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Article: High-precision large deflection measurements of thin films using time sequence speckle pattern interferometry

TitleHigh-precision large deflection measurements of thin films using time sequence speckle pattern interferometry
Authors
KeywordsLarge Deformation
Thin Film
Time Sequence Speckle Pattern Interferometry
Issue Date2002
PublisherInstitute of Physics Publishing. The Journal's web site is located at http://www.iop.org/Journals/mst
Citation
Measurement Science And Technology, 2002, v. 13 n. 8, p. 1304-1310 How to Cite?
AbstractThe rapid development of microelectromechanical systems, thin-film technology and material research in mechanical behaviours has provided new impetus to handle high-precision and large-amplitude deformation measurements. Optical methods are very useful in making non-contact and full field measurements of the deformation of an object. However, there is a gap between the sensitivity and the measurement range in the existing coherent and incoherent optical methods. In this paper, we propose some approaches to employ time sequence speckle pattern interferometry to measure large deformations of pure Ni thin films subjected to bending with high sensitivity. We introduce a new large deformation measurement system, which includes a digital speckle interferometry and a micro loading system, and we propose two methods of phase demodulation in this paper. The new system is capable of automatically applying micro loading and continously capturing the temporal speckle patterns imaged from the flexural surfaces of the thin film. Forty thousand frames of the time sequence speckle patterns have been recorded and the maximum deflection of about 1400 μm has been measured with sensitivities of λ/2 and λ/4 by the different proposed methods, respectively.
Persistent Identifierhttp://hdl.handle.net/10722/156636
ISSN
2015 Impact Factor: 1.492
2015 SCImago Journal Rankings: 0.719
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorLi, Xen_US
dc.contributor.authorSoh, AKen_US
dc.contributor.authorDeng, Ben_US
dc.contributor.authorGuo, Xen_US
dc.date.accessioned2012-08-08T08:43:19Z-
dc.date.available2012-08-08T08:43:19Z-
dc.date.issued2002en_US
dc.identifier.citationMeasurement Science And Technology, 2002, v. 13 n. 8, p. 1304-1310en_US
dc.identifier.issn0957-0233en_US
dc.identifier.urihttp://hdl.handle.net/10722/156636-
dc.description.abstractThe rapid development of microelectromechanical systems, thin-film technology and material research in mechanical behaviours has provided new impetus to handle high-precision and large-amplitude deformation measurements. Optical methods are very useful in making non-contact and full field measurements of the deformation of an object. However, there is a gap between the sensitivity and the measurement range in the existing coherent and incoherent optical methods. In this paper, we propose some approaches to employ time sequence speckle pattern interferometry to measure large deformations of pure Ni thin films subjected to bending with high sensitivity. We introduce a new large deformation measurement system, which includes a digital speckle interferometry and a micro loading system, and we propose two methods of phase demodulation in this paper. The new system is capable of automatically applying micro loading and continously capturing the temporal speckle patterns imaged from the flexural surfaces of the thin film. Forty thousand frames of the time sequence speckle patterns have been recorded and the maximum deflection of about 1400 μm has been measured with sensitivities of λ/2 and λ/4 by the different proposed methods, respectively.en_US
dc.languageengen_US
dc.publisherInstitute of Physics Publishing. The Journal's web site is located at http://www.iop.org/Journals/msten_US
dc.relation.ispartofMeasurement Science and Technologyen_US
dc.subjectLarge Deformationen_US
dc.subjectThin Filmen_US
dc.subjectTime Sequence Speckle Pattern Interferometryen_US
dc.titleHigh-precision large deflection measurements of thin films using time sequence speckle pattern interferometryen_US
dc.typeArticleen_US
dc.identifier.emailSoh, AK:aksoh@hkucc.hku.hken_US
dc.identifier.authoritySoh, AK=rp00170en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1088/0957-0233/13/8/319en_US
dc.identifier.scopuseid_2-s2.0-0036677484en_US
dc.identifier.hkuros67227-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0036677484&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume13en_US
dc.identifier.issue8en_US
dc.identifier.spage1304en_US
dc.identifier.epage1310en_US
dc.identifier.isiWOS:000177707100020-
dc.publisher.placeUnited Kingdomen_US
dc.identifier.scopusauthoridLi, X=8438025900en_US
dc.identifier.scopusauthoridSoh, AK=7006795203en_US
dc.identifier.scopusauthoridDeng, B=55107004100en_US
dc.identifier.scopusauthoridGuo, X=55202829600en_US

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