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Article: Hydrothermal treatment of ZnO nanostructures
Title | Hydrothermal treatment of ZnO nanostructures | ||||||||
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Authors | |||||||||
Keywords | Hydrothermal treatments Morphology N-nanorods Oxides Photoluminsescence Scanning electron microscopy Zinc oxide | ||||||||
Issue Date | 2012 | ||||||||
Publisher | Elsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsf | ||||||||
Citation | Thin Solid Films, 2012, v. 520 n. 7, p. 2656-2662 How to Cite? | ||||||||
Abstract | Hydrothermal treatment of ZnO nanostructures involves low temperatures (150-200 °C) and elevated water vapor pressure for the purpose of the improvement in the material properties. Under such moderate conditions, no significant changes in the morphology would be expected. Nevertheless, such treatment results in a significant change of nanostructured morphologies of ZnO. The observed changes are dependent on the starting material properties and the substrate used for the growth. In the case of Si substrate, hydrothermal treatment results in significant Si contamination of the samples. In terms of the optical properties, improvements are observed only in some cases, while samples with excellent starting optical properties are degraded by the treatment. Mechanisms responsible for the observed changes are discussed. © 2011 Elsevier B.V. All rights reserved. | ||||||||
Persistent Identifier | http://hdl.handle.net/10722/145552 | ||||||||
ISSN | 2023 Impact Factor: 2.0 2023 SCImago Journal Rankings: 0.400 | ||||||||
ISI Accession Number ID |
Funding Information: Financial support from the project RGC CRF CityU6/CRF/08 and the Strategic Research Theme, University Development Fund, and Small Project Funding of the University of Hong Kong is acknowledged. | ||||||||
References | |||||||||
Grants |
DC Field | Value | Language |
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dc.contributor.author | Chen, X | en_HK |
dc.contributor.author | Ng, AMC | en_HK |
dc.contributor.author | Djurišić, AB | en_HK |
dc.contributor.author | Ling, CC | en_HK |
dc.contributor.author | Chan, WK | en_HK |
dc.date.accessioned | 2012-02-28T01:53:45Z | - |
dc.date.available | 2012-02-28T01:53:45Z | - |
dc.date.issued | 2012 | en_HK |
dc.identifier.citation | Thin Solid Films, 2012, v. 520 n. 7, p. 2656-2662 | en_HK |
dc.identifier.issn | 0040-6090 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/145552 | - |
dc.description.abstract | Hydrothermal treatment of ZnO nanostructures involves low temperatures (150-200 °C) and elevated water vapor pressure for the purpose of the improvement in the material properties. Under such moderate conditions, no significant changes in the morphology would be expected. Nevertheless, such treatment results in a significant change of nanostructured morphologies of ZnO. The observed changes are dependent on the starting material properties and the substrate used for the growth. In the case of Si substrate, hydrothermal treatment results in significant Si contamination of the samples. In terms of the optical properties, improvements are observed only in some cases, while samples with excellent starting optical properties are degraded by the treatment. Mechanisms responsible for the observed changes are discussed. © 2011 Elsevier B.V. All rights reserved. | en_HK |
dc.language | eng | en_US |
dc.publisher | Elsevier S.A.. The Journal's web site is located at http://www.elsevier.com/locate/tsf | en_HK |
dc.relation.ispartof | Thin Solid Films | en_HK |
dc.subject | Hydrothermal treatments | en_HK |
dc.subject | Morphology | en_HK |
dc.subject | N-nanorods | en_HK |
dc.subject | Oxides | en_HK |
dc.subject | Photoluminsescence | en_HK |
dc.subject | Scanning electron microscopy | en_HK |
dc.subject | Zinc oxide | en_HK |
dc.title | Hydrothermal treatment of ZnO nanostructures | en_HK |
dc.type | Article | en_HK |
dc.identifier.email | Djurišić, AB: dalek@hku.hk | en_HK |
dc.identifier.email | Ling, CC: ccling@hkucc.hku.hk | en_HK |
dc.identifier.email | Chan, WK: waichan@hku.hk | en_HK |
dc.identifier.authority | Djurišić, AB=rp00690 | en_HK |
dc.identifier.authority | Ling, CC=rp00747 | en_HK |
dc.identifier.authority | Chan, WK=rp00667 | en_HK |
dc.description.nature | link_to_subscribed_fulltext | - |
dc.identifier.doi | 10.1016/j.tsf.2011.11.019 | en_HK |
dc.identifier.scopus | eid_2-s2.0-84856407492 | en_HK |
dc.identifier.hkuros | 198631 | en_US |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-84856407492&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 520 | en_HK |
dc.identifier.issue | 7 | en_HK |
dc.identifier.spage | 2656 | en_HK |
dc.identifier.epage | 2662 | en_HK |
dc.identifier.isi | WOS:000301085100046 | - |
dc.publisher.place | Switzerland | en_HK |
dc.relation.project | Studies of Fundamental Properties of Nanosurfaces and Selected Applications | - |
dc.relation.project | Studies of Fundamental Properties of Nanosurfaces and Selected Applications | - |
dc.identifier.scopusauthorid | Chen, X=35274291400 | en_HK |
dc.identifier.scopusauthorid | Ng, AMC=12140078600 | en_HK |
dc.identifier.scopusauthorid | Djurišić, AB=7004904830 | en_HK |
dc.identifier.scopusauthorid | Ling, CC=13310239300 | en_HK |
dc.identifier.scopusauthorid | Chan, WK=13310083000 | en_HK |
dc.identifier.citeulike | 10055207 | - |
dc.identifier.issnl | 0040-6090 | - |