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Conference Paper: Performance analysis of pixelated source-mask optimization for optical microlithography

TitlePerformance analysis of pixelated source-mask optimization for optical microlithography
Authors
Jia, NLam, EY
Issue Date2010
Citation
2010 Ieee International Conference Of Electron Devices And Solid-State Circuits, Edssc 2010, 2010 How to Cite?
DOI: http://dx.doi.org/10.1109/EDSSC.2010.5713709
AbstractThe optical lithography is facing great challenge from the continuous shrinkage of the technology node. As one of the promising techniques, the free-form source-mask optimization (SMO) has been increasingly explored in recent years with great interests in the performance of SMO on its process robustness. In this paper, a free-form SMO framework is proposed, and its performance is tested by comparing the process window of SMO and the mask-only optimization. © 2010 IEEE.
Persistent Identifierhttp://hdl.handle.net/10722/158696
References
References in Scopus

 

DC FieldValueLanguage
dc.contributor.authorJia, Nen_US
dc.contributor.authorLam, EYen_US
dc.date.accessioned2012-08-08T09:00:53Z-
dc.date.available2012-08-08T09:00:53Z-
dc.date.issued2010en_US
dc.identifier.citation2010 Ieee International Conference Of Electron Devices And Solid-State Circuits, Edssc 2010, 2010en_US
dc.identifier.urihttp://hdl.handle.net/10722/158696-
dc.description.abstractThe optical lithography is facing great challenge from the continuous shrinkage of the technology node. As one of the promising techniques, the free-form source-mask optimization (SMO) has been increasingly explored in recent years with great interests in the performance of SMO on its process robustness. In this paper, a free-form SMO framework is proposed, and its performance is tested by comparing the process window of SMO and the mask-only optimization. © 2010 IEEE.en_US
dc.languageengen_US
dc.relation.ispartof2010 IEEE International Conference of Electron Devices and Solid-State Circuits, EDSSC 2010en_US
dc.titlePerformance analysis of pixelated source-mask optimization for optical microlithographyen_US
dc.typeConference_Paperen_US
dc.identifier.emailLam, EY:elam@eee.hku.hken_US
dc.identifier.authorityLam, EY=rp00131en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1109/EDSSC.2010.5713709en_US
dc.identifier.scopuseid_2-s2.0-79952522685en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-79952522685&selection=ref&src=s&origin=recordpageen_US
dc.identifier.scopusauthoridJia, N=34872289800en_US
dc.identifier.scopusauthoridLam, EY=7102890004en_US

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