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Article: Nanoimprint lithography with ≤60 nm overlay precision

TitleNanoimprint lithography with ≤60 nm overlay precision
Authors
KeywordsLithography
Nanoimprint
Overlay
Issue Date2012
Citation
Hp Laboratories Technical Report, 2012 n. 6 How to Cite?
Abstract
Nanoimprint lithography (NIL) is a high-resolution, high-throughput and cost-effective nano-patterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm. © Copyright 2011 Hewlett-Packard Development Company, L.P.
Persistent Identifierhttp://hdl.handle.net/10722/157167
References

 

Author Affiliations
  1. Hewlett Packard Laboratories
DC FieldValueLanguage
dc.contributor.authorWu, Wen_US
dc.contributor.authorWalmsley, RGen_US
dc.contributor.authorLi, WDen_US
dc.contributor.authorLi, Xen_US
dc.contributor.authorWilliams, RSen_US
dc.date.accessioned2012-08-08T08:45:37Z-
dc.date.available2012-08-08T08:45:37Z-
dc.date.issued2012en_US
dc.identifier.citationHp Laboratories Technical Report, 2012 n. 6en_US
dc.identifier.urihttp://hdl.handle.net/10722/157167-
dc.description.abstractNanoimprint lithography (NIL) is a high-resolution, high-throughput and cost-effective nano-patterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm. © Copyright 2011 Hewlett-Packard Development Company, L.P.en_US
dc.languageengen_US
dc.relation.ispartofHP Laboratories Technical Reporten_US
dc.subjectLithographyen_US
dc.subjectNanoimprinten_US
dc.subjectOverlayen_US
dc.titleNanoimprint lithography with ≤60 nm overlay precisionen_US
dc.typeArticleen_US
dc.identifier.emailLi, WD:liwd@hku.hken_US
dc.identifier.authorityLi, WD=rp01581en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.scopuseid_2-s2.0-84862946450en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-84855644171&selection=ref&src=s&origin=recordpageen_US
dc.identifier.issue6en_US
dc.identifier.scopusauthoridWu, W=7407081009en_US
dc.identifier.scopusauthoridWalmsley, RG=7005133542en_US
dc.identifier.scopusauthoridLi, WD=35181575900en_US
dc.identifier.scopusauthoridLi, X=7501699789en_US
dc.identifier.scopusauthoridWilliams, RS=7409606427en_US

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