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Article: Dynamic finite element analysis of photopolymerization in stereolithography

TitleDynamic finite element analysis of photopolymerization in stereolithography
Authors
KeywordsFinite Element Analysis
Simulation
Size Reduction
Issue Date2006
PublisherEmerald Group Publishing Limited. The Journal's web site is located at http://www.emeraldinsight.com/info/journals/rpj/rpj.jsp
Citation
Rapid Prototyping Journal, 2006, v. 12 n. 3, p. 173-180 How to Cite?
AbstractPurpose - This paper aims to introduce the principle of the mask exposure and scanning stereolithography (MESS) and to develop a simulation code to analyze the MESS process. Design/methodology/approach - Photopolymerization is a key reaction in stereolithography. It brings about molecular linkage and releases exothermic temperature. The shrinkage effect is the major cause of prototype deformation, and the shrinkage resulting from scanning and mask exposing is different. It is important to analyze the inaccuracy of each curing layer after the mask exposing in order to optimize the scanning parameters. A simulation code, based on dynamic finite element method, to analyze the shrinkage effect in accordance with scanning path and mask exposure pattern. A benchmark model has been proposed to validate the implementation of the developed code. Findings - The simulation results show that the developed code can analyze the deformation in laser scanning, masking exposing and the MESS process. In benchmark model study, the sharp corner shrinks faster than rounded edge in mask pattern curing. Although the profile scanning can maintain the high accuracy in the MESS process, the residual stress is easily discovered inside of the sharp corner. Originality/value - The developed simulation code can be applied for optimizing scan path and exposing time due to the analysis process in accordance with the drawing path and fabrication parameters. © Emerald Group Publishing Limited.
Persistent Identifierhttp://hdl.handle.net/10722/156832
ISSN
2015 Impact Factor: 1.352
2015 SCImago Journal Rankings: 0.808
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorJiang, CPen_US
dc.contributor.authorHuang, YMen_US
dc.contributor.authorLiu, CHen_US
dc.date.accessioned2012-08-08T08:44:09Z-
dc.date.available2012-08-08T08:44:09Z-
dc.date.issued2006en_US
dc.identifier.citationRapid Prototyping Journal, 2006, v. 12 n. 3, p. 173-180en_US
dc.identifier.issn1355-2546en_US
dc.identifier.urihttp://hdl.handle.net/10722/156832-
dc.description.abstractPurpose - This paper aims to introduce the principle of the mask exposure and scanning stereolithography (MESS) and to develop a simulation code to analyze the MESS process. Design/methodology/approach - Photopolymerization is a key reaction in stereolithography. It brings about molecular linkage and releases exothermic temperature. The shrinkage effect is the major cause of prototype deformation, and the shrinkage resulting from scanning and mask exposing is different. It is important to analyze the inaccuracy of each curing layer after the mask exposing in order to optimize the scanning parameters. A simulation code, based on dynamic finite element method, to analyze the shrinkage effect in accordance with scanning path and mask exposure pattern. A benchmark model has been proposed to validate the implementation of the developed code. Findings - The simulation results show that the developed code can analyze the deformation in laser scanning, masking exposing and the MESS process. In benchmark model study, the sharp corner shrinks faster than rounded edge in mask pattern curing. Although the profile scanning can maintain the high accuracy in the MESS process, the residual stress is easily discovered inside of the sharp corner. Originality/value - The developed simulation code can be applied for optimizing scan path and exposing time due to the analysis process in accordance with the drawing path and fabrication parameters. © Emerald Group Publishing Limited.en_US
dc.languageengen_US
dc.publisherEmerald Group Publishing Limited. The Journal's web site is located at http://www.emeraldinsight.com/info/journals/rpj/rpj.jspen_US
dc.relation.ispartofRapid Prototyping Journalen_US
dc.subjectFinite Element Analysisen_US
dc.subjectSimulationen_US
dc.subjectSize Reductionen_US
dc.titleDynamic finite element analysis of photopolymerization in stereolithographyen_US
dc.typeArticleen_US
dc.identifier.emailLiu, CH:chliu@hkucc.hku.hken_US
dc.identifier.authorityLiu, CH=rp00152en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1108/13552540610670753en_US
dc.identifier.scopuseid_2-s2.0-33745058070en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-33745058070&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume12en_US
dc.identifier.issue3en_US
dc.identifier.spage173en_US
dc.identifier.epage180en_US
dc.identifier.isiWOS:000239018600009-
dc.publisher.placeUnited Kingdomen_US
dc.identifier.scopusauthoridJiang, CP=8853545500en_US
dc.identifier.scopusauthoridHuang, YM=7501575322en_US
dc.identifier.scopusauthoridLiu, CH=36065161300en_US

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