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Article: Interdiffusion between Si substrates and YBaCuO films

TitleInterdiffusion between Si substrates and YBaCuO films
Authors
Ma, QYWu, XSchmidt, MTYang, ESChang, CA
Issue Date1989
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/physc
Citation
Physica C: Superconductivity And Its Applications, 1989, v. 162-164 PART 1, p. 637-638 How to Cite?
AbstractRapid thermal annealing has been used for fabrication of YBaCuO thin films from Cu/BaO/Y2O3 layered structures. The films were deposited on Si substrates by electron-beam evaporation. The interdiffusion at the film/substrate interface has been investigated using Auger depth profiling. With a metal barrier layer, the film showed the superconducting transition between 74-85 K. At anneal temperature above 980°C, Si was found to diffuse throughout the film and degrade the superconductivity of the films. © 1989.
Persistent Identifierhttp://hdl.handle.net/10722/154899
ISSN
0921-4534
2023 Impact Factor: 1.3
2023 SCImago Journal Rankings: 0.339
ISI Accession Number ID
WOS:A1989CG48900295

 

DC FieldValueLanguage
dc.contributor.authorMa, QYen_US
dc.contributor.authorWu, Xen_US
dc.contributor.authorSchmidt, MTen_US
dc.contributor.authorYang, ESen_US
dc.contributor.authorChang, CAen_US
dc.date.accessioned2012-08-08T08:31:05Z-
dc.date.available2012-08-08T08:31:05Z-
dc.date.issued1989en_US
dc.identifier.citationPhysica C: Superconductivity And Its Applications, 1989, v. 162-164 PART 1, p. 637-638en_US
dc.identifier.issn0921-4534en_US
dc.identifier.urihttp://hdl.handle.net/10722/154899-
dc.description.abstractRapid thermal annealing has been used for fabrication of YBaCuO thin films from Cu/BaO/Y2O3 layered structures. The films were deposited on Si substrates by electron-beam evaporation. The interdiffusion at the film/substrate interface has been investigated using Auger depth profiling. With a metal barrier layer, the film showed the superconducting transition between 74-85 K. At anneal temperature above 980°C, Si was found to diffuse throughout the film and degrade the superconductivity of the films. © 1989.en_US
dc.languageengen_US
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/physcen_US
dc.relation.ispartofPhysica C: Superconductivity and its applicationsen_US
dc.titleInterdiffusion between Si substrates and YBaCuO filmsen_US
dc.typeArticleen_US
dc.identifier.emailYang, ES:esyang@hkueee.hku.hken_US
dc.identifier.authorityYang, ES=rp00199en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.scopuseid_2-s2.0-0024921778en_US
dc.identifier.volume162-164en_US
dc.identifier.issuePART 1en_US
dc.identifier.spage637en_US
dc.identifier.epage638en_US
dc.identifier.isiWOS:A1989CG48900295-
dc.publisher.placeNetherlandsen_US
dc.identifier.scopusauthoridMa, QY=7402815617en_US
dc.identifier.scopusauthoridWu, X=7407065023en_US
dc.identifier.scopusauthoridSchmidt, MT=23016700400en_US
dc.identifier.scopusauthoridYang, ES=7202021229en_US
dc.identifier.scopusauthoridChang, CA=7407042938en_US
dc.identifier.issnl0921-4534-

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