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Article: Bias-induced forces in conducting atomic force microscopy and contact charging of organic monolayers

TitleBias-induced forces in conducting atomic force microscopy and contact charging of organic monolayers
Authors
Issue Date2002
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/ultramic
Citation
Ultramicroscopy, 2002, v. 92 n. 2, p. 67-76 How to Cite?
AbstractContact electrification, a surface property of bulk dielectric materials, has now been observed at the molecular scale using conducting atomic force microscopy (AFM). Conducting AFM measures the electrical properties of an organic film sandwiched between a conducting probe and a conducting substrate. This paper describes physical changes in the film caused by the application of a bias. Contact of the probe leads to direct mechanical stress and the applied electric field results in both Maxwell stresses and electrostriction. Additional forces arise from charge injection (contact charging). Electrostriction and contact charging act oppositely from the normal long-range Coulomb attraction and dominate when a charged tip touches an insulating film, causing the tip to deflect away from the film at high bias. A bias-induced repulsion observed in spin-coated PMMA films may be accounted for by either mechanism. In self-assembled monolayers, however, tunnel current signals show that the repulsion is dominated by contact charging. © 2002 Elsevier Science B.V. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/174941
ISSN
2015 Impact Factor: 2.874
2015 SCImago Journal Rankings: 2.140
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorCui, XDen_US
dc.contributor.authorZarate, Xen_US
dc.contributor.authorTomfohr, Jen_US
dc.contributor.authorPrimak, Aen_US
dc.contributor.authorMoore, ALen_US
dc.contributor.authorMoore, TAen_US
dc.contributor.authorGust, Den_US
dc.contributor.authorHarris, Gen_US
dc.contributor.authorSankey, OFen_US
dc.contributor.authorLindsay, SMen_US
dc.date.accessioned2012-11-26T08:48:17Z-
dc.date.available2012-11-26T08:48:17Z-
dc.date.issued2002en_US
dc.identifier.citationUltramicroscopy, 2002, v. 92 n. 2, p. 67-76en_US
dc.identifier.issn0304-3991en_US
dc.identifier.urihttp://hdl.handle.net/10722/174941-
dc.description.abstractContact electrification, a surface property of bulk dielectric materials, has now been observed at the molecular scale using conducting atomic force microscopy (AFM). Conducting AFM measures the electrical properties of an organic film sandwiched between a conducting probe and a conducting substrate. This paper describes physical changes in the film caused by the application of a bias. Contact of the probe leads to direct mechanical stress and the applied electric field results in both Maxwell stresses and electrostriction. Additional forces arise from charge injection (contact charging). Electrostriction and contact charging act oppositely from the normal long-range Coulomb attraction and dominate when a charged tip touches an insulating film, causing the tip to deflect away from the film at high bias. A bias-induced repulsion observed in spin-coated PMMA films may be accounted for by either mechanism. In self-assembled monolayers, however, tunnel current signals show that the repulsion is dominated by contact charging. © 2002 Elsevier Science B.V. All rights reserved.en_US
dc.languageengen_US
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/ultramicen_US
dc.relation.ispartofUltramicroscopyen_US
dc.titleBias-induced forces in conducting atomic force microscopy and contact charging of organic monolayersen_US
dc.typeArticleen_US
dc.identifier.emailCui, XD: xdcui@hku.hken_US
dc.identifier.authorityCui, XD=rp00689en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1016/S0304-3991(02)00069-4en_US
dc.identifier.pmid12138944-
dc.identifier.scopuseid_2-s2.0-18444412909en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-18444412909&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume92en_US
dc.identifier.issue2en_US
dc.identifier.spage67en_US
dc.identifier.epage76en_US
dc.identifier.isiWOS:000176872100004-
dc.publisher.placeNetherlandsen_US
dc.identifier.scopusauthoridCui, XD=10839907500en_US
dc.identifier.scopusauthoridZarate, X=6507745461en_US
dc.identifier.scopusauthoridTomfohr, J=6603628325en_US
dc.identifier.scopusauthoridPrimak, A=7003676297en_US
dc.identifier.scopusauthoridMoore, AL=35598466200en_US
dc.identifier.scopusauthoridMoore, TA=7403336040en_US
dc.identifier.scopusauthoridGust, D=7006130117en_US
dc.identifier.scopusauthoridHarris, G=7403158277en_US
dc.identifier.scopusauthoridSankey, OF=7005229707en_US
dc.identifier.scopusauthoridLindsay, SM=35595480000en_US

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