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Article: A new capillary electrophoresis buffer for determining organic and inorganic anions in electroplating bath with surfactant additives

TitleA new capillary electrophoresis buffer for determining organic and inorganic anions in electroplating bath with surfactant additives
Authors
Issue Date2010
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/chroma
Citation
Journal Of Chromatography A, 2010, v. 1217 n. 19, p. 3244-3250 How to Cite?
AbstractMonitoring of trace impurities in electroplating bath is needed to meet EU requirements for WEEE and RoHS and for quality control of electrodeposits. Methods using IC and 100% aqueous CE buffer were found producing non-repeatable results attributed to interference of surfactants and major methanesulphonate anion. A new CE buffer containing 1.5. mM tetraethylenepentaamine, 3. mM 1,3,5-benzenetricarboxylic acid and 15. mM Tris in 20% (v/v) methanol at pH = 8.4 was shown to enhance the separation window, reduce interaction between buffer and bath constituents, and give satisfactory repeatability with baseline separation for 14 organic and inorganic anions within 14. min, good repeatability for migration time (0.32-0.57% RSD), satisfactory peak area and peak height (2.9-4.5 and 3-4.7% respectively), low detection limit (S/N = 2, 20-150. ppb), and wide working ranges (0.1-100. ppm). The CE buffer with 20% (v/v) methanol has demonstrated its capability for identifying anion impurities causing problem in aged tin bath and the use of only 10-fold dilution to produce reliable results for quality assessment in plating bath containing high surfactant additives. © 2010 Elsevier B.V.
Persistent Identifierhttp://hdl.handle.net/10722/168454
ISSN
2015 Impact Factor: 3.926
2015 SCImago Journal Rankings: 1.774
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorSun, Hen_US
dc.contributor.authorLau, KMen_US
dc.contributor.authorFung, YSen_US
dc.date.accessioned2012-10-08T03:19:07Z-
dc.date.available2012-10-08T03:19:07Z-
dc.date.issued2010en_US
dc.identifier.citationJournal Of Chromatography A, 2010, v. 1217 n. 19, p. 3244-3250en_US
dc.identifier.issn0021-9673en_US
dc.identifier.urihttp://hdl.handle.net/10722/168454-
dc.description.abstractMonitoring of trace impurities in electroplating bath is needed to meet EU requirements for WEEE and RoHS and for quality control of electrodeposits. Methods using IC and 100% aqueous CE buffer were found producing non-repeatable results attributed to interference of surfactants and major methanesulphonate anion. A new CE buffer containing 1.5. mM tetraethylenepentaamine, 3. mM 1,3,5-benzenetricarboxylic acid and 15. mM Tris in 20% (v/v) methanol at pH = 8.4 was shown to enhance the separation window, reduce interaction between buffer and bath constituents, and give satisfactory repeatability with baseline separation for 14 organic and inorganic anions within 14. min, good repeatability for migration time (0.32-0.57% RSD), satisfactory peak area and peak height (2.9-4.5 and 3-4.7% respectively), low detection limit (S/N = 2, 20-150. ppb), and wide working ranges (0.1-100. ppm). The CE buffer with 20% (v/v) methanol has demonstrated its capability for identifying anion impurities causing problem in aged tin bath and the use of only 10-fold dilution to produce reliable results for quality assessment in plating bath containing high surfactant additives. © 2010 Elsevier B.V.en_US
dc.languageengen_US
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/chromaen_US
dc.relation.ispartofJournal of Chromatography Aen_US
dc.subject.meshAnions - Chemistryen_US
dc.subject.meshBuffersen_US
dc.subject.meshElectrophoresis, Capillary - Methodsen_US
dc.subject.meshElectroplating - Methodsen_US
dc.subject.meshEthylenediamines - Chemistryen_US
dc.subject.meshMethanol - Chemistryen_US
dc.subject.meshSurface-Active Agents - Chemistryen_US
dc.subject.meshTin - Chemistryen_US
dc.subject.meshTricarboxylic Acids - Chemistryen_US
dc.subject.meshTromethamine - Chemistryen_US
dc.titleA new capillary electrophoresis buffer for determining organic and inorganic anions in electroplating bath with surfactant additivesen_US
dc.typeArticleen_US
dc.identifier.emailSun, H:hsun@hkucc.hku.hken_US
dc.identifier.emailFung, YS:ysfung@hku.hken_US
dc.identifier.authoritySun, H=rp00777en_US
dc.identifier.authorityFung, YS=rp00697en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1016/j.chroma.2010.01.011en_US
dc.identifier.pmid20117791-
dc.identifier.scopuseid_2-s2.0-77951977980en_US
dc.identifier.hkuros177948-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-77951977980&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume1217en_US
dc.identifier.issue19en_US
dc.identifier.spage3244en_US
dc.identifier.epage3250en_US
dc.identifier.eissn1873-3778-
dc.identifier.isiWOS:000277757100010-
dc.publisher.placeNetherlandsen_US
dc.identifier.scopusauthoridSun, H=7404827446en_US
dc.identifier.scopusauthoridLau, KM=7401559826en_US
dc.identifier.scopusauthoridFung, YS=13309754700en_US
dc.identifier.citeulike6554946-

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