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Article: Effect of Field Cooling Process and Ion-Beam Bombardment on the Exchange Bias of NiCo/(Ni,Co)O Bilayers

TitleEffect of Field Cooling Process and Ion-Beam Bombardment on the Exchange Bias of NiCo/(Ni,Co)O Bilayers
Authors
Issue Date2014
PublisherElsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsf
Citation
Thin Solid Films, 2014, v. 570 n. pt. B, p. 383-389 How to Cite?
AbstractThe research on exchange coupled ferromagnetic/antiferromagnetic (FM/AF) bilayers has been the foundation of spintronic applications such as hard disk reading heads and spin torque oscillators. In order to further explore the exchange bias behavior of NiCo/(Ni, Co)O bilayers, effect of field cooling process, magnetic angular dependence, and ion-beam bombardment was investigated. The difference in film composition resulted in remarkable distinction in crystalline structures and domain patterns. The exchange bias field (Hex) in the bilayer systems exhibited a strong angular dependence. The negative Hex after a field cooling process indicated that the polarity of Hex can be defined by aligning the magnetization orientation of the FM NiCo layer with the applied field. Moreover, enhanced exchange bias effect was observed in the NiCo/(Ni, Co)O bilayers that resulted from the surface of the (Ni, Co)O layers bombarded with different Ar+ ion-beam energies using End-Hall voltages from 0 V to 150 V. The interface spin structures as well as the surface domain patterns were altered by the ion-beam bombardment process. These results indicated that the exchange bias field of NiCo/(Ni, Co)O bilayer systems could be tailored by field cooling process, angular dependence of magnetic properties, and post ion-beam bombardment.
Persistent Identifierhttp://hdl.handle.net/10722/202808
ISSN
2015 Impact Factor: 1.761
2015 SCImago Journal Rankings: 0.726

 

DC FieldValueLanguage
dc.contributor.authorLi, X-
dc.contributor.authorLin, KW-
dc.contributor.authorLiu, HY-
dc.contributor.authorWei, DH-
dc.contributor.authorLi, GJ-
dc.contributor.authorPong, PWT-
dc.date.accessioned2014-09-19T10:07:57Z-
dc.date.available2014-09-19T10:07:57Z-
dc.date.issued2014-
dc.identifier.citationThin Solid Films, 2014, v. 570 n. pt. B, p. 383-389-
dc.identifier.issn0040-6090-
dc.identifier.urihttp://hdl.handle.net/10722/202808-
dc.description.abstractThe research on exchange coupled ferromagnetic/antiferromagnetic (FM/AF) bilayers has been the foundation of spintronic applications such as hard disk reading heads and spin torque oscillators. In order to further explore the exchange bias behavior of NiCo/(Ni, Co)O bilayers, effect of field cooling process, magnetic angular dependence, and ion-beam bombardment was investigated. The difference in film composition resulted in remarkable distinction in crystalline structures and domain patterns. The exchange bias field (Hex) in the bilayer systems exhibited a strong angular dependence. The negative Hex after a field cooling process indicated that the polarity of Hex can be defined by aligning the magnetization orientation of the FM NiCo layer with the applied field. Moreover, enhanced exchange bias effect was observed in the NiCo/(Ni, Co)O bilayers that resulted from the surface of the (Ni, Co)O layers bombarded with different Ar+ ion-beam energies using End-Hall voltages from 0 V to 150 V. The interface spin structures as well as the surface domain patterns were altered by the ion-beam bombardment process. These results indicated that the exchange bias field of NiCo/(Ni, Co)O bilayer systems could be tailored by field cooling process, angular dependence of magnetic properties, and post ion-beam bombardment.-
dc.languageeng-
dc.publisherElsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsf-
dc.relation.ispartofThin Solid Films-
dc.titleEffect of Field Cooling Process and Ion-Beam Bombardment on the Exchange Bias of NiCo/(Ni,Co)O Bilayers-
dc.typeArticle-
dc.identifier.emailPong, PWT: ppong@eee.hku.hk-
dc.identifier.authorityPong, PWT=rp00217-
dc.identifier.doi10.1016/j.tsf.2014.03.032-
dc.identifier.hkuros235670-
dc.identifier.volume570-
dc.identifier.issuept. B-
dc.identifier.spage383-
dc.identifier.epage389-
dc.publisher.placeSwitzerland-

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