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- WOS: WOS:000167038200008
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Article: Depth dependence of hardness in copper single crystals measured by nanoindentation
Title | Depth dependence of hardness in copper single crystals measured by nanoindentation |
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Authors | |
Issue Date | 2001 |
Publisher | Pergamon. The Journal's web site is located at http://www.elsevier.com/locate/scriptamat |
Citation | Scripta Materialia, 2001, v. 44 n. 2, p. 237-241 How to Cite? |
Abstract | The depth dependence of hardness in copper single crystals was studied using nanoindentation methods. Results show the depth effect on hardness of the crystals is related to the polishing methods. Mechanical polish results in higher hardness value than electropolish as the load increases. |
Persistent Identifier | http://hdl.handle.net/10722/156587 |
ISSN | 2023 Impact Factor: 5.3 2023 SCImago Journal Rankings: 1.738 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
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dc.contributor.author | Liu, Y | en_US |
dc.contributor.author | Ngan, AHW | en_US |
dc.date.accessioned | 2012-08-08T08:43:05Z | - |
dc.date.available | 2012-08-08T08:43:05Z | - |
dc.date.issued | 2001 | en_US |
dc.identifier.citation | Scripta Materialia, 2001, v. 44 n. 2, p. 237-241 | en_US |
dc.identifier.issn | 1359-6462 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/156587 | - |
dc.description.abstract | The depth dependence of hardness in copper single crystals was studied using nanoindentation methods. Results show the depth effect on hardness of the crystals is related to the polishing methods. Mechanical polish results in higher hardness value than electropolish as the load increases. | en_US |
dc.language | eng | en_US |
dc.publisher | Pergamon. The Journal's web site is located at http://www.elsevier.com/locate/scriptamat | en_US |
dc.relation.ispartof | Scripta Materialia | en_US |
dc.title | Depth dependence of hardness in copper single crystals measured by nanoindentation | en_US |
dc.type | Article | en_US |
dc.identifier.email | Ngan, AHW: hwngan@hkucc.hku.hk | en_US |
dc.identifier.authority | Ngan, AHW=rp00225 | en_US |
dc.description.nature | link_to_subscribed_fulltext | en_US |
dc.identifier.doi | 10.1016/S1359-6462(00)00598-4 | en_US |
dc.identifier.scopus | eid_2-s2.0-0035252466 | en_US |
dc.identifier.hkuros | 58590 | - |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-0035252466&selection=ref&src=s&origin=recordpage | en_US |
dc.identifier.volume | 44 | en_US |
dc.identifier.issue | 2 | en_US |
dc.identifier.spage | 237 | en_US |
dc.identifier.epage | 241 | en_US |
dc.identifier.isi | WOS:000167038200008 | - |
dc.publisher.place | United Kingdom | en_US |
dc.identifier.scopusauthorid | Liu, Y=36063528800 | en_US |
dc.identifier.scopusauthorid | Ngan, AHW=7006827202 | en_US |
dc.identifier.citeulike | 572398 | - |
dc.identifier.issnl | 1359-6462 | - |