Article: Nanoimprint lithography with ≤60 nm overlay precision
| Title | Nanoimprint lithography with ≤60 nm overlay precision |
|---|---|
| Authors | Wu, W1 Walmsley, RG1 Li, WD1 Li, X1 Williams, RS1 |
| Keywords | Lithography Nanoimprint Overlay |
| Issue Date | 2012 |
| Citation | Hp Laboratories Technical Report, 2012 n. 6 [How to Cite?] |
| Abstract | Nanoimprint lithography (NIL) is a high-resolution, high-throughput and cost-effective nano-patterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm. © Copyright 2011 Hewlett-Packard Development Company, L.P. |
| References | References in Scopus |
| dc.contributor.author | Wu, W |
|---|---|
| dc.contributor.author | Walmsley, RG |
| dc.contributor.author | Li, WD |
| dc.contributor.author | Li, X |
| dc.contributor.author | Williams, RS |
| dc.date.accessioned | 2012-08-08T08:45:37Z |
| dc.date.available | 2012-08-08T08:45:37Z |
| dc.date.issued | 2012 |
| dc.description.abstract | Nanoimprint lithography (NIL) is a high-resolution, high-throughput and cost-effective nano-patterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm. © Copyright 2011 Hewlett-Packard Development Company, L.P. |
| dc.description.nature | Link_to_subscribed_fulltext |
| dc.identifier.citation | Hp Laboratories Technical Report, 2012 n. 6 [How to Cite?] |
| dc.identifier.issue | 6 |
| dc.identifier.scopus | eid_2-s2.0-84862946450 |
| dc.identifier.uri | http://hdl.handle.net/10722/157167 |
| dc.language | eng |
| dc.relation.ispartof | HP Laboratories Technical Report |
| dc.relation.references | References in Scopus |
| dc.subject | Lithography |
| dc.subject | Nanoimprint |
| dc.subject | Overlay |
| dc.title | Nanoimprint lithography with ≤60 nm overlay precision |
| dc.type | Article |
Author Affiliations
- Hewlett Packard Laboratories