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Article: STUDY OF POLY-Si GRAIN BOUNDARIES USING SCHOTTKY BARRIERS.
Title | STUDY OF POLY-Si GRAIN BOUNDARIES USING SCHOTTKY BARRIERS. |
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Authors | |
Issue Date | 1979 |
Citation | Advances In Chemistry Series, 1979, p. 435-438 How to Cite? |
Abstract | Schottky barrier diodes using aluminum on p-type polycrystalline silicon have been fabricated. The contrast of the orientation of neighboring grains is observed after chemical etching of the surface. It is found that the low-angle boundary has little effect on the I-V characteristics since near ideal Schottky-I-V curves are obtained. The high-angle grain boundary, however, significantly alters both the I-V and low-frequency C-V plots. |
Persistent Identifier | http://hdl.handle.net/10722/154798 |
DC Field | Value | Language |
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dc.contributor.author | Wu, CM | en_US |
dc.contributor.author | Yang, ES | en_US |
dc.date.accessioned | 2012-08-08T08:30:43Z | - |
dc.date.available | 2012-08-08T08:30:43Z | - |
dc.date.issued | 1979 | en_US |
dc.identifier.citation | Advances In Chemistry Series, 1979, p. 435-438 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/154798 | - |
dc.description.abstract | Schottky barrier diodes using aluminum on p-type polycrystalline silicon have been fabricated. The contrast of the orientation of neighboring grains is observed after chemical etching of the surface. It is found that the low-angle boundary has little effect on the I-V characteristics since near ideal Schottky-I-V curves are obtained. The high-angle grain boundary, however, significantly alters both the I-V and low-frequency C-V plots. | en_US |
dc.language | eng | en_US |
dc.relation.ispartof | Advances in Chemistry Series | en_US |
dc.title | STUDY OF POLY-Si GRAIN BOUNDARIES USING SCHOTTKY BARRIERS. | en_US |
dc.type | Article | en_US |
dc.identifier.email | Yang, ES:esyang@hkueee.hku.hk | en_US |
dc.identifier.authority | Yang, ES=rp00199 | en_US |
dc.description.nature | link_to_subscribed_fulltext | en_US |
dc.identifier.scopus | eid_2-s2.0-0018683720 | en_US |
dc.identifier.spage | 435 | en_US |
dc.identifier.epage | 438 | en_US |
dc.identifier.scopusauthorid | Wu, CM=23032716500 | en_US |
dc.identifier.scopusauthorid | Yang, ES=7202021229 | en_US |