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Article: Recovery of clean ordered (1 1 1) surface of etched silicon

TitleRecovery of clean ordered (1 1 1) surface of etched silicon
Authors
Issue Date2013
PublisherElsevier B.V.. The Journal's web site is located at http://www.elsevier.com/locate/apsusc
Citation
Applied Surface Science, 2013, v. 282, p. 156-160 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/186183
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorNg, AMCen_US
dc.contributor.authorDong, Len_US
dc.contributor.authorHo, WKen_US
dc.contributor.authorDjurisic, Aen_US
dc.contributor.authorXie, MHen_US
dc.contributor.authorWu, HSen_US
dc.contributor.authorLin, Nen_US
dc.contributor.authorTong, DSYen_US
dc.date.accessioned2013-08-20T11:57:32Z-
dc.date.available2013-08-20T11:57:32Z-
dc.date.issued2013en_US
dc.identifier.citationApplied Surface Science, 2013, v. 282, p. 156-160en_US
dc.identifier.urihttp://hdl.handle.net/10722/186183-
dc.languageengen_US
dc.publisherElsevier B.V.. The Journal's web site is located at http://www.elsevier.com/locate/apsuscen_US
dc.relation.ispartofApplied Surface Scienceen_US
dc.titleRecovery of clean ordered (1 1 1) surface of etched siliconen_US
dc.typeArticleen_US
dc.identifier.emailNg, AMC: alanalfa@hku.hken_US
dc.identifier.emailHo, WK: howk@hku.hken_US
dc.identifier.emailDjurisic, A: dalek@hku.hken_US
dc.identifier.emailXie, MH: mhxie@hku.hken_US
dc.identifier.emailWu, HS: hswu@hkucc.hku.hken_US
dc.identifier.emailTong, DSY: dsytong@hkucc.hku.hken_US
dc.identifier.authorityDjurisic, A=rp00690en_US
dc.identifier.authorityXie, MH=rp00818en_US
dc.identifier.authorityWu, HS=rp00813en_US
dc.identifier.doi10.1016/j.apsusc.2013.05.092-
dc.identifier.hkuros219901en_US
dc.identifier.volume282en_US
dc.identifier.spage156en_US
dc.identifier.epage160en_US
dc.identifier.isiWOS:000322314800023-
dc.publisher.placeAmsterdamen_US

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