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Article: Inhibition of superconductivity in YBaCuO films by aluminum ion implantation

TitleInhibition of superconductivity in YBaCuO films by aluminum ion implantation
Authors
Issue Date1995
PublisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/
Citation
Applied Physics Letters, 1995, v. 67, p. 2717 How to Cite?
AbstractWe have studied the inhibition of superconductivity in high-temperature superconductors oxide films by aluminum ion implantation. Aluminum ions, with doses ranging from 1×1015-1×1016/cm 2, were implanted into epitaxial YBa2Cu3O 7-x (YBCO) films with an injection energy of 100 keV. Doses of 1×1016/cm2 completely suppressed the diamagnetism of the YBCO film without the need for annealing. Lower doses of 1×10 15/cm2 inhibited the superconductivity after low-temperature annealing. The results of the aluminum implantation are compared with previous silicon and boron implantations.© 1995 American Institute of Physics.
Persistent Identifierhttp://hdl.handle.net/10722/154776
ISSN
2015 Impact Factor: 3.142
2015 SCImago Journal Rankings: 1.105
ISI Accession Number ID

 

DC FieldValueLanguage
dc.contributor.authorHong, SHen_US
dc.contributor.authorMiller, JRen_US
dc.contributor.authorMa, QYen_US
dc.contributor.authorYang, ESen_US
dc.contributor.authorLuke, GMen_US
dc.date.accessioned2012-08-08T08:30:36Z-
dc.date.available2012-08-08T08:30:36Z-
dc.date.issued1995en_US
dc.identifier.citationApplied Physics Letters, 1995, v. 67, p. 2717en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://hdl.handle.net/10722/154776-
dc.description.abstractWe have studied the inhibition of superconductivity in high-temperature superconductors oxide films by aluminum ion implantation. Aluminum ions, with doses ranging from 1×1015-1×1016/cm 2, were implanted into epitaxial YBa2Cu3O 7-x (YBCO) films with an injection energy of 100 keV. Doses of 1×1016/cm2 completely suppressed the diamagnetism of the YBCO film without the need for annealing. Lower doses of 1×10 15/cm2 inhibited the superconductivity after low-temperature annealing. The results of the aluminum implantation are compared with previous silicon and boron implantations.© 1995 American Institute of Physics.en_US
dc.languageengen_US
dc.publisherAmerican Institute of Physics. The Journal's web site is located at http://apl.aip.org/en_US
dc.relation.ispartofApplied Physics Lettersen_US
dc.titleInhibition of superconductivity in YBaCuO films by aluminum ion implantationen_US
dc.typeArticleen_US
dc.identifier.emailYang, ES:esyang@hkueee.hku.hken_US
dc.identifier.authorityYang, ES=rp00199en_US
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1063/1.114303en_US
dc.identifier.scopuseid_2-s2.0-0008873375en_US
dc.identifier.volume67en_US
dc.identifier.spage2717en_US
dc.identifier.isiWOS:A1995TB95900045-
dc.publisher.placeUnited Statesen_US
dc.identifier.scopusauthoridHong, SH=34770018100en_US
dc.identifier.scopusauthoridMiller, JR=37023902300en_US
dc.identifier.scopusauthoridMa, QY=7402815617en_US
dc.identifier.scopusauthoridYang, ES=7202021229en_US
dc.identifier.scopusauthoridLuke, GM=7006469903en_US

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