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Article: Use of reverse osmosis membranes to remove perfluorooctane sulfonate (PFOS) from semiconductor wastewater

TitleUse of reverse osmosis membranes to remove perfluorooctane sulfonate (PFOS) from semiconductor wastewater
Authors
Issue Date2006
PublisherAmerican Chemical Society. The Journal's web site is located at http://pubs.acs.org/est
Citation
Environmental Science And Technology, 2006, v. 40 n. 23, p. 7343-7349 How to Cite?
AbstractPerfluorooctane sulfonate (PFOS) and related substances are persistent, bioaccumulative, and toxic, and thus of substantial environmental concern. PFOS is an essential photolithographic chemical in the semiconductor industry with no substitutes yet identified. The industry seeks effective treatment technologies. The feasibility of using reverse osmosis (RO) membranes for treating semiconductor wastewater containing PFOS has been investigated. Commercial RO membranes were characterized in terms of permeability, salt rejection, scanning electron microscopy (SEM), transmission electron microscopy (TEM), and membrane surface zeta potential (streaming potential measurements). Filtration tests were performed to determine the membrane flux and PFOS rejection. Over a wide range of feed concentrations (0.5 - 1500 ppm), the RO membranes generally rejected 99% or more of the PFOS. Rejection was better for tighter membranes, but was not affected by membrane zeta potential. Flux decreased with increasing PFOS concentration. While the flux reduction was severe for a loose RO membrane probably due to its higher initial flux, very stable flux was maintained for tighter membranes. At a very high feed concentration (about 500 ppm), all the membranes exhibited an identical stable flux. Isopropyl alcohol, present in some semiconductor wastewaters, had a detrimental effect on membrane flux. Where present it needs to be removed from the wastewater prior to using RO membranes. © 2006 American Chemical Society.
Persistent Identifierhttp://hdl.handle.net/10722/185373
ISSN
2015 Impact Factor: 5.393
2015 SCImago Journal Rankings: 2.664
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorTang, CYen_US
dc.contributor.authorFu, QSen_US
dc.contributor.authorRobertson, APen_US
dc.contributor.authorCriddle, CSen_US
dc.contributor.authorLeckie, JOen_US
dc.date.accessioned2013-07-30T07:32:01Z-
dc.date.available2013-07-30T07:32:01Z-
dc.date.issued2006en_US
dc.identifier.citationEnvironmental Science And Technology, 2006, v. 40 n. 23, p. 7343-7349en_US
dc.identifier.issn0013-936Xen_US
dc.identifier.urihttp://hdl.handle.net/10722/185373-
dc.description.abstractPerfluorooctane sulfonate (PFOS) and related substances are persistent, bioaccumulative, and toxic, and thus of substantial environmental concern. PFOS is an essential photolithographic chemical in the semiconductor industry with no substitutes yet identified. The industry seeks effective treatment technologies. The feasibility of using reverse osmosis (RO) membranes for treating semiconductor wastewater containing PFOS has been investigated. Commercial RO membranes were characterized in terms of permeability, salt rejection, scanning electron microscopy (SEM), transmission electron microscopy (TEM), and membrane surface zeta potential (streaming potential measurements). Filtration tests were performed to determine the membrane flux and PFOS rejection. Over a wide range of feed concentrations (0.5 - 1500 ppm), the RO membranes generally rejected 99% or more of the PFOS. Rejection was better for tighter membranes, but was not affected by membrane zeta potential. Flux decreased with increasing PFOS concentration. While the flux reduction was severe for a loose RO membrane probably due to its higher initial flux, very stable flux was maintained for tighter membranes. At a very high feed concentration (about 500 ppm), all the membranes exhibited an identical stable flux. Isopropyl alcohol, present in some semiconductor wastewaters, had a detrimental effect on membrane flux. Where present it needs to be removed from the wastewater prior to using RO membranes. © 2006 American Chemical Society.en_US
dc.languageengen_US
dc.publisherAmerican Chemical Society. The Journal's web site is located at http://pubs.acs.org/esten_US
dc.relation.ispartofEnvironmental Science and Technologyen_US
dc.subject.meshAlkanesulfonic Acids - Analysis - Chemistryen_US
dc.subject.meshFluorocarbons - Analysis - Chemistryen_US
dc.subject.meshMembranes, Artificialen_US
dc.subject.meshMicroscopy, Electronen_US
dc.subject.meshOsmotic Pressureen_US
dc.subject.meshSemiconductorsen_US
dc.subject.meshWaste Disposal, Fluid - Methodsen_US
dc.subject.meshWater Pollutants, Chemical - Analysisen_US
dc.subject.meshWater Purification - Methodsen_US
dc.titleUse of reverse osmosis membranes to remove perfluorooctane sulfonate (PFOS) from semiconductor wastewateren_US
dc.typeArticleen_US
dc.identifier.emailTang, CY: tangc@hku.hken_US
dc.identifier.authorityTang, CY=rp01765en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1021/es060831qen_US
dc.identifier.pmid17180987-
dc.identifier.scopuseid_2-s2.0-33845303213en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-33845303213&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume40en_US
dc.identifier.issue23en_US
dc.identifier.spage7343en_US
dc.identifier.epage7349en_US
dc.identifier.isiWOS:000242367100040-
dc.publisher.placeUnited Statesen_US
dc.identifier.scopusauthoridTang, CY=35489259800en_US
dc.identifier.scopusauthoridFu, QS=13606617700en_US
dc.identifier.scopusauthoridRobertson, AP=15766200200en_US
dc.identifier.scopusauthoridCriddle, CS=7004173112en_US
dc.identifier.scopusauthoridLeckie, JO=7006717360en_US

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