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Article: Additive free co-deposition of nanocrystalline copper/cuprous oxide by electrodeposition

TitleAdditive free co-deposition of nanocrystalline copper/cuprous oxide by electrodeposition
Authors
Issue Date2015
PublisherElectrochemical Society, Inc. The Journal's web site is located at http://ojps.aip.org/JES
Citation
Journal of the Electrochemical Society, 2015, v. 162 n. 3, p. D124-D128 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/211536
ISSN
2015 Impact Factor: 3.014
2015 SCImago Journal Rankings: 1.157

 

DC FieldValueLanguage
dc.contributor.authorNg, SY-
dc.contributor.authorNgan, AHW-
dc.date.accessioned2015-07-16T08:00:46Z-
dc.date.available2015-07-16T08:00:46Z-
dc.date.issued2015-
dc.identifier.citationJournal of the Electrochemical Society, 2015, v. 162 n. 3, p. D124-D128-
dc.identifier.issn0013-4651-
dc.identifier.urihttp://hdl.handle.net/10722/211536-
dc.languageeng-
dc.publisherElectrochemical Society, Inc. The Journal's web site is located at http://ojps.aip.org/JES-
dc.relation.ispartofJournal of the Electrochemical Society-
dc.rightsJournal of the Electrochemical Society. Copyright © Electrochemical Society, Inc.-
dc.rights© The Electrochemical Society, Inc. 2015. All rights reserved. Except as provided under U.S. copyright law, this work may not be reproduced, resold, distributed, or modified without the express permission of The Electrochemical Society (ECS). The archival version of this work was published in Journal of the Electrochemical Society, 2015, v. 162 n. 3, p. D124-D128-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.titleAdditive free co-deposition of nanocrystalline copper/cuprous oxide by electrodeposition-
dc.typeArticle-
dc.identifier.emailNgan, AHW: hwngan@hku.hk-
dc.identifier.authorityNgan, AHW=rp00225-
dc.description.naturepostprint-
dc.identifier.doi10.1149/2.0571503jes-
dc.identifier.hkuros244357-
dc.identifier.volume162-
dc.identifier.issue3-
dc.identifier.spageD124-
dc.identifier.epageD128-
dc.publisher.placeUnited States-

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