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- Publisher Website: 10.1063/1.328716
- Scopus: eid_2-s2.0-0019698634
- WOS: WOS:A1981MT07800041
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Article: Dependence of electrical characteristics on laser power in cw laser processed Al-nSi diodes
Title | Dependence of electrical characteristics on laser power in cw laser processed Al-nSi diodes |
---|---|
Authors | |
Issue Date | 1981 |
Publisher | American Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp |
Citation | Journal of Applied Physics, 1981, v. 52 n. 12, p. 7287-7290 How to Cite? |
Abstract | We report here data of the capacitance-voltage and current-voltage measurements on cw laser processed Al-nSi diodes. The range of the laser power is between 12 and 20 W. Significant changes in the ideality factor, reverse saturation current, thermal activation energy, doping concentration, and effective Schottky barrier height have been observed. These results appear to be consistent with the mechanisms of aluminum diffusion and defect generation with high-temperature stress under high-power laser irradiation. |
Persistent Identifier | http://hdl.handle.net/10722/154812 |
ISSN | 2023 Impact Factor: 2.7 2023 SCImago Journal Rankings: 0.649 |
ISI Accession Number ID |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Wu, CM | en_US |
dc.contributor.author | Yang, ES | en_US |
dc.contributor.author | Sedgwick, TO | en_US |
dc.contributor.author | Hodgson, RT | en_US |
dc.date.accessioned | 2012-08-08T08:30:46Z | - |
dc.date.available | 2012-08-08T08:30:46Z | - |
dc.date.issued | 1981 | en_US |
dc.identifier.citation | Journal of Applied Physics, 1981, v. 52 n. 12, p. 7287-7290 | - |
dc.identifier.issn | 0021-8979 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/154812 | - |
dc.description.abstract | We report here data of the capacitance-voltage and current-voltage measurements on cw laser processed Al-nSi diodes. The range of the laser power is between 12 and 20 W. Significant changes in the ideality factor, reverse saturation current, thermal activation energy, doping concentration, and effective Schottky barrier height have been observed. These results appear to be consistent with the mechanisms of aluminum diffusion and defect generation with high-temperature stress under high-power laser irradiation. | en_US |
dc.language | eng | en_US |
dc.publisher | American Institute of Physics. The Journal's web site is located at http://jap.aip.org/jap/staff.jsp | en_US |
dc.relation.ispartof | Journal of Applied Physics | en_US |
dc.title | Dependence of electrical characteristics on laser power in cw laser processed Al-nSi diodes | en_US |
dc.type | Article | en_US |
dc.identifier.email | Yang, ES:esyang@hkueee.hku.hk | en_US |
dc.identifier.authority | Yang, ES=rp00199 | en_US |
dc.description.nature | link_to_subscribed_fulltext | en_US |
dc.identifier.doi | 10.1063/1.328716 | en_US |
dc.identifier.scopus | eid_2-s2.0-0019698634 | en_US |
dc.identifier.volume | 52 | en_US |
dc.identifier.issue | 12 | en_US |
dc.identifier.spage | 7287 | en_US |
dc.identifier.epage | 7290 | en_US |
dc.identifier.isi | WOS:A1981MT07800041 | - |
dc.publisher.place | United States | en_US |
dc.identifier.scopusauthorid | Wu, CM=23032716500 | en_US |
dc.identifier.scopusauthorid | Yang, ES=7202021229 | en_US |
dc.identifier.scopusauthorid | Sedgwick, TO=7003309218 | en_US |
dc.identifier.scopusauthorid | Hodgson, RT=7101648256 | en_US |
dc.identifier.issnl | 0021-8979 | - |