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Article: Pixelated source mask optimization for process robustness in optical lithography

TitlePixelated source mask optimization for process robustness in optical lithography
Authors
Jia, NLam, EY
KeywordsCo-designs
Current technology
Feature sizes
Higher resolution
Lithographic process
Issue Date2011
PublisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.org
Citation
Optics Express, 2011, v. 19 n. 20, p. 19384-19398 How to Cite?
DOI: http://dx.doi.org/10.1364/OE.19.019384
AbstractOptical lithography has enabled the printing of progressively smaller circuit patterns over the years. However, as the feature size shrinks, the lithographic process variation becomes more pronounced. Source-mask optimization (SMO) is a current technology allowing a co-design of the source and the mask for higher resolution imaging. In this paper, we develop a pixelated SMO using inverse imaging, and incorporate the statistical variations explicitly in an optimization framework. Simulation results demonstrate its efficacy in process robustness enhancement. © 2011 Optical Society of America.
Persistent Identifierhttp://hdl.handle.net/10722/155667
ISSN
1094-4087
2021 Impact Factor: 3.833
2020 SCImago Journal Rankings: 1.394
ISI Accession Number ID
WOS:000295373800063
References
References in Scopus

 

DC FieldValueLanguage
dc.contributor.authorJia, Nen_US
dc.contributor.authorLam, EYen_US
dc.date.accessioned2012-08-08T08:34:44Z-
dc.date.available2012-08-08T08:34:44Z-
dc.date.issued2011en_US
dc.identifier.citationOptics Express, 2011, v. 19 n. 20, p. 19384-19398en_US
dc.identifier.issn1094-4087en_US
dc.identifier.urihttp://hdl.handle.net/10722/155667-
dc.description.abstractOptical lithography has enabled the printing of progressively smaller circuit patterns over the years. However, as the feature size shrinks, the lithographic process variation becomes more pronounced. Source-mask optimization (SMO) is a current technology allowing a co-design of the source and the mask for higher resolution imaging. In this paper, we develop a pixelated SMO using inverse imaging, and incorporate the statistical variations explicitly in an optimization framework. Simulation results demonstrate its efficacy in process robustness enhancement. © 2011 Optical Society of America.en_US
dc.languageengen_US
dc.publisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.orgen_US
dc.relation.ispartofOptics Expressen_US
dc.rightsThis paper was published in [Optics Express] and is made available as an electronic reprint with the permission of OSA. The paper can be found at the following URL on the OSA website: [http://www.opticsinfobase.org/oe/abstract.cfm?uri=oe-19-20-19384]. Systematic or multiple reproduction or distribution to multiple locations via electronic or other means is prohibited and is subject to penalties under law.-
dc.subjectCo-designs-
dc.subjectCurrent technology-
dc.subjectFeature sizes-
dc.subjectHigher resolution-
dc.subjectLithographic process-
dc.titlePixelated source mask optimization for process robustness in optical lithographyen_US
dc.typeArticleen_US
dc.identifier.emailLam, EY: elam@eee.hku.hken_US
dc.identifier.authorityLam, EY=rp00131en_US
dc.description.naturepublished_or_final_versionen_US
dc.identifier.doi10.1364/OE.19.019384en_US
dc.identifier.pmid21996879-
dc.identifier.scopuseid_2-s2.0-80053281459en_US
dc.identifier.hkuros200963-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-80053281459&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume19en_US
dc.identifier.issue20en_US
dc.identifier.spage19384en_US
dc.identifier.epage19398en_US
dc.identifier.isiWOS:000295373800063-
dc.publisher.placeUnited Statesen_US
dc.identifier.scopusauthoridLam, EY=7102890004en_US
dc.identifier.scopusauthoridJia, N=34872289800en_US
dc.identifier.issnl1094-4087-

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