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Book Chapter: Hybrid Nanoimprint-Soft Lithography for Highly Curved Surface with Sub-15 nm Resolution

TitleHybrid Nanoimprint-Soft Lithography for Highly Curved Surface with Sub-15 nm Resolution
Authors
Issue Date2014
PublisherSpringer
Citation
Hybrid Nanoimprint-Soft Lithography for Highly Curved Surface with Sub-15 nm Resolution. In Cusano, A ... (et al) (Eds.), Lab-on-Fiber Technology, p. 91-109. Cham: Springer, 2014 How to Cite?
AbstractNanoimprint lithography is a high-resolution, high-throughput and low-cost technology to pattern nanostructure, but it only works well on planar surface. To solve this issue, a hybrid nanoimprint-soft Lithography (HNSL) was developed to pattern nanostructures on highly curved surfaces (e.g. the sidewall of an optical fiber). Moreover, double transfer UV-curing nanoimprint lithography, an improved version of HNSL, was introduced to enable high fidelity pattern transfer. Optical fibers can be patterned using this technology, and that opened the door to numerous applications.
Persistent Identifierhttp://hdl.handle.net/10722/201927
ISBN
Series/Report no.Springer Series in Surface Sciences, vol. 56

 

DC FieldValueLanguage
dc.contributor.authorGe, HXen_US
dc.contributor.authorWu, Wen_US
dc.contributor.authorLi, Wen_US
dc.date.accessioned2014-08-21T07:49:46Z-
dc.date.available2014-08-21T07:49:46Z-
dc.date.issued2014en_US
dc.identifier.citationHybrid Nanoimprint-Soft Lithography for Highly Curved Surface with Sub-15 nm Resolution. In Cusano, A ... (et al) (Eds.), Lab-on-Fiber Technology, p. 91-109. Cham: Springer, 2014en_US
dc.identifier.isbn9783319069975en_US
dc.identifier.urihttp://hdl.handle.net/10722/201927-
dc.description.abstractNanoimprint lithography is a high-resolution, high-throughput and low-cost technology to pattern nanostructure, but it only works well on planar surface. To solve this issue, a hybrid nanoimprint-soft Lithography (HNSL) was developed to pattern nanostructures on highly curved surfaces (e.g. the sidewall of an optical fiber). Moreover, double transfer UV-curing nanoimprint lithography, an improved version of HNSL, was introduced to enable high fidelity pattern transfer. Optical fibers can be patterned using this technology, and that opened the door to numerous applications.-
dc.languageengen_US
dc.publisherSpringeren_US
dc.relation.ispartofLab-on-Fiber Technologyen_US
dc.relation.ispartofseriesSpringer Series in Surface Sciences, vol. 56-
dc.titleHybrid Nanoimprint-Soft Lithography for Highly Curved Surface with Sub-15 nm Resolutionen_US
dc.typeBook_Chapteren_US
dc.identifier.emailLi, W: liwd@hku.hken_US
dc.identifier.authorityLi, W=rp01581en_US
dc.identifier.doi10.1007/978-3-319-06998-2_5-
dc.identifier.hkuros234715en_US
dc.identifier.spage91-
dc.identifier.epage109-
dc.publisher.placeCham-

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