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Article: Level-set-based inverse lithography for photomask synthesis

TitleLevel-set-based inverse lithography for photomask synthesis
Authors
Issue Date2009
PublisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.org
Citation
Optics Express, 2009, v. 17 n. 26, p. 23690-23701 How to Cite?
AbstractInverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem. We show how the inverse lithography problem can be addressed as an obstacle reconstruction problem or an extended nonlinear image restoration problem, and then solved by a level set time-dependent model with finite difference schemes. We present explicit detailed formulation of the problem together with the first-order temporal and second-order spatial accurate discretization scheme. Experimental results show the superiority of the proposed level set-based ILT over the mainstream gradient methods. © 2009 Optical Society of America.
Persistent Identifierhttp://hdl.handle.net/10722/155551
ISSN
2015 Impact Factor: 3.148
2015 SCImago Journal Rankings: 2.186
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorShen, Yen_US
dc.contributor.authorWong, Nen_US
dc.contributor.authorLam, EYen_US
dc.date.accessioned2012-08-08T08:34:03Z-
dc.date.available2012-08-08T08:34:03Z-
dc.date.issued2009en_US
dc.identifier.citationOptics Express, 2009, v. 17 n. 26, p. 23690-23701en_US
dc.identifier.issn1094-4087en_US
dc.identifier.urihttp://hdl.handle.net/10722/155551-
dc.description.abstractInverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem. We show how the inverse lithography problem can be addressed as an obstacle reconstruction problem or an extended nonlinear image restoration problem, and then solved by a level set time-dependent model with finite difference schemes. We present explicit detailed formulation of the problem together with the first-order temporal and second-order spatial accurate discretization scheme. Experimental results show the superiority of the proposed level set-based ILT over the mainstream gradient methods. © 2009 Optical Society of America.en_US
dc.languageengen_US
dc.publisherOptical Society of America. The Journal's web site is located at http://www.opticsexpress.orgen_US
dc.relation.ispartofOptics Expressen_US
dc.subject.meshComputer Simulationen_US
dc.subject.meshImage Interpretation, Computer-Assisted - Methodsen_US
dc.subject.meshLighten_US
dc.subject.meshManufactured Materials - Radiation Effectsen_US
dc.subject.meshModels, Chemicalen_US
dc.subject.meshPhotochemistry - Methodsen_US
dc.subject.meshPhotography - Methodsen_US
dc.titleLevel-set-based inverse lithography for photomask synthesisen_US
dc.typeArticleen_US
dc.identifier.emailWong, N:nwong@eee.hku.hken_US
dc.identifier.emailLam, EY:elam@eee.hku.hken_US
dc.identifier.authorityWong, N=rp00190en_US
dc.identifier.authorityLam, EY=rp00131en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1364/OE.17.023690en_US
dc.identifier.pmid20052080en_US
dc.identifier.scopuseid_2-s2.0-73949128929en_US
dc.identifier.hkuros171682-
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-73949128929&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume17en_US
dc.identifier.issue26en_US
dc.identifier.spage23690en_US
dc.identifier.epage23701en_US
dc.identifier.isiWOS:000273156200038-
dc.publisher.placeUnited Statesen_US
dc.identifier.scopusauthoridShen, Y=12804295400en_US
dc.identifier.scopusauthoridWong, N=35235551600en_US
dc.identifier.scopusauthoridLam, EY=7102890004en_US

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