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Article: Pixelated source mask optimization for process robustness in optical lithography

TitlePixelated source mask optimization for process robustness in optical lithography
Authors
KeywordsCo-designs
Current technology
Feature sizes
Higher resolution
Lithographic process
Issue Date2011
PublisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.org
Citation
Optics Express, 2011, v. 19 n. 20, p. 19384-19398 How to Cite?
AbstractOptical lithography has enabled the printing of progressively smaller circuit patterns over the years. However, as the feature size shrinks, the lithographic process variation becomes more pronounced. Source-mask optimization (SMO) is a current technology allowing a co-design of the source and the mask for higher resolution imaging. In this paper, we develop a pixelated SMO using inverse imaging, and incorporate the statistical variations explicitly in an optimization framework. Simulation results demonstrate its efficacy in process robustness enhancement. © 2011 Optical Society of America.
Persistent Identifierhttp://hdl.handle.net/10722/155667
ISSN
2015 Impact Factor: 3.148
2015 SCImago Journal Rankings: 2.186
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorJia, Nen_US
dc.contributor.authorLam, EYen_US
dc.date.accessioned2012-08-08T08:34:44Z-
dc.date.available2012-08-08T08:34:44Z-
dc.date.issued2011en_US
dc.identifier.citationOptics Express, 2011, v. 19 n. 20, p. 19384-19398en_US
dc.identifier.issn1094-4087en_US
dc.identifier.urihttp://hdl.handle.net/10722/155667-
dc.description.abstractOptical lithography has enabled the printing of progressively smaller circuit patterns over the years. However, as the feature size shrinks, the lithographic process variation becomes more pronounced. Source-mask optimization (SMO) is a current technology allowing a co-design of the source and the mask for higher resolution imaging. In this paper, we develop a pixelated SMO using inverse imaging, and incorporate the statistical variations explicitly in an optimization framework. Simulation results demonstrate its efficacy in process robustness enhancement. © 2011 Optical Society of America.en_US
dc.languageengen_US
dc.publisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.orgen_US
dc.relation.ispartofOptics Expressen_US
dc.rightsThis paper was published in [Optics Express] and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: [http://www.opticsinfobase.org/oe/abstract.cfm?uri=oe-19-20-19384]. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.subjectCo-designs-
dc.subjectCurrent technology-
dc.subjectFeature sizes-
dc.subjectHigher resolution-
dc.subjectLithographic process-
dc.titlePixelated source mask optimization for process robustness in optical lithographyen_US
dc.typeArticleen_US
dc.identifier.emailLam, EY: elam@eee.hku.hken_US
dc.identifier.authorityLam, EY=rp00131en_US
dc.description.naturepublished_or_final_versionen_US
dc.identifier.doi10.1364/OE.19.019384en_US
dc.identifier.pmid21996879-
dc.identifier.scopuseid_2-s2.0-80053281459en_US
dc.identifier.hkuros200963-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-80053281459&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume19en_US
dc.identifier.issue20en_US
dc.identifier.spage19384en_US
dc.identifier.epage19398en_US
dc.identifier.isiWOS:000295373800063-
dc.publisher.placeUnited Statesen_US
dc.identifier.scopusauthoridLam, EY=7102890004en_US
dc.identifier.scopusauthoridJia, N=34872289800en_US

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