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- Publisher Website: 10.1016/j.orgel.2012.03.027
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Article: Low power flexible organic thin film transistors with amorphous Ba0.7Sr0.3TiO3 gate dielectric grown by pulsed laser deposition at low temperature
Title | Low power flexible organic thin film transistors with amorphous Ba0.7Sr0.3TiO3 gate dielectric grown by pulsed laser deposition at low temperature | ||||
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Authors | |||||
Keywords | Bending radius Dielectric thin films High-k dielectric Low operating power Low power | ||||
Issue Date | 2012 | ||||
Publisher | Elsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/orgel | ||||
Citation | Organic Electronics, 2012, v. 13 n. 7, p. 1223-1228 How to Cite? | ||||
Abstract | We deposited amorphous Ba0.7Sr0.3TiO3 (BST) on silicon and plastic substrate under 110 °C by pulsed laser deposition (PLD) and use it as the dielectric of the organic transistor. Depends on the thickness of BST layer, the highest mobility of the devices can achieve 1.24 cm 2 V -1 s -1 and 1.01 cm 2 V -1 s -1 on the silicon and polyethylene naphthalate (PEN) substrate, respectively. We also studied the upward and downward bending tests on the transistors and the dielectric thin films. We found that the BST dielectric pentacene transistor can maintain the mobility at 0.5 cm 2 V -1 s -1 or higher while the bending radius is around 3 mm in both upward and downward bending. Our finding demonstrates the potential application of PLD growth high-k dielectric in the large area organic electronics devices. © 2012 Elsevier B.V. All rights reserved. | ||||
Persistent Identifier | http://hdl.handle.net/10722/157190 | ||||
ISSN | 2023 Impact Factor: 2.7 2023 SCImago Journal Rankings: 0.648 | ||||
ISI Accession Number ID |
Funding Information: The work is supported by HKU (Code: 201109159013) and Poly (Code: J-BB9P). | ||||
References | |||||
Grants |
DC Field | Value | Language |
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dc.contributor.author | Wang, ZR | en_US |
dc.contributor.author | Xin, JZ | en_US |
dc.contributor.author | Ren, XC | en_US |
dc.contributor.author | Wang, XL | en_US |
dc.contributor.author | Leung, CW | en_US |
dc.contributor.author | Shi, SQ | en_US |
dc.contributor.author | Ruotolo, A | en_US |
dc.contributor.author | Chan, PKL | en_US |
dc.date.accessioned | 2012-08-08T08:45:44Z | - |
dc.date.available | 2012-08-08T08:45:44Z | - |
dc.date.issued | 2012 | en_US |
dc.identifier.citation | Organic Electronics, 2012, v. 13 n. 7, p. 1223-1228 | en_US |
dc.identifier.issn | 1566-1199 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/157190 | - |
dc.description.abstract | We deposited amorphous Ba0.7Sr0.3TiO3 (BST) on silicon and plastic substrate under 110 °C by pulsed laser deposition (PLD) and use it as the dielectric of the organic transistor. Depends on the thickness of BST layer, the highest mobility of the devices can achieve 1.24 cm 2 V -1 s -1 and 1.01 cm 2 V -1 s -1 on the silicon and polyethylene naphthalate (PEN) substrate, respectively. We also studied the upward and downward bending tests on the transistors and the dielectric thin films. We found that the BST dielectric pentacene transistor can maintain the mobility at 0.5 cm 2 V -1 s -1 or higher while the bending radius is around 3 mm in both upward and downward bending. Our finding demonstrates the potential application of PLD growth high-k dielectric in the large area organic electronics devices. © 2012 Elsevier B.V. All rights reserved. | en_US |
dc.language | eng | en_US |
dc.publisher | Elsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/orgel | en_US |
dc.relation.ispartof | Organic Electronics | en_US |
dc.subject | Bending radius | en_US |
dc.subject | Dielectric thin films | en_US |
dc.subject | High-k dielectric | en_US |
dc.subject | Low operating power | en_US |
dc.subject | Low power | en_US |
dc.title | Low power flexible organic thin film transistors with amorphous Ba0.7Sr0.3TiO3 gate dielectric grown by pulsed laser deposition at low temperature | en_US |
dc.type | Article | en_US |
dc.identifier.email | Leung, CW: Dennis.Leung@inet.polyu.edu.hk | en_US |
dc.identifier.email | Shi, SQ: mmsqshi@inet.polyu.edu.hk | - |
dc.identifier.email | Chan, PKL: pklc@hku.hk | - |
dc.identifier.authority | Chan, PKL=rp01532 | en_US |
dc.description.nature | link_to_subscribed_fulltext | en_US |
dc.identifier.doi | 10.1016/j.orgel.2012.03.027 | en_US |
dc.identifier.scopus | eid_2-s2.0-84859935314 | en_US |
dc.identifier.hkuros | 202973 | - |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-84859935314&selection=ref&src=s&origin=recordpage | en_US |
dc.identifier.volume | 13 | en_US |
dc.identifier.issue | 7 | en_US |
dc.identifier.spage | 1223 | en_US |
dc.identifier.epage | 1228 | en_US |
dc.identifier.eissn | 1878-5530 | - |
dc.identifier.isi | WOS:000303917100016 | - |
dc.publisher.place | Netherlands | en_US |
dc.relation.project | High performance organic memory memories | - |
dc.identifier.scopusauthorid | Chan, PKL=35742829700 | en_US |
dc.identifier.scopusauthorid | Ruotolo, A=8587362900 | en_US |
dc.identifier.scopusauthorid | Shi, SQ=7402200920 | en_US |
dc.identifier.scopusauthorid | Leung, CW=55192281000 | en_US |
dc.identifier.scopusauthorid | Wang, XL=54901873000 | en_US |
dc.identifier.scopusauthorid | Ren, XC=37666062300 | en_US |
dc.identifier.scopusauthorid | Xin, JZ=35730469800 | en_US |
dc.identifier.scopusauthorid | Wang, ZR=55192577000 | en_US |
dc.identifier.citeulike | 10605868 | - |
dc.identifier.issnl | 1566-1199 | - |