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Article: A new effective method for thermal annealing of magnetic tunnel junctions in air with protective overlayers

TitleA new effective method for thermal annealing of magnetic tunnel junctions in air with protective overlayers
Authors
Issue Date2008
PublisherAmerican Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp
Citation
Journal Of Applied Physics, 2008, v. 103 n. 7 How to Cite?
AbstractThermal annealing is an important process to enhance greatly the tunneling magnetoresistance (TMR) of magnetic tunnel junctions (MTJs). MTJ annealing is conventionally carried out in vacuum below 10-5 Torr. However, this method involves the cost and complications of using a vacuum furnace. Pumping and venting a chamber are time-consuming; moreover, the sample temperature is difficult to measure accurately and therefore not easy to control. We have developed a method and an instrument to perform thermal annealing of MTJs in air. The method is based on protective overlayers, and the instrument has a simple structure composed of an air heat gun, thermocouple with feedback control, permanent magnets for magnetic field, and a sample holder. The influence of thermal annealing in air on MTJs properties was studied systematically on Al2 O3 MTJ samples. The samples are successfully protected from oxidation by using AuRu, or Al2 O3 films as protective overlayers. The Al2 O3 overlayer can be removed easily with NaOH solution. A MgO MTJ sample was annealed with this technique and its TMR increased from 17.5% to 141.3%. © 2008 U.S. Government.
Persistent Identifierhttp://hdl.handle.net/10722/155452
ISSN
2015 Impact Factor: 2.101
2015 SCImago Journal Rankings: 0.603
ISI Accession Number ID
References

 

DC FieldValueLanguage
dc.contributor.authorPong, PWTen_US
dc.contributor.authorSchmoueli, Men_US
dc.contributor.authorLi, Fen_US
dc.contributor.authorEgelhoff, WFen_US
dc.date.accessioned2012-08-08T08:33:33Z-
dc.date.available2012-08-08T08:33:33Z-
dc.date.issued2008en_US
dc.identifier.citationJournal Of Applied Physics, 2008, v. 103 n. 7en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://hdl.handle.net/10722/155452-
dc.description.abstractThermal annealing is an important process to enhance greatly the tunneling magnetoresistance (TMR) of magnetic tunnel junctions (MTJs). MTJ annealing is conventionally carried out in vacuum below 10-5 Torr. However, this method involves the cost and complications of using a vacuum furnace. Pumping and venting a chamber are time-consuming; moreover, the sample temperature is difficult to measure accurately and therefore not easy to control. We have developed a method and an instrument to perform thermal annealing of MTJs in air. The method is based on protective overlayers, and the instrument has a simple structure composed of an air heat gun, thermocouple with feedback control, permanent magnets for magnetic field, and a sample holder. The influence of thermal annealing in air on MTJs properties was studied systematically on Al2 O3 MTJ samples. The samples are successfully protected from oxidation by using AuRu, or Al2 O3 films as protective overlayers. The Al2 O3 overlayer can be removed easily with NaOH solution. A MgO MTJ sample was annealed with this technique and its TMR increased from 17.5% to 141.3%. © 2008 U.S. Government.en_US
dc.languageengen_US
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jspen_US
dc.relation.ispartofJournal of Applied Physicsen_US
dc.titleA new effective method for thermal annealing of magnetic tunnel junctions in air with protective overlayersen_US
dc.typeArticleen_US
dc.identifier.emailPong, PWT:ppong@eee.hku.hken_US
dc.identifier.authorityPong, PWT=rp00217en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1063/1.2837618en_US
dc.identifier.scopuseid_2-s2.0-42149137367en_US
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-42149137367&selection=ref&src=s&origin=recordpageen_US
dc.identifier.volume103en_US
dc.identifier.issue7en_US
dc.identifier.isiWOS:000255043200674-
dc.publisher.placeUnited Statesen_US
dc.identifier.scopusauthoridPong, PWT=24071267900en_US
dc.identifier.scopusauthoridSchmoueli, M=24071996300en_US
dc.identifier.scopusauthoridLi, F=55210632600en_US
dc.identifier.scopusauthoridEgelhoff, WF=7006151986en_US

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