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Article: Novel method of patterning YBaCuO superconducting thin films

TitleNovel method of patterning YBaCuO superconducting thin films
Authors
Issue Date1989
PublisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/
Citation
Applied Physics Letters, 1989, v. 55 n. 9, p. 896-898 How to Cite?
AbstractA unique method of patterning YBaCuO thin films based on the inhibition of superconductivity by Si-YBaCuO intermixing has been developed. In the experiment, a thin Si film was first evaporated on a MgO substrate and subsequently patterned using laser direct-write etching. Multilayered YBaCuO thin films were then deposited by e-beam evaporation and annealed in a rapid thermal annealing system for 30-90 s at 980°C. The YBaCuO film deposited on the silicon regions became insulating. Auger depth profiling measurements indicate that Si-YBaCuO intermixing had occurred in these areas. Between the insulating regions, narrow YBaCuO superconducting lines were formed. For both 10-μm-wide, 1-mm-long and 2.5-μm-wide, 80-μm-long lines, the T c was observed above 76 K. The critical current density of the lines was measured to be 300 A/cm2 at 75 K. This patterning technique may be useful for fabrication of high Tc superconducting interconnects and devices.
Persistent Identifierhttp://hdl.handle.net/10722/155405
ISSN
2015 Impact Factor: 3.142
2015 SCImago Journal Rankings: 1.105
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorMa, QYen_US
dc.contributor.authorYang, ESen_US
dc.contributor.authorTreyz, GVen_US
dc.contributor.authorChang, CAen_US
dc.date.accessioned2012-08-08T08:33:19Z-
dc.date.available2012-08-08T08:33:19Z-
dc.date.issued1989en_US
dc.identifier.citationApplied Physics Letters, 1989, v. 55 n. 9, p. 896-898en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://hdl.handle.net/10722/155405-
dc.description.abstractA unique method of patterning YBaCuO thin films based on the inhibition of superconductivity by Si-YBaCuO intermixing has been developed. In the experiment, a thin Si film was first evaporated on a MgO substrate and subsequently patterned using laser direct-write etching. Multilayered YBaCuO thin films were then deposited by e-beam evaporation and annealed in a rapid thermal annealing system for 30-90 s at 980°C. The YBaCuO film deposited on the silicon regions became insulating. Auger depth profiling measurements indicate that Si-YBaCuO intermixing had occurred in these areas. Between the insulating regions, narrow YBaCuO superconducting lines were formed. For both 10-μm-wide, 1-mm-long and 2.5-μm-wide, 80-μm-long lines, the T c was observed above 76 K. The critical current density of the lines was measured to be 300 A/cm2 at 75 K. This patterning technique may be useful for fabrication of high Tc superconducting interconnects and devices.en_US
dc.languageengen_US
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/en_US
dc.relation.ispartofApplied Physics Lettersen_US
dc.titleNovel method of patterning YBaCuO superconducting thin filmsen_US
dc.typeArticleen_US
dc.identifier.emailYang, ES:esyang@hkueee.hku.hken_US
dc.identifier.authorityYang, ES=rp00199en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1063/1.102448en_US
dc.identifier.scopuseid_2-s2.0-36549090789en_US
dc.identifier.volume55en_US
dc.identifier.issue9en_US
dc.identifier.spage896en_US
dc.identifier.epage898en_US
dc.identifier.isiWOS:A1989AM21500030-
dc.publisher.placeUnited Statesen_US
dc.identifier.scopusauthoridMa, QY=7402815617en_US
dc.identifier.scopusauthoridYang, ES=7202021229en_US
dc.identifier.scopusauthoridTreyz, GV=6701807595en_US
dc.identifier.scopusauthoridChang, CA=7407042938en_US

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