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Article: Efficient source and mask optimization with augmented Lagrangian methods in optical lithography

TitleEfficient source and mask optimization with augmented Lagrangian methods in optical lithography
Authors
Issue Date2013
Citation
Optics Express, 2013, v. 21, p. 8076-8090 How to Cite?
Persistent Identifierhttp://hdl.handle.net/10722/185912
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorLI, Jen_US
dc.contributor.authorLiu, Sen_US
dc.contributor.authorLam, EYMen_US
dc.date.accessioned2013-08-20T11:44:24Z-
dc.date.available2013-08-20T11:44:24Z-
dc.date.issued2013en_US
dc.identifier.citationOptics Express, 2013, v. 21, p. 8076-8090en_US
dc.identifier.urihttp://hdl.handle.net/10722/185912-
dc.languageengen_US
dc.relation.ispartofOptics Expressen_US
dc.titleEfficient source and mask optimization with augmented Lagrangian methods in optical lithographyen_US
dc.typeArticleen_US
dc.identifier.emailLam, EYM: elam@eee.hku.hken_US
dc.identifier.authorityLam, EYM=rp00131en_US
dc.identifier.doi10.1364/OE.21.008076-
dc.identifier.pmid23571898-
dc.identifier.hkuros220482en_US
dc.identifier.volume21en_US
dc.identifier.spage8076en_US
dc.identifier.epage8090en_US
dc.identifier.isiWOS:000317659300024-

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