File Download

There are no files associated with this item.

  Links for fulltext
     (May Require Subscription)
Supplementary

Article: A novel array laterolog method

TitleA novel array laterolog method
Authors
Issue Date1998
Citation
Log Analyst, 1998, v. 39 n. 5, p. 23-30 How to Cite?
AbstractThe dual laterolog tool has been used widely and traditionally to investigate the resistivity profile of formations. In this paper, we point out some weaknesses of the traditional method and introduce a new tool design - the Array Laterolog tool. The finite element method is used to simulate the apparent resistivity curves for both the dual laterolog and Array Laterolog tools for various formation models. Numerical results show the Array Laterolog tool has both higher vertical resolution and more flexible radial investigation than the dual laterolog tool. With its unique new electrode configuration, the Array Laterolog tool can theoretically measure an unlimited number of shallow apparent resistivity curves. While having approximately the same high vertical resolution as the deep Array Laterolog (ALD) measurement, each of these curves has a different investigation depth. These shallow Array Laterolog (ALS) curves, combined with the ALD curve, can provide a full formation radial resistivity profile.
Persistent Identifierhttp://hdl.handle.net/10722/182600
ISSN
2003 SCImago Journal Rankings: 1.086
References

 

DC FieldValueLanguage
dc.contributor.authorChen, YHen_US
dc.contributor.authorChew, WCen_US
dc.contributor.authorZhang, GJen_US
dc.date.accessioned2013-05-02T05:16:03Z-
dc.date.available2013-05-02T05:16:03Z-
dc.date.issued1998en_US
dc.identifier.citationLog Analyst, 1998, v. 39 n. 5, p. 23-30en_US
dc.identifier.issn0024-581Xen_US
dc.identifier.urihttp://hdl.handle.net/10722/182600-
dc.description.abstractThe dual laterolog tool has been used widely and traditionally to investigate the resistivity profile of formations. In this paper, we point out some weaknesses of the traditional method and introduce a new tool design - the Array Laterolog tool. The finite element method is used to simulate the apparent resistivity curves for both the dual laterolog and Array Laterolog tools for various formation models. Numerical results show the Array Laterolog tool has both higher vertical resolution and more flexible radial investigation than the dual laterolog tool. With its unique new electrode configuration, the Array Laterolog tool can theoretically measure an unlimited number of shallow apparent resistivity curves. While having approximately the same high vertical resolution as the deep Array Laterolog (ALD) measurement, each of these curves has a different investigation depth. These shallow Array Laterolog (ALS) curves, combined with the ALD curve, can provide a full formation radial resistivity profile.en_US
dc.languageengen_US
dc.relation.ispartofLog Analysten_US
dc.titleA novel array laterolog methoden_US
dc.typeArticleen_US
dc.identifier.emailChew, WC: wcchew@hku.hken_US
dc.identifier.authorityChew, WC=rp00656en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.scopuseid_2-s2.0-0032166249en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0032166249&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume39en_US
dc.identifier.issue5en_US
dc.identifier.spage23en_US
dc.identifier.epage30en_US
dc.identifier.scopusauthoridChen, YH=7601426431en_US
dc.identifier.scopusauthoridChew, WC=36014436300en_US
dc.identifier.scopusauthoridZhang, GJ=8910997600en_US

Export via OAI-PMH Interface in XML Formats


OR


Export to Other Non-XML Formats