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Article: Nanoimprint lithography: a polyferroplatinyne precursor for the rapid fabrication of L10-FePt-type bit patterned media by nanoimprint lithography
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TitleNanoimprint lithography: a polyferroplatinyne precursor for the rapid fabrication of L10-FePt-type bit patterned media by nanoimprint lithography
 
AuthorsDong, Q
Li, G
Ho, CL
Faisal, M
Leung, CW
Pong, PWT
Liu, K
Tang, BZ
Manners, I
Wong, WY
 
KeywordsMetallopolymers
FePt nanoparticles
Bit patterned media
Nanoimprint lithography
Magnetic data recording
 
Issue Date2012
 
PublisherWiley - V C H Verlag GmbH & Co KGaA. The Journal's web site is located at http://www.wiley-vch.de/publish/en/journals/alphabeticIndex/2089
 
CitationAdvanced Materials, 2012, v. 24 n. 8, p. 1033 [How to Cite?]
DOI: http://dx.doi.org/10.1002/adma.201290034
 
AbstractOn page 1034 W.-T. Pong, I. Manners, W.-Y. Wong, and co-workers report the simple and rapid fabrication of patterned L10-FePt alloy nanoparticles from a solution-processable bimetallic polyferroplatinyne polymer precursor. This approach holds great promise for fabricating L10-FePt-type bit-patterned media using high-throughput nanoimprint lithography, followed by controlled pyrolysis of the nanopatterned polymer. Each dot in the asgenerated FePt-containing nanodot array is magnetic, which can serve as a good platform for future ultrahigh-density perpen-dicular magnetic data recording systems.
 
DescriptionFrontispiece
 
ISSN0935-9648
2012 Impact Factor: 14.829
2012 SCImago Journal Rankings: 7.178
 
DOIhttp://dx.doi.org/10.1002/adma.201290034
 
DC FieldValue
dc.contributor.authorDong, Q
 
dc.contributor.authorLi, G
 
dc.contributor.authorHo, CL
 
dc.contributor.authorFaisal, M
 
dc.contributor.authorLeung, CW
 
dc.contributor.authorPong, PWT
 
dc.contributor.authorLiu, K
 
dc.contributor.authorTang, BZ
 
dc.contributor.authorManners, I
 
dc.contributor.authorWong, WY
 
dc.date.accessioned2012-09-20T07:54:38Z
 
dc.date.available2012-09-20T07:54:38Z
 
dc.date.issued2012
 
dc.description.abstractOn page 1034 W.-T. Pong, I. Manners, W.-Y. Wong, and co-workers report the simple and rapid fabrication of patterned L10-FePt alloy nanoparticles from a solution-processable bimetallic polyferroplatinyne polymer precursor. This approach holds great promise for fabricating L10-FePt-type bit-patterned media using high-throughput nanoimprint lithography, followed by controlled pyrolysis of the nanopatterned polymer. Each dot in the asgenerated FePt-containing nanodot array is magnetic, which can serve as a good platform for future ultrahigh-density perpen-dicular magnetic data recording systems.
 
dc.descriptionFrontispiece
 
dc.identifier.citationAdvanced Materials, 2012, v. 24 n. 8, p. 1033 [How to Cite?]
DOI: http://dx.doi.org/10.1002/adma.201290034
 
dc.identifier.doihttp://dx.doi.org/10.1002/adma.201290034
 
dc.identifier.epage1033
 
dc.identifier.hkuros207612
 
dc.identifier.issn0935-9648
2012 Impact Factor: 14.829
2012 SCImago Journal Rankings: 7.178
 
dc.identifier.issue8
 
dc.identifier.spage1033
 
dc.identifier.urihttp://hdl.handle.net/10722/163995
 
dc.identifier.volume24
 
dc.languageeng
 
dc.publisherWiley - V C H Verlag GmbH & Co KGaA. The Journal's web site is located at http://www.wiley-vch.de/publish/en/journals/alphabeticIndex/2089
 
dc.publisher.placeGermany
 
dc.relation.ispartofAdvanced Materials
 
dc.subjectMetallopolymers
 
dc.subjectFePt nanoparticles
 
dc.subjectBit patterned media
 
dc.subjectNanoimprint lithography
 
dc.subjectMagnetic data recording
 
dc.titleNanoimprint lithography: a polyferroplatinyne precursor for the rapid fabrication of L10-FePt-type bit patterned media by nanoimprint lithography
 
dc.typeArticle
 
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<item><contributor.author>Dong, Q</contributor.author>
<contributor.author>Li, G</contributor.author>
<contributor.author>Ho, CL</contributor.author>
<contributor.author>Faisal, M</contributor.author>
<contributor.author>Leung, CW</contributor.author>
<contributor.author>Pong, PWT</contributor.author>
<contributor.author>Liu, K</contributor.author>
<contributor.author>Tang, BZ</contributor.author>
<contributor.author>Manners, I</contributor.author>
<contributor.author>Wong, WY</contributor.author>
<date.accessioned>2012-09-20T07:54:38Z</date.accessioned>
<date.available>2012-09-20T07:54:38Z</date.available>
<date.issued>2012</date.issued>
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<description>Frontispiece</description>
<description.abstract>On page 1034 W.-T. Pong, I. Manners, W.-Y. Wong, and co-workers report the simple and rapid fabrication of patterned L10-FePt alloy nanoparticles from a solution-processable bimetallic polyferroplatinyne polymer precursor. This approach holds great promise for fabricating L10-FePt-type bit-patterned media using high-throughput nanoimprint lithography, followed by controlled pyrolysis of the nanopatterned polymer. Each dot in the asgenerated FePt-containing nanodot array is magnetic, which can serve as a good platform for future ultrahigh-density perpen-dicular magnetic data recording systems.</description.abstract>
<language>eng</language>
<publisher>Wiley - V C H Verlag GmbH &amp; Co KGaA. The Journal&apos;s web site is located at http://www.wiley-vch.de/publish/en/journals/alphabeticIndex/2089</publisher>
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<subject>Metallopolymers</subject>
<subject>FePt nanoparticles</subject>
<subject>Bit patterned media</subject>
<subject>Nanoimprint lithography</subject>
<subject>Magnetic data recording</subject>
<title>Nanoimprint lithography: a polyferroplatinyne precursor for the rapid fabrication of L10-FePt-type bit patterned media by nanoimprint lithography</title>
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