Article: A study on MIS Schottky diode based hydrogen sensor using La2O3 as gate insulator
| Title | A study on MIS Schottky diode based hydrogen sensor using La2O3 as gate insulator |
|---|---|
| Authors | Chen, G1 Yu, J1 Lai, PT1 |
| Keywords | Barrier heights Conduction mechanism Fowler-nordheim tunneling Gate insulator Hydrogen gas |
| Issue Date | 2012 |
| Publisher | Pergamon. The Journal's web site is located at http://www.elsevier.com/locate/microrel |
| Citation | Microelectronics Reliability, 2012, v. 52 n. 8, p. 1660-1664 [How to Cite?] DOI: http://dx.doi.org/10.1016/j.microrel.2012.03.022 |
| Abstract | In this work, a Metal-Insulator-Semiconductor (MIS) based Schottky-diode hydrogen sensor was fabricated with La 2O 3 as a gate insulator. The electrical properties (current-voltage characteristics, change in barrier height and sensitivity) and hydrogen sensing performance (dynamic response and response time) were examined from 25°C to 300°C and towards H 2 with different concentrations. The conduction mechanisms were explained in terms of Fowler-Nordheim tunneling (below 120°C) and the Poole-Frenkel effect at temperatures (above 120°C). The results show that at an operating temperature of 260°C, the sensitivity of the device can reach a maximum value of 4.6 with respect to 10,000-ppm hydrogen gas and its response time was 20 s. © 2012 Elsevier Ltd. All rights reserved. |
| ISSN | 0026-2714 2011 Impact Factor: 1.167 2011 SCImago Journal Rankings: 0.090 |
| DOI | http://dx.doi.org/10.1016/j.microrel.2012.03.022 |
| dc.contributor.author | Chen, G |
|---|---|
| dc.contributor.author | Yu, J |
| dc.contributor.author | Lai, PT |
| dc.date.accessioned | 2012-08-16T05:51:36Z |
| dc.date.available | 2012-08-16T05:51:36Z |
| dc.date.issued | 2012 |
| dc.description.abstract | In this work, a Metal-Insulator-Semiconductor (MIS) based Schottky-diode hydrogen sensor was fabricated with La 2O 3 as a gate insulator. The electrical properties (current-voltage characteristics, change in barrier height and sensitivity) and hydrogen sensing performance (dynamic response and response time) were examined from 25°C to 300°C and towards H 2 with different concentrations. The conduction mechanisms were explained in terms of Fowler-Nordheim tunneling (below 120°C) and the Poole-Frenkel effect at temperatures (above 120°C). The results show that at an operating temperature of 260°C, the sensitivity of the device can reach a maximum value of 4.6 with respect to 10,000-ppm hydrogen gas and its response time was 20 s. © 2012 Elsevier Ltd. All rights reserved. |
| dc.description.nature | link_to_subscribed_fulltext |
| dc.identifier.citation | Microelectronics Reliability, 2012, v. 52 n. 8, p. 1660-1664 [How to Cite?] DOI: http://dx.doi.org/10.1016/j.microrel.2012.03.022 |
| dc.identifier.citeulike | 10595535 |
| dc.identifier.doi | http://dx.doi.org/10.1016/j.microrel.2012.03.022 |
| dc.identifier.epage | 1664 |
| dc.identifier.hkuros | 205479 |
| dc.identifier.issn | 0026-2714 2011 Impact Factor: 1.167 2011 SCImago Journal Rankings: 0.090 |
| dc.identifier.issue | 8 |
| dc.identifier.openurl | ![]() |
| dc.identifier.scopus | eid_2-s2.0-84863722855 |
| dc.identifier.spage | 1660 |
| dc.identifier.uri | http://hdl.handle.net/10722/159537 |
| dc.identifier.volume | 52 |
| dc.language | eng |
| dc.publisher | Pergamon. The Journal's web site is located at http://www.elsevier.com/locate/microrel |
| dc.publisher.place | United Kingdom |
| dc.relation.ispartof | Microelectronics Reliability |
| dc.subject | Barrier heights |
| dc.subject | Conduction mechanism |
| dc.subject | Fowler-nordheim tunneling |
| dc.subject | Gate insulator |
| dc.subject | Hydrogen gas |
| dc.title | A study on MIS Schottky diode based hydrogen sensor using La2O3 as gate insulator |
| dc.type | Article |
Author Affiliations
- The University of Hong Kong


