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Article: Double transfer UV-curing nanoimprint lithography

TitleDouble transfer UV-curing nanoimprint lithography
Authors
Issue Date2013
Citation
Nanotechnology, 2013, v. 24 n. 46 How to Cite?
AbstractA challenge in the fabrication of nanostructures into non-planar substrates is to form a thin, uniform resist film on non-planar surfaces. This is critical to the fabrication of nanostructures via a lithographic technique due to the subsequent pattern transfer process. Here we report a new double transfer UV-curing nanoimprint technique that can create a nanopatterned thin film with a uniform residual layer not only on flat substrates but also on highly curved surfaces. Surface relief gratings with pitches down to 200 nm are successfully imprinted on the cylindrical surface of optical fibers, and further transferred into a SiO2 matrix using reactive ion etching (RIE), demonstrating that our technique is applicable for fabricating high-resolution nanostructures on non-planar substrates.
Persistent Identifierhttp://hdl.handle.net/10722/200678
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorShen, YMen_US
dc.contributor.authorYao, Len_US
dc.contributor.authorLi, ZWen_US
dc.contributor.authorKou, JLen_US
dc.contributor.authorCui, YSen_US
dc.contributor.authorBian, Jen_US
dc.contributor.authorYuan, CSen_US
dc.contributor.authorGe, HXen_US
dc.contributor.authorLi, Wen_US
dc.contributor.authorWu, Wen_US
dc.contributor.authorChen, YFen_US
dc.date.accessioned2014-08-21T06:54:19Z-
dc.date.available2014-08-21T06:54:19Z-
dc.date.issued2013en_US
dc.identifier.citationNanotechnology, 2013, v. 24 n. 46en_US
dc.identifier.urihttp://hdl.handle.net/10722/200678-
dc.description.abstractA challenge in the fabrication of nanostructures into non-planar substrates is to form a thin, uniform resist film on non-planar surfaces. This is critical to the fabrication of nanostructures via a lithographic technique due to the subsequent pattern transfer process. Here we report a new double transfer UV-curing nanoimprint technique that can create a nanopatterned thin film with a uniform residual layer not only on flat substrates but also on highly curved surfaces. Surface relief gratings with pitches down to 200 nm are successfully imprinted on the cylindrical surface of optical fibers, and further transferred into a SiO2 matrix using reactive ion etching (RIE), demonstrating that our technique is applicable for fabricating high-resolution nanostructures on non-planar substrates.en_US
dc.languageengen_US
dc.relation.ispartofNanotechnologyen_US
dc.titleDouble transfer UV-curing nanoimprint lithographyen_US
dc.typeArticleen_US
dc.identifier.emailLi, W: liwd@hku.hken_US
dc.identifier.authorityLi, W=rp01581en_US
dc.identifier.doi10.1088/0957-4484/24/46/465304en_US
dc.identifier.pmid24164740-
dc.identifier.hkuros234707en_US
dc.identifier.volume24en_US
dc.identifier.issue46en_US
dc.identifier.isiWOS:000326714100011-

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