.net/10722/218352
ISBN
ISSN
2020 SCImago Journal Rankings: 0.154

 

DC FieldValueLanguage
dc.contributor.authorCheng, C-
dc.contributor.authorNgan, AHW-
dc.date.accessioned2015-09-18T06:34:43Z-
dc.date.available2015-09-18T06:34:43Z-
dc.date.issued2015-
dc.identifier.citationTheoretical Pore Growth Models for Nanoporous Alumina. In Dusan Losic & Abel Santos (Eds.), Nanoporous Alumina: Fabrication, Structure, Properties and Applications, p. 31-60. Cham: Springer, 2015-
dc.identifier.isbn9783319203331-
dc.identifier.issn0933-033X-
dc.identifier.urihttp://hdl.handle.net/10722/218352-
dc.description.abstractNanoporous alumina has been extensively used in a wide range of applications, including template materials for various types of nanomaterials, high surface-area structures for energy conversation and storage, bio/chemo sensors, electronic/photonic devices, and so on. However, the formation mechanism of the nanopores and the subsequent pore growth process towards self-ordered pore arrangements have been under investigation for several decades without clear conclusions. The present models may be divided into two main groups in terms of the driving force for pore initialization, as well as the subsequent pore growth process. One group considers that the driving force is the high electric field across the oxide barrier layer at the bottom of the pore channels, which assists metal oxidation at the metal/oxide interface, and oxide dissolution at the oxide/electrolyte interface. The other group of models assumes that the driving force is mechanical stress originating from the volume expansion of the metal oxidation process. This chapter reviews the development of these models for nanoporous alumina formation, and discusses their advantages and shortcomings. A recent model proposed by us is also described, and potential directions for further development are discussed.-
dc.languageeng-
dc.publisherSpringer-
dc.relation.ispartofNanoporous Alumina: Fabrication, Structure, Properties and Applications-
dc.rightsThe final publication is available at Springer via http://dx.doi.org/10.1007/978-3-319-20334-8_2-
dc.titleTheoretical Pore Growth Models for Nanoporous Alumina-
dc.typeBook_Chapter-
dc.identifier.emailNgan, AHW: hwngan@hku.hk-
dc.identifier.authorityNgan, AHW=rp00225-
dc.description.naturepostprint-
dc.identifier.doi10.1007/978-3-319-20334-8_2-
dc.identifier.scopuseid_2-s2.0-84937397926-
dc.identifier.hkuros251863-
dc.identifier.spage31-
dc.identifier.epage60-
dc.identifier.eissn2196-2812-
dc.publisher.placeCham-
dc.identifier.issnl0933-033X-

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