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Article: Photosensitivity of functional polystyrene and poly(methyl methacrylate) synthesized by controlled radical polymerization

TitlePhotosensitivity of functional polystyrene and poly(methyl methacrylate) synthesized by controlled radical polymerization
Authors
Issue Date2003
PublisherAmerican Chemical Society. The Journal's web site is located at http://pubs.acs.org/macromolecules
Citation
Macromolecules, 2003, v. 36 n. 15, p. 5482-5490 How to Cite?
AbstractWe report the synthesis and photosensitizing properties of various polystyrene and poly(methyl methacrylate) that contain metal complex cores. The polymers were synthesized by atom transfer radical polymerization (ATRP) using metalloinitiators based on rhenium and ruthenium diimine complexes. The detailed structures of the initiators were determined by X-ray crystallography. In ATRP, the catalyst systems were composed of copper(I) bromide and 1,1,4,7,7-pentamethyldiethylenetriamine. The rates of polymerization depended on several factors such as the amounts of initiator, copper bromide, and ligand with respect to the monomer concentration. From the kinetic plots, the polymerizations showed first-order kinetics with respect to the monomer concentration, and the typical rate of polymerization is on the order of 10 -5 s -1. The photoconducting properties of the polymers were studied using argon-ion laser (488 nm) as the light source. The metal complex cores may serve as efficient photosensitizers in the visible region, and the photoconductivities of the polymers are on the order of 10 -10 Ω -1cm -1. The experimental quantum yields were fitted into Onsager's equation, from which the primary yield and thermalization distance were calculated to be 0.02 and 1.3 to 1.8 nm, respectively.
Persistent Identifierhttp://hdl.handle.net/10722/167829
ISSN
2015 Impact Factor: 5.554
2015 SCImago Journal Rankings: 2.497
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorChan, SHen_HK
dc.contributor.authorLam, LSMen_HK
dc.contributor.authorTse, CWen_HK
dc.contributor.authorMan, KYKen_HK
dc.contributor.authorWong, WTen_HK
dc.contributor.authorDjurišić, ABen_HK
dc.contributor.authorChan, WKen_HK
dc.date.accessioned2012-10-08T03:12:01Z-
dc.date.available2012-10-08T03:12:01Z-
dc.date.issued2003en_HK
dc.identifier.citationMacromolecules, 2003, v. 36 n. 15, p. 5482-5490en_HK
dc.identifier.issn0024-9297en_HK
dc.identifier.urihttp://hdl.handle.net/10722/167829-
dc.description.abstractWe report the synthesis and photosensitizing properties of various polystyrene and poly(methyl methacrylate) that contain metal complex cores. The polymers were synthesized by atom transfer radical polymerization (ATRP) using metalloinitiators based on rhenium and ruthenium diimine complexes. The detailed structures of the initiators were determined by X-ray crystallography. In ATRP, the catalyst systems were composed of copper(I) bromide and 1,1,4,7,7-pentamethyldiethylenetriamine. The rates of polymerization depended on several factors such as the amounts of initiator, copper bromide, and ligand with respect to the monomer concentration. From the kinetic plots, the polymerizations showed first-order kinetics with respect to the monomer concentration, and the typical rate of polymerization is on the order of 10 -5 s -1. The photoconducting properties of the polymers were studied using argon-ion laser (488 nm) as the light source. The metal complex cores may serve as efficient photosensitizers in the visible region, and the photoconductivities of the polymers are on the order of 10 -10 Ω -1cm -1. The experimental quantum yields were fitted into Onsager's equation, from which the primary yield and thermalization distance were calculated to be 0.02 and 1.3 to 1.8 nm, respectively.en_HK
dc.languageengen_US
dc.publisherAmerican Chemical Society. The Journal's web site is located at http://pubs.acs.org/macromoleculesen_HK
dc.relation.ispartofMacromoleculesen_HK
dc.titlePhotosensitivity of functional polystyrene and poly(methyl methacrylate) synthesized by controlled radical polymerizationen_HK
dc.typeArticleen_HK
dc.identifier.emailWong, WT: wtwong@hku.hken_HK
dc.identifier.emailDjurišić, AB: dalek@hku.hken_HK
dc.identifier.emailChan, WK: waichan@hku.hken_HK
dc.identifier.authorityWong, WT=rp00811en_HK
dc.identifier.authorityDjurišić, AB=rp00690en_HK
dc.identifier.authorityChan, WK=rp00667en_HK
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1021/ma030161yen_HK
dc.identifier.scopuseid_2-s2.0-0043204339en_HK
dc.identifier.hkuros81168-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0043204339&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume36en_HK
dc.identifier.issue15en_HK
dc.identifier.spage5482en_HK
dc.identifier.epage5490en_HK
dc.identifier.isiWOS:000184398600009-
dc.publisher.placeUnited Statesen_HK
dc.identifier.scopusauthoridChan, SH=55455843600en_HK
dc.identifier.scopusauthoridLam, LSM=7201984714en_HK
dc.identifier.scopusauthoridTse, CW=8264696700en_HK
dc.identifier.scopusauthoridMan, KYK=8051698900en_HK
dc.identifier.scopusauthoridWong, WT=7403973084en_HK
dc.identifier.scopusauthoridDjurišić, AB=7004904830en_HK
dc.identifier.scopusauthoridChan, WK=13310083000en_HK

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