File Download
There are no files associated with this item.
Links for fulltext
(May Require Subscription)
- Publisher Website: 10.1063/1.349678
- Scopus: eid_2-s2.0-0040947124
- WOS: WOS:A1991FY34100097
- Find via
Supplementary
- Citations:
- Appears in Collections:
Article: Reply to "comment on 'negative capacitance at metal-semiconductor interfaces'" [J. Appl. Phys. 70, 1090 (1991)]
Title | Reply to "comment on 'negative capacitance at metal-semiconductor interfaces'" [J. Appl. Phys. 70, 1090 (1991)] |
---|---|
Authors | |
Issue Date | 1991 |
Publisher | American Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp |
Citation | Journal of Applied Physics, 1991, v. 70 n. 2, p. 1089 How to Cite? |
Abstract | The origin of the excess admittance at a forward-biased Schottky diode invokes a controversy among research workers. Werner commented on our papers [J. Appl. Phys. 70, 1090 (1991)], in which he believes that the excess admittance is caused by minority-carrier extraction at defective back contacts rather than charge capture and emission at interface states. This reply answers the questions raised by Werner et al. [Phys. Rev. Lett. 60, 53 (1988)] and points out that the minority-carrier effect cannot account for the experimental observations. |
Persistent Identifier | http://hdl.handle.net/10722/155207 |
ISSN | 2023 Impact Factor: 2.7 2023 SCImago Journal Rankings: 0.649 |
ISI Accession Number ID |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Wu, X | en_US |
dc.contributor.author | Evans, HL | en_US |
dc.contributor.author | Yang, ES | en_US |
dc.date.accessioned | 2012-08-08T08:32:21Z | - |
dc.date.available | 2012-08-08T08:32:21Z | - |
dc.date.issued | 1991 | en_US |
dc.identifier.citation | Journal of Applied Physics, 1991, v. 70 n. 2, p. 1089 | - |
dc.identifier.issn | 0021-8979 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/155207 | - |
dc.description.abstract | The origin of the excess admittance at a forward-biased Schottky diode invokes a controversy among research workers. Werner commented on our papers [J. Appl. Phys. 70, 1090 (1991)], in which he believes that the excess admittance is caused by minority-carrier extraction at defective back contacts rather than charge capture and emission at interface states. This reply answers the questions raised by Werner et al. [Phys. Rev. Lett. 60, 53 (1988)] and points out that the minority-carrier effect cannot account for the experimental observations. | en_US |
dc.language | eng | en_US |
dc.publisher | American Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp | en_US |
dc.relation.ispartof | Journal of Applied Physics | en_US |
dc.title | Reply to "comment on 'negative capacitance at metal-semiconductor interfaces'" [J. Appl. Phys. 70, 1090 (1991)] | en_US |
dc.type | Article | en_US |
dc.identifier.email | Yang, ES:esyang@hkueee.hku.hk | en_US |
dc.identifier.authority | Yang, ES=rp00199 | en_US |
dc.description.nature | link_to_OA_fulltext | - |
dc.identifier.doi | 10.1063/1.349678 | en_US |
dc.identifier.scopus | eid_2-s2.0-0040947124 | en_US |
dc.identifier.volume | 70 | en_US |
dc.identifier.issue | 2 | en_US |
dc.identifier.spage | 1089 | en_US |
dc.identifier.epage | 1089 | - |
dc.identifier.isi | WOS:A1991FY34100097 | - |
dc.publisher.place | United States | en_US |
dc.identifier.scopusauthorid | Wu, X=7407065023 | en_US |
dc.identifier.scopusauthorid | Evans, HL=7401520988 | en_US |
dc.identifier.scopusauthorid | Yang, ES=7202021229 | en_US |
dc.identifier.issnl | 0021-8979 | - |