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Conference Paper: Reducing silicon-substrate parasitics of on-chip transformers
Title | Reducing silicon-substrate parasitics of on-chip transformers |
---|---|
Authors | |
Issue Date | 2002 |
Citation | Proceedings Of The Ieee Micro Electro Mechanical Systems (Mems), 2002, p. 649-652 How to Cite? |
Abstract | Three-terminal transformers have been fabricated on 20-μm-deep silicon-oxide blocks formed in the silicon substrate. The thick isolation blocks drastically reduced the parasitics between the devices and the silicon substrate underneath. The quality factors and the self-resonant frequencies were thus increased by more than 100% and 70%, respectively. Such oxide blocks also greatly reduce the cross talk between adjacent devices by as much as 15dB. |
Persistent Identifier | http://hdl.handle.net/10722/148998 |
References |
DC Field | Value | Language |
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dc.contributor.author | Jiang, H | en_HK |
dc.contributor.author | Li, Z | en_HK |
dc.contributor.author | Tien, NC | en_HK |
dc.date.accessioned | 2012-06-20T06:17:46Z | - |
dc.date.available | 2012-06-20T06:17:46Z | - |
dc.date.issued | 2002 | en_HK |
dc.identifier.citation | Proceedings Of The Ieee Micro Electro Mechanical Systems (Mems), 2002, p. 649-652 | en_US |
dc.identifier.uri | http://hdl.handle.net/10722/148998 | - |
dc.description.abstract | Three-terminal transformers have been fabricated on 20-μm-deep silicon-oxide blocks formed in the silicon substrate. The thick isolation blocks drastically reduced the parasitics between the devices and the silicon substrate underneath. The quality factors and the self-resonant frequencies were thus increased by more than 100% and 70%, respectively. Such oxide blocks also greatly reduce the cross talk between adjacent devices by as much as 15dB. | en_HK |
dc.language | eng | en_US |
dc.relation.ispartof | Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS) | en_HK |
dc.title | Reducing silicon-substrate parasitics of on-chip transformers | en_HK |
dc.type | Conference_Paper | en_HK |
dc.identifier.email | Tien, NC: nctien@hku.hk | en_HK |
dc.identifier.authority | Tien, NC=rp01604 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | en_US |
dc.identifier.scopus | eid_2-s2.0-0036118190 | en_HK |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-0036118190&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.spage | 649 | en_HK |
dc.identifier.epage | 652 | en_HK |
dc.identifier.scopusauthorid | Jiang, H=36120322000 | en_HK |
dc.identifier.scopusauthorid | Li, Z=24306828000 | en_HK |
dc.identifier.scopusauthorid | Tien, NC=7006532826 | en_HK |