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Article: Efficient source mask optimization with Zernike polynomial functions for source representation

TitleEfficient source mask optimization with Zernike polynomial functions for source representation
Authors
Issue Date2014
PublisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.org
Citation
Optics Express, 2014, v. 22 n. 4, p. 3924-3937 How to Cite?
AbstractIn 22nm optical lithography and beyond, source mask optimization (SMO) becomes vital for the continuation of advanced ArF technology node development. The pixel-based method permits a large solution space, but involves a time-consuming optimization procedure because of the large number of pixel variables. In this paper, we introduce the Zernike polynomials as basis functions to represent the source patterns, and propose an improved SMO algorithm with this representation. The source patterns are decomposed into the weighted superposition of some well-chosen Zernike polynomial functions, and the number of variables decreases significantly. We compare the computation efficiency and optimization performance between the proposed method and the conventional pixel-based algorithm. Simulation results demonstrate that the former can obtain substantial speedup of source optimization while improving the pattern fidelity at the same time.
Persistent Identifierhttp://hdl.handle.net/10722/200622
ISSN
2015 Impact Factor: 3.148
2015 SCImago Journal Rankings: 2.186
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorWu, Xen_US
dc.contributor.authorLiu, Sen_US
dc.contributor.authorLi, Jen_US
dc.contributor.authorLam, EYMen_US
dc.date.accessioned2014-08-21T06:52:43Z-
dc.date.available2014-08-21T06:52:43Z-
dc.date.issued2014en_US
dc.identifier.citationOptics Express, 2014, v. 22 n. 4, p. 3924-3937en_US
dc.identifier.issn1094-4087-
dc.identifier.urihttp://hdl.handle.net/10722/200622-
dc.description.abstractIn 22nm optical lithography and beyond, source mask optimization (SMO) becomes vital for the continuation of advanced ArF technology node development. The pixel-based method permits a large solution space, but involves a time-consuming optimization procedure because of the large number of pixel variables. In this paper, we introduce the Zernike polynomials as basis functions to represent the source patterns, and propose an improved SMO algorithm with this representation. The source patterns are decomposed into the weighted superposition of some well-chosen Zernike polynomial functions, and the number of variables decreases significantly. We compare the computation efficiency and optimization performance between the proposed method and the conventional pixel-based algorithm. Simulation results demonstrate that the former can obtain substantial speedup of source optimization while improving the pattern fidelity at the same time.-
dc.languageengen_US
dc.publisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.org-
dc.relation.ispartofOptics Expressen_US
dc.rightsOptics Express. Copyright © Optical Society of America.-
dc.rightsThis paper was published in Optics Express and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: http://www.opticsinfobase.org/oe/abstract.cfm?uri=oe-22-4-3924. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.titleEfficient source mask optimization with Zernike polynomial functions for source representationen_US
dc.typeArticleen_US
dc.identifier.emailLam, EYM: elam@eee.hku.hken_US
dc.identifier.authorityLam, EYM=rp00131en_US
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.1364/OE.22.003924-
dc.identifier.pmid24663713-
dc.identifier.hkuros233674en_US
dc.identifier.volume22-
dc.identifier.issue4-
dc.identifier.spage3924-
dc.identifier.epage3937-
dc.identifier.isiWOS:000332520000023-
dc.publisher.placeUnited States-

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