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Conference Paper: Efficient source mask optimization with Zernike polynomial function-based source representation

TitleEfficient source mask optimization with Zernike polynomial function-based source representation
Authors
Issue Date2013
PublisherThe Optical Society (OSA).
Citation
The 6th International Photonics and OptoElectronics Meetings (POEM), Wuhan, China, 24-27 May 2013, p. abstract no. NSa3A.15 How to Cite?
AbstractThis paper introduces a Zernike polynomial function-based source representation method for the aerial image calculation of optical lithography. It is shown that this representation enables computation reduction for both mask optimization and source optimization.
DescriptionMeeting: Nanophotonics, Nanoelectronics and Nanosensor (N3)
Poster Session
Persistent Identifierhttp://hdl.handle.net/10722/186797

 

DC FieldValueLanguage
dc.contributor.authorWu, Xen_US
dc.contributor.authorLiu, Sen_US
dc.contributor.authorLi, Jen_US
dc.contributor.authorLam, EYMen_US
dc.date.accessioned2013-08-20T12:19:33Z-
dc.date.available2013-08-20T12:19:33Z-
dc.date.issued2013en_US
dc.identifier.citationThe 6th International Photonics and OptoElectronics Meetings (POEM), Wuhan, China, 24-27 May 2013, p. abstract no. NSa3A.15en_US
dc.identifier.urihttp://hdl.handle.net/10722/186797-
dc.descriptionMeeting: Nanophotonics, Nanoelectronics and Nanosensor (N3)-
dc.descriptionPoster Session-
dc.description.abstractThis paper introduces a Zernike polynomial function-based source representation method for the aerial image calculation of optical lithography. It is shown that this representation enables computation reduction for both mask optimization and source optimization.-
dc.languageengen_US
dc.publisherThe Optical Society (OSA).-
dc.relation.ispartofInternational Photonics and OptoElectronics Meetings (POEM)en_US
dc.titleEfficient source mask optimization with Zernike polynomial function-based source representationen_US
dc.typeConference_Paperen_US
dc.identifier.emailLam, EYM: elam@eee.hku.hken_US
dc.identifier.authorityLam, EYM=rp00131en_US
dc.identifier.hkuros220503en_US
dc.identifier.spageabstract no. NSa3A.15-
dc.identifier.epageabstract no. NSa3A.15-
dc.publisher.placeUnited States-

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