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Article: Depth dependence of hardness in copper single crystals measured by nanoindentation

TitleDepth dependence of hardness in copper single crystals measured by nanoindentation
Authors
Issue Date2001
PublisherPergamon. The Journal's web site is located at http://www.elsevier.com/locate/scriptamat
Citation
Scripta Materialia, 2001, v. 44 n. 2, p. 237-241 How to Cite?
AbstractThe depth dependence of hardness in copper single crystals was studied using nanoindentation methods. Results show the depth effect on hardness of the crystals is related to the polishing methods. Mechanical polish results in higher hardness value than electropolish as the load increases.
Persistent Identifierhttp://hdl.handle.net/10722/156587
ISSN
2015 Impact Factor: 3.305
2015 SCImago Journal Rankings: 2.375
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorLiu, Yen_US
dc.contributor.authorNgan, AHWen_US
dc.date.accessioned2012-08-08T08:43:05Z-
dc.date.available2012-08-08T08:43:05Z-
dc.date.issued2001en_US
dc.identifier.citationScripta Materialia, 2001, v. 44 n. 2, p. 237-241en_US
dc.identifier.issn1359-6462en_US
dc.identifier.urihttp://hdl.handle.net/10722/156587-
dc.description.abstractThe depth dependence of hardness in copper single crystals was studied using nanoindentation methods. Results show the depth effect on hardness of the crystals is related to the polishing methods. Mechanical polish results in higher hardness value than electropolish as the load increases.en_US
dc.languageengen_US
dc.publisherPergamon. The Journal's web site is located at http://www.elsevier.com/locate/scriptamaten_US
dc.relation.ispartofScripta Materialiaen_US
dc.titleDepth dependence of hardness in copper single crystals measured by nanoindentationen_US
dc.typeArticleen_US
dc.identifier.emailNgan, AHW: hwngan@hkucc.hku.hken_US
dc.identifier.authorityNgan, AHW=rp00225en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1016/S1359-6462(00)00598-4en_US
dc.identifier.scopuseid_2-s2.0-0035252466en_US
dc.identifier.hkuros58590-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-0035252466&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume44en_US
dc.identifier.issue2en_US
dc.identifier.spage237en_US
dc.identifier.epage241en_US
dc.identifier.isiWOS:000167038200008-
dc.publisher.placeUnited Kingdomen_US
dc.identifier.scopusauthoridLiu, Y=36063528800en_US
dc.identifier.scopusauthoridNgan, AHW=7006827202en_US
dc.identifier.citeulike572398-

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