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Article: Formation and electrochemical behavior of Al and O plasma-implanted biodegradable Mg-Y-RE alloy

TitleFormation and electrochemical behavior of Al and O plasma-implanted biodegradable Mg-Y-RE alloy
Authors
Issue Date2012
PublisherElsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/matchemphys
Citation
Materials Chemistry and Physics, 2012, v. 132 n. 1, p. 187-191 How to Cite?
AbstractMg-Y-RE alloy is potentially useful in biodegradable implants but the fast degradation rate in the physiological environment restrains actual applications. In order to enhance the corrosion resistance, aluminum and oxygen ion implantation is employed to modify the surface of the Mg-Y-RE alloy. X-ray photoelectron spectroscopy (XPS) is conducted to obtain elemental depth profiles and determine chemical state changes. Electrochemical impedance spectroscopy and potentiodynamic polarization are employed to investigate the electrochemical behavior in simulated body fluids (SBF). After polarization, the corroded surface is further studied by scanning electron microscopy (SEM). The results indicate Al and O ion implantation produces an Al 2O 3-containing protection layer which improves the corrosion resistance of Mg-Y-RE alloy. After the surface treatment, localized corrosion becomes the dominant corrosion mechanism instead of general corrosion. © 2011 Elsevier B.V.
Persistent Identifierhttp://hdl.handle.net/10722/159755
ISSN
2014 Impact Factor: 2.259
2014 SCImago Journal Rankings: 0.818
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorZhao, Yen_HK
dc.contributor.authorWu, Gen_HK
dc.contributor.authorPan, Hen_HK
dc.contributor.authorYeung, KWKen_HK
dc.contributor.authorChu, PKen_HK
dc.date.accessioned2012-08-16T05:55:35Z-
dc.date.available2012-08-16T05:55:35Z-
dc.date.issued2012en_HK
dc.identifier.citationMaterials Chemistry and Physics, 2012, v. 132 n. 1, p. 187-191en_HK
dc.identifier.issn0254-0584en_HK
dc.identifier.urihttp://hdl.handle.net/10722/159755-
dc.description.abstractMg-Y-RE alloy is potentially useful in biodegradable implants but the fast degradation rate in the physiological environment restrains actual applications. In order to enhance the corrosion resistance, aluminum and oxygen ion implantation is employed to modify the surface of the Mg-Y-RE alloy. X-ray photoelectron spectroscopy (XPS) is conducted to obtain elemental depth profiles and determine chemical state changes. Electrochemical impedance spectroscopy and potentiodynamic polarization are employed to investigate the electrochemical behavior in simulated body fluids (SBF). After polarization, the corroded surface is further studied by scanning electron microscopy (SEM). The results indicate Al and O ion implantation produces an Al 2O 3-containing protection layer which improves the corrosion resistance of Mg-Y-RE alloy. After the surface treatment, localized corrosion becomes the dominant corrosion mechanism instead of general corrosion. © 2011 Elsevier B.V.en_HK
dc.languageengen_US
dc.publisherElsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/matchemphysen_HK
dc.relation.ispartofMaterials Chemistry and Physicsen_HK
dc.subject.meshChemical state changes-
dc.subject.meshCorroded surface-
dc.subject.meshCorrosion mechanisms-
dc.subject.meshDegradation rate-
dc.subject.meshDepth profile-
dc.titleFormation and electrochemical behavior of Al and O plasma-implanted biodegradable Mg-Y-RE alloyen_HK
dc.typeArticleen_HK
dc.identifier.emailZhao, Y: yingzhao@hku.hken_HK
dc.identifier.emailPan, H: haobo@hku.hken_HK
dc.identifier.emailYeung, KWK: wkkyeung@hku.hk-
dc.identifier.emailChu, PK: paul.chu@cityu.edu.hken_HK
dc.identifier.authorityPan, H=rp01564en_HK
dc.identifier.authorityYeung, KWK=rp00309en_HK
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1016/j.matchemphys.2011.11.028en_HK
dc.identifier.scopuseid_2-s2.0-84355161840en_HK
dc.identifier.hkuros204534en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-84355161840&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume132en_HK
dc.identifier.issue1en_HK
dc.identifier.spage187en_HK
dc.identifier.epage191en_HK
dc.identifier.isiWOS:000300865900029-
dc.publisher.placeSwitzerlanden_HK
dc.identifier.scopusauthoridChu, PK=36040705700en_HK
dc.identifier.scopusauthoridYeung, KWK=13309584700en_HK
dc.identifier.scopusauthoridPan, H=7403295092en_HK
dc.identifier.scopusauthoridWu, G=9941129500en_HK
dc.identifier.scopusauthoridZhao, Y=36982544500en_HK
dc.identifier.citeulike10128008-

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