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- Publisher Website: 10.1364/OE.17.023690
- Scopus: eid_2-s2.0-73949128929
- PMID: 20052080
- WOS: WOS:000273156200038
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Article: Level-set-based inverse lithography for photomask synthesis
Title | Level-set-based inverse lithography for photomask synthesis |
---|---|
Authors | |
Issue Date | 2009 |
Publisher | Optical Society of America. The Journal's web site is located at http://www.opticsexpress.org |
Citation | Optics Express, 2009, v. 17 n. 26, p. 23690-23701 How to Cite? |
Abstract | Inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem. We show how the inverse lithography problem can be addressed as an obstacle reconstruction problem or an extended nonlinear image restoration problem, and then solved by a level set time-dependent model with finite difference schemes. We present explicit detailed formulation of the problem together with the first-order temporal and second-order spatial accurate discretization scheme. Experimental results show the superiority of the proposed level set-based ILT over the mainstream gradient methods. © 2009 Optical Society of America. |
Persistent Identifier | http://hdl.handle.net/10722/155551 |
ISSN | 2023 Impact Factor: 3.2 2023 SCImago Journal Rankings: 0.998 |
ISI Accession Number ID | |
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Shen, Y | en_US |
dc.contributor.author | Wong, N | en_US |
dc.contributor.author | Lam, EY | en_US |
dc.date.accessioned | 2012-08-08T08:34:03Z | - |
dc.date.available | 2012-08-08T08:34:03Z | - |
dc.date.issued | 2009 | en_US |
dc.identifier.citation | Optics Express, 2009, v. 17 n. 26, p. 23690-23701 | en_US |
dc.identifier.issn | 1094-4087 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/155551 | - |
dc.description.abstract | Inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem. We show how the inverse lithography problem can be addressed as an obstacle reconstruction problem or an extended nonlinear image restoration problem, and then solved by a level set time-dependent model with finite difference schemes. We present explicit detailed formulation of the problem together with the first-order temporal and second-order spatial accurate discretization scheme. Experimental results show the superiority of the proposed level set-based ILT over the mainstream gradient methods. © 2009 Optical Society of America. | en_US |
dc.language | eng | en_US |
dc.publisher | Optical Society of America. The Journal's web site is located at http://www.opticsexpress.org | en_US |
dc.relation.ispartof | Optics Express | en_US |
dc.subject.mesh | Computer Simulation | en_US |
dc.subject.mesh | Image Interpretation, Computer-Assisted - Methods | en_US |
dc.subject.mesh | Light | en_US |
dc.subject.mesh | Manufactured Materials - Radiation Effects | en_US |
dc.subject.mesh | Models, Chemical | en_US |
dc.subject.mesh | Photochemistry - Methods | en_US |
dc.subject.mesh | Photography - Methods | en_US |
dc.title | Level-set-based inverse lithography for photomask synthesis | en_US |
dc.type | Article | en_US |
dc.identifier.email | Wong, N:nwong@eee.hku.hk | en_US |
dc.identifier.email | Lam, EY:elam@eee.hku.hk | en_US |
dc.identifier.authority | Wong, N=rp00190 | en_US |
dc.identifier.authority | Lam, EY=rp00131 | en_US |
dc.description.nature | link_to_subscribed_fulltext | en_US |
dc.identifier.doi | 10.1364/OE.17.023690 | en_US |
dc.identifier.pmid | 20052080 | en_US |
dc.identifier.scopus | eid_2-s2.0-73949128929 | en_US |
dc.identifier.hkuros | 171682 | - |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-73949128929&selection=ref&src=s&origin=recordpage | en_US |
dc.identifier.volume | 17 | en_US |
dc.identifier.issue | 26 | en_US |
dc.identifier.spage | 23690 | en_US |
dc.identifier.epage | 23701 | en_US |
dc.identifier.isi | WOS:000273156200038 | - |
dc.publisher.place | United States | en_US |
dc.identifier.scopusauthorid | Shen, Y=12804295400 | en_US |
dc.identifier.scopusauthorid | Wong, N=35235551600 | en_US |
dc.identifier.scopusauthorid | Lam, EY=7102890004 | en_US |
dc.identifier.issnl | 1094-4087 | - |