Conference Paper: Hydrogen gas sensing properties of Pt/Ta2O5 Schottky diodes based on Si and SiC substrates
| Title | Hydrogen gas sensing properties of Pt/Ta2O5 Schottky diodes based on Si and SiC substrates | ||||
|---|---|---|---|---|---|
| Authors | Yu, J2 Chen, G1 Li, CX1 Shafiei, M2 Ou, JZ2 Du Plessis, J Kalantar-Zadeh, K2 Lai, PT1 Wlodarski, W2 | ||||
| Keywords | Gas Sensor Hydrogen Rf Sputtering Schottky Diode Tantalum Oxide | ||||
| Issue Date | 2011 | ||||
| Publisher | Elsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/sna | ||||
| Citation | Sensors and Actuators A: Physical, 2011, v. 172 n. 1, p. 9-14 [How to Cite?] DOI: http://dx.doi.org/10.1016/j.sna.2011.02.021 | ||||
| Abstract | We developed Pt/tantalum oxide (Ta 2O 5) Schottky diodes for hydrogen sensing applications. Thin layer (4 nm) of Ta 2O 5 was deposited on silicon (Si) and silicon carbide (SiC) substrates using the radio frequency sputtering technique. We compared the performance of these sensors at different temperatures of 100 °C and 150 °C. At these operating temperatures, the sensor based on SiC exhibited a larger sensitivity, whilst the sensor based on Si exhibited a faster response toward hydrogen gas. We discussed herein, the experimental results obtained for these Pt/Ta 2O 5 based Schottky diodes exhibited that they are promising candidates for hydrogen sensing applications. © 2011 Elsevier B.V. All rights reserved. | ||||
| Description | The journal issue is a special issue of the Eurosensors XXIV Conference, Linz, Austria, 5-8 September 2010 | ||||
| ISSN | 0924-4247 2011 Impact Factor: 1.802 2011 SCImago Journal Rankings: 0.234 | ||||
| DOI | http://dx.doi.org/10.1016/j.sna.2011.02.021 | ||||
| ISI Accession Number ID | WOS:000298465100003
Funding Information: The work herein is supported by the RGC of HKSAR, China (Project No. HKU 713510E). | ||||
| References | References in Scopus | ||||
| Grants | High-Stability and High-Sensitivity MISiC Hydrogen Sensor by using Hf-based Gate Dielectrics |
| dc.contributor.author | Yu, J | ||||
|---|---|---|---|---|---|
| dc.contributor.author | Chen, G | ||||
| dc.contributor.author | Li, CX | ||||
| dc.contributor.author | Shafiei, M | ||||
| dc.contributor.author | Ou, JZ | ||||
| dc.contributor.author | Du Plessis, J | ||||
| dc.contributor.author | Kalantar-Zadeh, K | ||||
| dc.contributor.author | Lai, PT | ||||
| dc.contributor.author | Wlodarski, W | ||||
| dc.date.accessioned | 2012-08-08T09:01:08Z | ||||
| dc.date.available | 2012-08-08T09:01:08Z | ||||
| dc.date.issued | 2011 | ||||
| dc.description.abstract | We developed Pt/tantalum oxide (Ta 2O 5) Schottky diodes for hydrogen sensing applications. Thin layer (4 nm) of Ta 2O 5 was deposited on silicon (Si) and silicon carbide (SiC) substrates using the radio frequency sputtering technique. We compared the performance of these sensors at different temperatures of 100 °C and 150 °C. At these operating temperatures, the sensor based on SiC exhibited a larger sensitivity, whilst the sensor based on Si exhibited a faster response toward hydrogen gas. We discussed herein, the experimental results obtained for these Pt/Ta 2O 5 based Schottky diodes exhibited that they are promising candidates for hydrogen sensing applications. © 2011 Elsevier B.V. All rights reserved. | ||||
| dc.description.grant | High-Stability and High-Sensitivity MISiC Hydrogen Sensor by using Hf-based Gate Dielectrics | ||||
| dc.description.grantcode | 103372 | ||||
| dc.description.nature | Link_to_subscribed_fulltext | ||||
| dc.description | The journal issue is a special issue of the Eurosensors XXIV Conference, Linz, Austria, 5-8 September 2010 | ||||
| dc.identifier.citation | Sensors and Actuators A: Physical, 2011, v. 172 n. 1, p. 9-14 [How to Cite?] DOI: http://dx.doi.org/10.1016/j.sna.2011.02.021 | ||||
| dc.identifier.citeulike | 8927337 | ||||
| dc.identifier.doi | http://dx.doi.org/10.1016/j.sna.2011.02.021 | ||||
| dc.identifier.epage | 14 | ||||
| dc.identifier.hkuros | 204658 | ||||
| dc.identifier.isi | WOS:000298465100003
Funding Information: The work herein is supported by the RGC of HKSAR, China (Project No. HKU 713510E). | ||||
| dc.identifier.issn | 0924-4247 2011 Impact Factor: 1.802 2011 SCImago Journal Rankings: 0.234 | ||||
| dc.identifier.issue | 1 | ||||
| dc.identifier.scopus | eid_2-s2.0-82755187363 | ||||
| dc.identifier.spage | 9 | ||||
| dc.identifier.uri | http://hdl.handle.net/10722/158746 | ||||
| dc.identifier.volume | 172 | ||||
| dc.language | eng | ||||
| dc.publisher | Elsevier SA. The Journal's web site is located at http://www.elsevier.com/locate/sna | ||||
| dc.publisher.place | Switzerland | ||||
| dc.relation.ispartof | Sensors and Actuators A: Physical | ||||
| dc.relation.references | References in Scopus | ||||
| dc.subject | Gas Sensor | ||||
| dc.subject | Hydrogen | ||||
| dc.subject | Rf Sputtering | ||||
| dc.subject | Schottky Diode | ||||
| dc.subject | Tantalum Oxide | ||||
| dc.title | Hydrogen gas sensing properties of Pt/Ta2O5 Schottky diodes based on Si and SiC substrates | ||||
| dc.type | Conference_Paper |
Author Affiliations
- The University of Hong Kong
- Royal Melbourne Institute of Technology University

