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Article: Three-dimensional phase field simulation for surface roughening of heteroepitaxial films with elastic anisotropy

TitleThree-dimensional phase field simulation for surface roughening of heteroepitaxial films with elastic anisotropy
Authors
KeywordsA1. Anisotropy
A1. Phase Field Method
A1. Surface Morphology
A3. Epitaxy
Issue Date2005
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/jcrysgro
Citation
Journal of Crystal Growth, 2005, v. 284 n. 1-2, p. 281-292 How to Cite?
AbstractThe phase field methods have been employed to study the surface roughening of heteroepitaxial films with cubic elastic anisotropy in three dimensions during the annealing process. And the stress field for an arbitrarily-shaped surface has been simultaneously solved using the phase field microelasticity model. Our simulations reveal that the self-organized surface morphologies are strongly dependent on the elastic anisotropy. It is interesting to note that one can obtain favorable surface morphologies via selection of appropriate epitaxial orientations combined with tuning the strength of elastic anisotropy or modifying the asymmetric strains induced by lattice mismatches between the epitaxial materials and substrates. © 2005 Elsevier B.V. All rights reserved.
Persistent Identifierhttp://hdl.handle.net/10722/156781
ISSN
2021 Impact Factor: 1.830
2020 SCImago Journal Rankings: 0.513
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorNi, Yen_US
dc.contributor.authorHe, LHen_US
dc.contributor.authorSoh, AKen_US
dc.date.accessioned2012-08-08T08:43:57Z-
dc.date.available2012-08-08T08:43:57Z-
dc.date.issued2005en_US
dc.identifier.citationJournal of Crystal Growth, 2005, v. 284 n. 1-2, p. 281-292en_US
dc.identifier.issn0022-0248en_US
dc.identifier.urihttp://hdl.handle.net/10722/156781-
dc.description.abstractThe phase field methods have been employed to study the surface roughening of heteroepitaxial films with cubic elastic anisotropy in three dimensions during the annealing process. And the stress field for an arbitrarily-shaped surface has been simultaneously solved using the phase field microelasticity model. Our simulations reveal that the self-organized surface morphologies are strongly dependent on the elastic anisotropy. It is interesting to note that one can obtain favorable surface morphologies via selection of appropriate epitaxial orientations combined with tuning the strength of elastic anisotropy or modifying the asymmetric strains induced by lattice mismatches between the epitaxial materials and substrates. © 2005 Elsevier B.V. All rights reserved.en_US
dc.languageengen_US
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/jcrysgroen_US
dc.relation.ispartofJournal of Crystal Growthen_US
dc.rightsJournal of Crystal Growth. Copyright © Elsevier BV.-
dc.subjectA1. Anisotropyen_US
dc.subjectA1. Phase Field Methoden_US
dc.subjectA1. Surface Morphologyen_US
dc.subjectA3. Epitaxyen_US
dc.titleThree-dimensional phase field simulation for surface roughening of heteroepitaxial films with elastic anisotropyen_US
dc.typeArticleen_US
dc.identifier.emailSoh, AK: aksoh@hkucc.hku.hken_US
dc.identifier.authoritySoh, AK=rp00170en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1016/j.jcrysgro.2005.07.026en_US
dc.identifier.scopuseid_2-s2.0-25144454075en_US
dc.identifier.hkuros116604-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-25144454075&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume284en_US
dc.identifier.issue1-2en_US
dc.identifier.spage281en_US
dc.identifier.epage292en_US
dc.identifier.isiWOS:000232387900038-
dc.publisher.placeNetherlandsen_US
dc.identifier.scopusauthoridNi, Y=16836857400en_US
dc.identifier.scopusauthoridHe, LH=7403374517en_US
dc.identifier.scopusauthoridSoh, AK=7006795203en_US
dc.identifier.citeulike325843-
dc.identifier.issnl0022-0248-

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