File Download
  • No File Attached
 
Links for fulltext
(May Require Subscription)
 
Supplementary

Article: Nanoimprint lithography with ≤60 nm overlay precision
  • Basic View
  • Metadata View
  • XML View
TitleNanoimprint lithography with ≤60 nm overlay precision
 
AuthorsWu, W1
Walmsley, RG1
Li, WD1
Li, X1
Williams, RS1
 
KeywordsLithography
Nanoimprint
Overlay
 
Issue Date2012
 
CitationHp Laboratories Technical Report, 2012 n. 6 [How to Cite?]
 
AbstractNanoimprint lithography (NIL) is a high-resolution, high-throughput and cost-effective nano-patterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm. © Copyright 2011 Hewlett-Packard Development Company, L.P.
 
ReferencesReferences in Scopus
 
DC FieldValue
dc.contributor.authorWu, W
 
dc.contributor.authorWalmsley, RG
 
dc.contributor.authorLi, WD
 
dc.contributor.authorLi, X
 
dc.contributor.authorWilliams, RS
 
dc.date.accessioned2012-08-08T08:45:37Z
 
dc.date.available2012-08-08T08:45:37Z
 
dc.date.issued2012
 
dc.description.abstractNanoimprint lithography (NIL) is a high-resolution, high-throughput and cost-effective nano-patterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of ≤60 nm. © Copyright 2011 Hewlett-Packard Development Company, L.P.
 
dc.description.naturelink_to_subscribed_fulltext
 
dc.identifier.citationHp Laboratories Technical Report, 2012 n. 6 [How to Cite?]
 
dc.identifier.issue6
 
dc.identifier.scopuseid_2-s2.0-84862946450
 
dc.identifier.urihttp://hdl.handle.net/10722/157167
 
dc.languageeng
 
dc.relation.ispartofHP Laboratories Technical Report
 
dc.relation.referencesReferences in Scopus
 
dc.subjectLithography
 
dc.subjectNanoimprint
 
dc.subjectOverlay
 
dc.titleNanoimprint lithography with ≤60 nm overlay precision
 
dc.typeArticle
 
<?xml encoding="utf-8" version="1.0"?>
<item><contributor.author>Wu, W</contributor.author>
<contributor.author>Walmsley, RG</contributor.author>
<contributor.author>Li, WD</contributor.author>
<contributor.author>Li, X</contributor.author>
<contributor.author>Williams, RS</contributor.author>
<date.accessioned>2012-08-08T08:45:37Z</date.accessioned>
<date.available>2012-08-08T08:45:37Z</date.available>
<date.issued>2012</date.issued>
<identifier.citation>Hp Laboratories Technical Report, 2012 n. 6</identifier.citation>
<identifier.uri>http://hdl.handle.net/10722/157167</identifier.uri>
<description.abstract>Nanoimprint lithography (NIL) is a high-resolution, high-throughput and cost-effective nano-patterning technology. However, the overlay accuracy is lagging behind the resolution because of the high cost of mechanical precision. We have built an inexpensive stand-alone machine based on the wafer bowing nanoimprint process, and demonstrated single-point overlay of two transferred pattern layers with an accuracy of &#8804;60 nm. &#169; Copyright 2011 Hewlett-Packard Development Company, L.P.</description.abstract>
<language>eng</language>
<relation.ispartof>HP Laboratories Technical Report</relation.ispartof>
<subject>Lithography</subject>
<subject>Nanoimprint</subject>
<subject>Overlay</subject>
<title>Nanoimprint lithography with &#8804;60 nm overlay precision</title>
<type>Article</type>
<description.nature>link_to_subscribed_fulltext</description.nature>
<identifier.scopus>eid_2-s2.0-84862946450</identifier.scopus>
<relation.references>http://www.scopus.com/mlt/select.url?eid=2-s2.0-84855644171&amp;selection=ref&amp;src=s&amp;origin=recordpage</relation.references>
<identifier.issue>6</identifier.issue>
</item>
Author Affiliations
  1. Hewlett Packard Laboratories