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Article: Fabrication of a 60-nm-diameter perfectly round metal-dot array over a large area on a plastic substrate using nanoimprint lithography and self-perfection by liquefaction

TitleFabrication of a 60-nm-diameter perfectly round metal-dot array over a large area on a plastic substrate using nanoimprint lithography and self-perfection by liquefaction
Authors
KeywordsLiquefaction
Nanoimprint lithography
Nanopatterning
Plastic substrates
Issue Date2010
PublisherWiley - V C H Verlag GmbH & Co KGaA. The Journal's web site is located at http://www3.interscience.wiley.com/cgi-bin/jabout/107640323/2421_info.html
Citation
Small, 2010, v. 6 n. 11, p. 1242-1247 How to Cite?
AbstractTypically, nanopatterning on plastic substrates has poor fidelity, poor adhesion, and low yield. Here the proposal of and the first experiment using a new fabrication method that overcomes the above obstacles and has achieved arrays of 60-nm-diameter, perfectly round metal dots over a large area on a polyethylene terephthalate (PET) substrate with high fidelity and high yield is reported. This new method is based on the use of a thin hydrogen silsesquioxane (HSQ) layer on top of PET, nanoimprint lithography, and self-perfection by liquefaction (SPEL). The HSQ layer offers excellent thermal protection to the PET substrate during SPEL, as well as good surface adhesion and etching resistance. Nanoimprinting plus a lift off created a large-area array of Cr squares (100nm×130 nm) on HSQ and SPEL changed each Cr square into a perfectly round Cr dot with a diameter of 60 nm, reducing the Cr footprint area by 78%. Compared to bare PET, the use of HSQ also reduced the variation in the diameter of the Cr dots from 11.3nm (standard deviation) to 1.7 nm, an improvement of over 660%. This new technology can be scaled to much larger areas (including roll-to-roll web processing) and thus potentially has applications in various fields. © 2010 Wiley-VCH Verlag GmbH & Co. KGaA.
Persistent Identifierhttp://hdl.handle.net/10722/145473
ISSN
2015 Impact Factor: 8.315
2015 SCImago Journal Rankings: 3.401
ISI Accession Number ID
Funding AgencyGrant Number
Office of Naval Research (ONR)
Defense Advanced Research Project Agent (DARPA)
National Science Foundation (NSF)
Funding Information:

We thank the Office of Naval Research (ONR), Defense Advanced Research Project Agent (DARPA), and National Science Foundation (NSF) for their partial support to the work, Ron Auberger in DuPont Teijin Films for providing the PET film samples, our colleague Dr. Zhihang Hu for discussion on COMSOL simulation, and Dr. Judy A. Swan in Princeton Writing Center for suggestions on draft revisions.

References

 

DC FieldValueLanguage
dc.contributor.authorWang, Cen_HK
dc.contributor.authorXia, Qen_HK
dc.contributor.authorLi, WDen_HK
dc.contributor.authorFu, Zen_HK
dc.contributor.authorMorton, KJen_HK
dc.contributor.authorChou, SYen_HK
dc.date.accessioned2012-02-23T12:10:53Z-
dc.date.available2012-02-23T12:10:53Z-
dc.date.issued2010en_HK
dc.identifier.citationSmall, 2010, v. 6 n. 11, p. 1242-1247en_HK
dc.identifier.issn1613-6810en_HK
dc.identifier.urihttp://hdl.handle.net/10722/145473-
dc.description.abstractTypically, nanopatterning on plastic substrates has poor fidelity, poor adhesion, and low yield. Here the proposal of and the first experiment using a new fabrication method that overcomes the above obstacles and has achieved arrays of 60-nm-diameter, perfectly round metal dots over a large area on a polyethylene terephthalate (PET) substrate with high fidelity and high yield is reported. This new method is based on the use of a thin hydrogen silsesquioxane (HSQ) layer on top of PET, nanoimprint lithography, and self-perfection by liquefaction (SPEL). The HSQ layer offers excellent thermal protection to the PET substrate during SPEL, as well as good surface adhesion and etching resistance. Nanoimprinting plus a lift off created a large-area array of Cr squares (100nm×130 nm) on HSQ and SPEL changed each Cr square into a perfectly round Cr dot with a diameter of 60 nm, reducing the Cr footprint area by 78%. Compared to bare PET, the use of HSQ also reduced the variation in the diameter of the Cr dots from 11.3nm (standard deviation) to 1.7 nm, an improvement of over 660%. This new technology can be scaled to much larger areas (including roll-to-roll web processing) and thus potentially has applications in various fields. © 2010 Wiley-VCH Verlag GmbH & Co. KGaA.en_HK
dc.languageengen_US
dc.publisherWiley - V C H Verlag GmbH & Co KGaA. The Journal's web site is located at http://www3.interscience.wiley.com/cgi-bin/jabout/107640323/2421_info.htmlen_HK
dc.relation.ispartofSmallen_HK
dc.subjectLiquefactionen_HK
dc.subjectNanoimprint lithographyen_HK
dc.subjectNanopatterningen_HK
dc.subjectPlastic substratesen_HK
dc.titleFabrication of a 60-nm-diameter perfectly round metal-dot array over a large area on a plastic substrate using nanoimprint lithography and self-perfection by liquefactionen_HK
dc.typeArticleen_HK
dc.identifier.emailLi, WD:liwd@hku.hken_HK
dc.identifier.authorityLi, WD=rp01581en_HK
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1002/smll.201000104en_HK
dc.identifier.scopuseid_2-s2.0-77953162675en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-77953162675&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume6en_HK
dc.identifier.issue11en_HK
dc.identifier.spage1242en_HK
dc.identifier.epage1247en_HK
dc.identifier.eissn1613-6829-
dc.identifier.isiWOS:000278941300014-
dc.publisher.placeGermanyen_HK
dc.identifier.scopusauthoridWang, C=35096967500en_HK
dc.identifier.scopusauthoridXia, Q=8576269000en_HK
dc.identifier.scopusauthoridLi, WD=35181575900en_HK
dc.identifier.scopusauthoridFu, Z=15839625800en_HK
dc.identifier.scopusauthoridMorton, KJ=8549693300en_HK
dc.identifier.scopusauthoridChou, SY=7401538612en_HK

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