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- Publisher Website: 10.1016/0038-1101(90)90048-J
- Scopus: eid_2-s2.0-0025409267
- WOS: WOS:A1990CY21400009
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Article: A new mathematical model for semiconductor-on-insulator structures
Title | A new mathematical model for semiconductor-on-insulator structures |
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Authors | |
Issue Date | 1990 |
Publisher | Pergamon. The Journal's web site is located at http://www.elsevier.com/locate/sse |
Citation | Solid-State Electronics, 1990, v. 33 n. 4, p. 441-444 How to Cite? |
Abstract | A novel mathematical method is proposed to solve the two-dimensional Poisson's equation describing the potential distribution in semiconductor-on-insulator devices. Since an analytical solution method is used for the buried oxide or sapphire layer, mesh-points are not necessary for these insulator regions. This meansless computation ti me as compared to standard numerical methods. |
Persistent Identifier | http://hdl.handle.net/10722/154908 |
ISSN | 2023 Impact Factor: 1.4 2023 SCImago Journal Rankings: 0.348 |
ISI Accession Number ID |
DC Field | Value | Language |
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dc.contributor.author | Lai, PT | en_US |
dc.date.accessioned | 2012-08-08T08:31:07Z | - |
dc.date.available | 2012-08-08T08:31:07Z | - |
dc.date.issued | 1990 | en_US |
dc.identifier.citation | Solid-State Electronics, 1990, v. 33 n. 4, p. 441-444 | en_US |
dc.identifier.issn | 0038-1101 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/154908 | - |
dc.description.abstract | A novel mathematical method is proposed to solve the two-dimensional Poisson's equation describing the potential distribution in semiconductor-on-insulator devices. Since an analytical solution method is used for the buried oxide or sapphire layer, mesh-points are not necessary for these insulator regions. This meansless computation ti me as compared to standard numerical methods. | en_US |
dc.language | eng | en_US |
dc.publisher | Pergamon. The Journal's web site is located at http://www.elsevier.com/locate/sse | en_US |
dc.relation.ispartof | Solid-State Electronics | en_US |
dc.title | A new mathematical model for semiconductor-on-insulator structures | en_US |
dc.type | Article | en_US |
dc.identifier.email | Lai, PT:laip@eee.hku.hk | en_US |
dc.identifier.authority | Lai, PT=rp00130 | en_US |
dc.description.nature | link_to_subscribed_fulltext | en_US |
dc.identifier.doi | 10.1016/0038-1101(90)90048-J | en_US |
dc.identifier.scopus | eid_2-s2.0-0025409267 | en_US |
dc.identifier.volume | 33 | en_US |
dc.identifier.issue | 4 | en_US |
dc.identifier.spage | 441 | en_US |
dc.identifier.epage | 444 | en_US |
dc.identifier.isi | WOS:A1990CY21400009 | - |
dc.publisher.place | United Kingdom | en_US |
dc.identifier.scopusauthorid | Lai, PT=7202946460 | en_US |
dc.identifier.issnl | 0038-1101 | - |