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Article: Splitting water on metal oxide surfaces
Title | Splitting water on metal oxide surfaces |
---|---|
Authors | |
Issue Date | 2011 |
Publisher | American Chemical Society. The Journal's web site is located at http://pubs.acs.org/journals/jpccck/ |
Citation | Journal Of Physical Chemistry C, 2011, v. 115 n. 40, p. 19710-19715 How to Cite? |
Abstract | We have identified a class of metal oxide surfaces that are very effective in dissociating water. These oxide surfaces are characterized by having their surface O 2p level lying significantly above the valence band maximum (VBM) and within the band gap. Density functional theory is used to determine the adsorption energy per water molecule and finds that water dissociates completely at all coverages on these surfaces. Fourier transform infrared (FTIR) spectroscopy is used to verify that there is little or no molecular water present on the surface. Besides splitting water, this class of metal oxide surfaces should also be effective in splitting other kinds of hydrogen compounds. By contrast, oxides whose surface O 2p level lies buried inside the valence band are much less reactive, and water adsorbs on these surfaces in molecular form. © 2011 American Chemical Society. |
Persistent Identifier | http://hdl.handle.net/10722/159419 |
ISSN | 2023 Impact Factor: 3.3 2023 SCImago Journal Rankings: 0.957 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
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dc.contributor.author | Xu, H | en_HK |
dc.contributor.author | Zhang, RQ | en_HK |
dc.contributor.author | Ng, AMC | en_HK |
dc.contributor.author | Djurišić, AB | en_HK |
dc.contributor.author | Chan, HT | en_HK |
dc.contributor.author | Chan, WK | en_HK |
dc.contributor.author | Tong, SY | en_HK |
dc.date.accessioned | 2012-08-16T05:49:12Z | - |
dc.date.available | 2012-08-16T05:49:12Z | - |
dc.date.issued | 2011 | en_HK |
dc.identifier.citation | Journal Of Physical Chemistry C, 2011, v. 115 n. 40, p. 19710-19715 | en_HK |
dc.identifier.issn | 1932-7447 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/159419 | - |
dc.description.abstract | We have identified a class of metal oxide surfaces that are very effective in dissociating water. These oxide surfaces are characterized by having their surface O 2p level lying significantly above the valence band maximum (VBM) and within the band gap. Density functional theory is used to determine the adsorption energy per water molecule and finds that water dissociates completely at all coverages on these surfaces. Fourier transform infrared (FTIR) spectroscopy is used to verify that there is little or no molecular water present on the surface. Besides splitting water, this class of metal oxide surfaces should also be effective in splitting other kinds of hydrogen compounds. By contrast, oxides whose surface O 2p level lies buried inside the valence band are much less reactive, and water adsorbs on these surfaces in molecular form. © 2011 American Chemical Society. | en_HK |
dc.language | eng | en_US |
dc.publisher | American Chemical Society. The Journal's web site is located at http://pubs.acs.org/journals/jpccck/ | en_HK |
dc.relation.ispartof | Journal of Physical Chemistry C | en_HK |
dc.title | Splitting water on metal oxide surfaces | en_HK |
dc.type | Article | en_HK |
dc.identifier.email | Djurišić, AB: dalek@hku.hk | en_HK |
dc.identifier.email | Chan, WK: waichan@hku.hk | en_HK |
dc.identifier.authority | Djurišić, AB=rp00690 | en_HK |
dc.identifier.authority | Chan, WK=rp00667 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1021/jp2032884 | en_HK |
dc.identifier.scopus | eid_2-s2.0-80053917896 | en_HK |
dc.identifier.hkuros | 205711 | en_US |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-80053917896&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 115 | en_HK |
dc.identifier.issue | 40 | en_HK |
dc.identifier.spage | 19710 | en_HK |
dc.identifier.epage | 19715 | en_HK |
dc.identifier.isi | WOS:000295546100033 | - |
dc.publisher.place | United States | en_HK |
dc.identifier.scopusauthorid | Xu, H=36160491400 | en_HK |
dc.identifier.scopusauthorid | Zhang, RQ=7404864320 | en_HK |
dc.identifier.scopusauthorid | Ng, AMC=12140078600 | en_HK |
dc.identifier.scopusauthorid | Djurišić, AB=7004904830 | en_HK |
dc.identifier.scopusauthorid | Chan, HT=7403402352 | en_HK |
dc.identifier.scopusauthorid | Chan, WK=13310083000 | en_HK |
dc.identifier.scopusauthorid | Tong, SY=24512624800 | en_HK |
dc.identifier.citeulike | 9860311 | - |
dc.identifier.issnl | 1932-7447 | - |