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- Publisher Website: 10.1007/978-3-319-06998-2_5
- Scopus: eid_2-s2.0-84927624812
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Book Chapter: Hybrid Nanoimprint-Soft Lithography for Highly Curved Surface with Sub-15 nm Resolution
| Title | Hybrid Nanoimprint-Soft Lithography for Highly Curved Surface with Sub-15 nm Resolution |
|---|---|
| Authors | |
| Issue Date | 2014 |
| Publisher | Springer |
| Citation | Hybrid Nanoimprint-Soft Lithography for Highly Curved Surface with Sub-15 nm Resolution. In Cusano, A ... (et al) (Eds.), Lab-on-Fiber Technology, p. 91-109. Cham: Springer, 2014 How to Cite? |
| Abstract | Nanoimprint lithography is a high-resolution, high-throughput and low-cost technology to pattern nanostructure, but it only works well on planar surface. To solve this issue, a hybrid nanoimprint-soft Lithography (HNSL) was developed to pattern nanostructures on highly curved surfaces (e.g. the sidewall of an optical fiber). Moreover, double transfer UV-curing nanoimprint lithography, an improved version of HNSL, was introduced to enable high fidelity pattern transfer. Optical fibers can be patterned using this technology, and that opened the door to numerous applications. |
| Persistent Identifier | http://hdl.handle.net/10722/201927 |
| ISBN | |
| ISSN | 2019 SCImago Journal Rankings: 0.110 |
| Series/Report no. | Springer Series in Surface Sciences, vol. 56 |
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ge, HX | en_US |
| dc.contributor.author | Wu, W | en_US |
| dc.contributor.author | Li, W | en_US |
| dc.date.accessioned | 2014-08-21T07:49:46Z | - |
| dc.date.available | 2014-08-21T07:49:46Z | - |
| dc.date.issued | 2014 | en_US |
| dc.identifier.citation | Hybrid Nanoimprint-Soft Lithography for Highly Curved Surface with Sub-15 nm Resolution. In Cusano, A ... (et al) (Eds.), Lab-on-Fiber Technology, p. 91-109. Cham: Springer, 2014 | en_US |
| dc.identifier.isbn | 9783319069975 | en_US |
| dc.identifier.issn | 0931-5195 | - |
| dc.identifier.uri | http://hdl.handle.net/10722/201927 | - |
| dc.description.abstract | Nanoimprint lithography is a high-resolution, high-throughput and low-cost technology to pattern nanostructure, but it only works well on planar surface. To solve this issue, a hybrid nanoimprint-soft Lithography (HNSL) was developed to pattern nanostructures on highly curved surfaces (e.g. the sidewall of an optical fiber). Moreover, double transfer UV-curing nanoimprint lithography, an improved version of HNSL, was introduced to enable high fidelity pattern transfer. Optical fibers can be patterned using this technology, and that opened the door to numerous applications. | - |
| dc.language | eng | en_US |
| dc.publisher | Springer | en_US |
| dc.relation.ispartof | Lab-on-Fiber Technology | en_US |
| dc.relation.ispartofseries | Springer Series in Surface Sciences, vol. 56 | - |
| dc.title | Hybrid Nanoimprint-Soft Lithography for Highly Curved Surface with Sub-15 nm Resolution | en_US |
| dc.type | Book_Chapter | en_US |
| dc.identifier.email | Li, W: liwd@hku.hk | en_US |
| dc.identifier.authority | Li, W=rp01581 | en_US |
| dc.identifier.doi | 10.1007/978-3-319-06998-2_5 | - |
| dc.identifier.scopus | eid_2-s2.0-84927624812 | - |
| dc.identifier.hkuros | 234715 | en_US |
| dc.identifier.spage | 91 | - |
| dc.identifier.epage | 109 | - |
| dc.publisher.place | Cham | - |
| dc.identifier.issnl | 0931-5195 | - |