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Article: Colossal electroresistance in La0.8Ca0.2MnO3 films on 0.7Pb(Mg1/3Nb2/3)O3-0.3PbTiO3 substrates

TitleColossal electroresistance in La0.8Ca0.2MnO3 films on 0.7Pb(Mg1/3Nb2/3)O3-0.3PbTiO3 substrates
Authors
Issue Date2012
PublisherInstitute of Physics Publishing Ltd.. The Journal's web site is located at http://iopscience.iop.org/0295-5075
Citation
Europhysics Letters, 2012, v. 97 n. 5, article no. 57009 How to Cite?
AbstractEpitaxial La 0.8Ca 0.2MnO 3 (LCMO) thin films with varied thicknesses were successfully grown on 0.7Pb(Mg 1/3Nb 2/3)O 3-0.3PbTiO 3 (PMN-PT) substrates with pulsed-laser deposition. Due to a large lattice mismatch between LCMO and PMN-PT, in-plane tensile strain was introduced into the LCMO layers. The tensile strain could be controlled by varying the layer thickness of LCMO. It was found that the in-plane tensile strain in LCMO layers could enhance the electroresistance (ER) effect significantly. A maximum value of ER ((R 10 μA-R 1 mA)/R 10 μA×100%) was found to be ∼80% in a 10 nm thick LCMO film that suffered a 2.21% in-plane tensile strain. The mechanism for the impact of strain on the ER effect is discussed within the framework of the electron-lattice coupling and the phase separation scenario. Copyright © EPLA, 2012.
Persistent Identifierhttp://hdl.handle.net/10722/148845
ISSN
2021 Impact Factor: 1.958
2020 SCImago Journal Rankings: 0.625
ISI Accession Number ID
Funding AgencyGrant Number
Research Grant Council of Hong KongHKU702409P
National Natural Science Foundation of China11004148
11104202
Natural Science Foundation of Tianjin11JCZDJC21800
11JCYBJC02700
Research Foundation of Tianjin Education Council20090308
SRF for ROCS, SEM
Funding Information:

This work was funded by the Research Grant Council of Hong Kong (Project No. HKU702409P), the National Natural Science Foundation of China (11004148, 11104202), the Natural Science Foundation of Tianjin (11JCZDJC21800, 11JCYBJC02700), and the Research Foundation of Tianjin Education Council (20090308), and SRF for ROCS, SEM.

 

DC FieldValueLanguage
dc.contributor.authorWang, SY-
dc.contributor.authorGao, J-
dc.date.accessioned2012-06-13T06:16:56Z-
dc.date.available2012-06-13T06:16:56Z-
dc.date.issued2012-
dc.identifier.citationEurophysics Letters, 2012, v. 97 n. 5, article no. 57009-
dc.identifier.issn0295-5075-
dc.identifier.urihttp://hdl.handle.net/10722/148845-
dc.description.abstractEpitaxial La 0.8Ca 0.2MnO 3 (LCMO) thin films with varied thicknesses were successfully grown on 0.7Pb(Mg 1/3Nb 2/3)O 3-0.3PbTiO 3 (PMN-PT) substrates with pulsed-laser deposition. Due to a large lattice mismatch between LCMO and PMN-PT, in-plane tensile strain was introduced into the LCMO layers. The tensile strain could be controlled by varying the layer thickness of LCMO. It was found that the in-plane tensile strain in LCMO layers could enhance the electroresistance (ER) effect significantly. A maximum value of ER ((R 10 μA-R 1 mA)/R 10 μA×100%) was found to be ∼80% in a 10 nm thick LCMO film that suffered a 2.21% in-plane tensile strain. The mechanism for the impact of strain on the ER effect is discussed within the framework of the electron-lattice coupling and the phase separation scenario. Copyright © EPLA, 2012.-
dc.languageeng-
dc.publisherInstitute of Physics Publishing Ltd.. The Journal's web site is located at http://iopscience.iop.org/0295-5075-
dc.relation.ispartofEurophysics Letters-
dc.rightsEurophysics Letters. Copyright © Institute of Physics Publishing Ltd..-
dc.titleColossal electroresistance in La0.8Ca0.2MnO3 films on 0.7Pb(Mg1/3Nb2/3)O3-0.3PbTiO3 substratesen_US
dc.typeArticleen_US
dc.identifier.emailWang, SY: sywang26@hku.hk-
dc.identifier.emailGao, J: jugao@hku.hk-
dc.description.naturelink_to_subscribed_fulltext-
dc.identifier.doi10.1209/0295-5075/97/57009-
dc.identifier.scopuseid_2-s2.0-84863231385-
dc.identifier.hkuros199870-
dc.identifier.volume97-
dc.identifier.issue5, article no. 57009-
dc.identifier.isiWOS:000301952600035-
dc.publisher.placeUnited Kingdom-
dc.identifier.issnl0295-5075-

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