Conference Paper: A novel design of grating projection system for 3D reconstruction of wafer bumps

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TitleA novel design of grating projection system for 3D reconstruction of wafer bumps
AuthorsShu, Y3
Chung, R4
Tan, Z3
Cheng, J4
Lam, EY2
Fung, KSM1
Wang, F1
Keywords3D From Structured Light
Depth Of Field
Field Of View
Lens Design
Machine Vision
Modulation Transfer Function
Issue Date2006
PublisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml
CitationProceedings Of Spie - The International Society For Optical Engineering, 2006, v. 6056 [How to Cite?]
DOI: http://dx.doi.org/10.1117/12.650023
AbstractA challenge in the semiconductor industry is the 3D inspection of solder bumps grown on wafers for direct die-to-die bonding. In an earlier work we proposed a mechanism for reconstructing wafer bump surface in 3D, which is based upon projecting a binary grating to the surface with an inclined angle. For the purpose of 3D reconstruction with high speed and accuracy, the requirements for the projection lens system are the followings: (1) having a tilted angle between the projection plane and the optical axis; (2) having high bandwidth to let high-spatial-frequency harmonics contained in the binary grating pass through the lens and be projected onto the inspected surface properly; (3) having high Modulation Transfer Function (MTF); (4) having large Field of View (FOV); and (5) having a large Depth of Field (DOF) that corresponds to the depth range or height of the inspected surface. The above requirements lead to great challenges in the design of the projection lens system. In this paper, we describe a design consisting of a grating and several pieces of spherical lens, that addresses the requirements. To reduce the lens aberrations, the grating is laid out with a tilting angle specifically to make the grating, the lens, and the image plane intersect at the same line. Such a system can project a high spatial-frequency binary grating onto the inspected surface properly. Simulation results, including performance analysis and tolerance analysis, are shown to demonstrate the feasibility of the design. © 2006 SPIE-IS&T.
ISSN0277-786X
2011 SCImago Journal Rankings: 0.046
DOIhttp://dx.doi.org/10.1117/12.650023
ReferencesReferences in Scopus
DC Field
Value
dc.contributor.authorShu, Y
dc.contributor.authorChung, R
dc.contributor.authorTan, Z
dc.contributor.authorCheng, J
dc.contributor.authorLam, EY
dc.contributor.authorFung, KSM
dc.contributor.authorWang, F
dc.date.accessioned2012-08-08T08:59:37Z
dc.date.available2012-08-08T08:59:37Z
dc.date.issued2006
dc.description.abstractA challenge in the semiconductor industry is the 3D inspection of solder bumps grown on wafers for direct die-to-die bonding. In an earlier work we proposed a mechanism for reconstructing wafer bump surface in 3D, which is based upon projecting a binary grating to the surface with an inclined angle. For the purpose of 3D reconstruction with high speed and accuracy, the requirements for the projection lens system are the followings: (1) having a tilted angle between the projection plane and the optical axis; (2) having high bandwidth to let high-spatial-frequency harmonics contained in the binary grating pass through the lens and be projected onto the inspected surface properly; (3) having high Modulation Transfer Function (MTF); (4) having large Field of View (FOV); and (5) having a large Depth of Field (DOF) that corresponds to the depth range or height of the inspected surface. The above requirements lead to great challenges in the design of the projection lens system. In this paper, we describe a design consisting of a grating and several pieces of spherical lens, that addresses the requirements. To reduce the lens aberrations, the grating is laid out with a tilting angle specifically to make the grating, the lens, and the image plane intersect at the same line. Such a system can project a high spatial-frequency binary grating onto the inspected surface properly. Simulation results, including performance analysis and tolerance analysis, are shown to demonstrate the feasibility of the design. © 2006 SPIE-IS&T.
dc.description.natureLink_to_subscribed_fulltext
dc.identifier.citationProceedings Of Spie - The International Society For Optical Engineering, 2006, v. 6056 [How to Cite?]
DOI: http://dx.doi.org/10.1117/12.650023
dc.identifier.doihttp://dx.doi.org/10.1117/12.650023
dc.identifier.issn0277-786X
2011 SCImago Journal Rankings: 0.046
dc.identifier.scopuseid_2-s2.0-33645504465
dc.identifier.urihttp://hdl.handle.net/10722/158437
dc.identifier.volume6056
dc.languageeng
dc.publisherS P I E - International Society for Optical Engineering. The Journal's web site is located at http://spie.org/x1848.xml
dc.publisher.placeUnited States
dc.relation.ispartofProceedings of SPIE - The International Society for Optical Engineering
dc.relation.referencesReferences in Scopus
dc.subject3D From Structured Light
dc.subjectDepth Of Field
dc.subjectField Of View
dc.subjectLens Design
dc.subjectMachine Vision
dc.subjectModulation Transfer Function
dc.titleA novel design of grating projection system for 3D reconstruction of wafer bumps
dc.typeConference_Paper
Author Affiliations
  1. ASM Assembly Automation Ltd.
  2. The University of Hong Kong
  3. Xi'an Jiaotong University
  4. Chinese University of Hong Kong