Article: Formation and electrochemical behavior of Al and O plasma-implanted biodegradable Mg-Y-RE alloy

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TitleFormation and electrochemical behavior of Al and O plasma-implanted biodegradable Mg-Y-RE alloy
AuthorsZhao, Y1 2
Wu, G2
Pan, H1
Yeung, KWK1
Chu, PK2
Issue Date2012
PublisherElsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/matchemphys
CitationMaterials Chemistry and Physics, 2012, v. 132 n. 1, p. 187-191 [How to Cite?]
DOI: http://dx.doi.org/10.1016/j.matchemphys.2011.11.028
AbstractMg-Y-RE alloy is potentially useful in biodegradable implants but the fast degradation rate in the physiological environment restrains actual applications. In order to enhance the corrosion resistance, aluminum and oxygen ion implantation is employed to modify the surface of the Mg-Y-RE alloy. X-ray photoelectron spectroscopy (XPS) is conducted to obtain elemental depth profiles and determine chemical state changes. Electrochemical impedance spectroscopy and potentiodynamic polarization are employed to investigate the electrochemical behavior in simulated body fluids (SBF). After polarization, the corroded surface is further studied by scanning electron microscopy (SEM). The results indicate Al and O ion implantation produces an Al 2O 3-containing protection layer which improves the corrosion resistance of Mg-Y-RE alloy. After the surface treatment, localized corrosion becomes the dominant corrosion mechanism instead of general corrosion. © 2011 Elsevier B.V.
ISSN0254-0584
2011 Impact Factor: 2.234
2011 SCImago Journal Rankings: 0.146
DOIhttp://dx.doi.org/10.1016/j.matchemphys.2011.11.028
ReferencesReferences in Scopus
DC Field
Value
dc.contributor.authorZhao, Y
dc.contributor.authorWu, G
dc.contributor.authorPan, H
dc.contributor.authorYeung, KWK
dc.contributor.authorChu, PK
dc.date.accessioned2012-08-16T05:55:35Z
dc.date.available2012-08-16T05:55:35Z
dc.date.issued2012
dc.description.abstractMg-Y-RE alloy is potentially useful in biodegradable implants but the fast degradation rate in the physiological environment restrains actual applications. In order to enhance the corrosion resistance, aluminum and oxygen ion implantation is employed to modify the surface of the Mg-Y-RE alloy. X-ray photoelectron spectroscopy (XPS) is conducted to obtain elemental depth profiles and determine chemical state changes. Electrochemical impedance spectroscopy and potentiodynamic polarization are employed to investigate the electrochemical behavior in simulated body fluids (SBF). After polarization, the corroded surface is further studied by scanning electron microscopy (SEM). The results indicate Al and O ion implantation produces an Al 2O 3-containing protection layer which improves the corrosion resistance of Mg-Y-RE alloy. After the surface treatment, localized corrosion becomes the dominant corrosion mechanism instead of general corrosion. © 2011 Elsevier B.V.
dc.description.natureLink_to_subscribed_fulltext
dc.identifier.citationMaterials Chemistry and Physics, 2012, v. 132 n. 1, p. 187-191 [How to Cite?]
DOI: http://dx.doi.org/10.1016/j.matchemphys.2011.11.028
dc.identifier.citeulike10128008
dc.identifier.doihttp://dx.doi.org/10.1016/j.matchemphys.2011.11.028
dc.identifier.epage191
dc.identifier.hkuros204534
dc.identifier.issn0254-0584
2011 Impact Factor: 2.234
2011 SCImago Journal Rankings: 0.146
dc.identifier.issue1
dc.identifier.scopuseid_2-s2.0-84355161840
dc.identifier.spage187
dc.identifier.urihttp://hdl.handle.net/10722/159755
dc.identifier.volume132
dc.languageeng
dc.publisherElsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/matchemphys
dc.publisher.placeSwitzerland
dc.relation.ispartofMaterials Chemistry and Physics
dc.relation.referencesReferences in Scopus
dc.subject.meshChemical state changes
dc.subject.meshCorroded surface
dc.subject.meshCorrosion mechanisms
dc.subject.meshDegradation rate
dc.subject.meshDepth profile
dc.titleFormation and electrochemical behavior of Al and O plasma-implanted biodegradable Mg-Y-RE alloy
dc.typeArticle
Author Affiliations
  1. The University of Hong Kong
  2. City University of Hong Kong