Conference Paper: Large-area metal grid ultraviolet filter fabricated by nanoimprint lithography

File Download
  • No File Attached
Links for fulltext
(May Require Subscription)
Supplementary
  • Basic View
  • Metadata View
  • XML View
TitleLarge-area metal grid ultraviolet filter fabricated by nanoimprint lithography
AuthorsLi, WD1
Chou, SY1
KeywordsUltraviolet Lasers
Issue Date2007
CitationConference On Lasers And Electro-Optics, 2007, Cleo 2007, 2007 [How to Cite?]
DOI: http://dx.doi.org/10.1109/CLEO.2007.4452830
AbstractFor the first time, a wafer-scale metal grid UV filter is fabricated by nanoimprint lithography and demonstrates cut-off wavelength of 350nm, peak transmission of 27% at 285nm and rejection ratio of 20dB at visible wavelength. © 2007 Optical Society of America.
DOIhttp://dx.doi.org/10.1109/CLEO.2007.4452830
ReferencesReferences in Scopus
DC Field
Value
dc.contributor.authorLi, WD
dc.contributor.authorChou, SY
dc.date.accessioned2012-02-23T12:10:51Z
dc.date.available2012-02-23T12:10:51Z
dc.date.issued2007
dc.description.abstractFor the first time, a wafer-scale metal grid UV filter is fabricated by nanoimprint lithography and demonstrates cut-off wavelength of 350nm, peak transmission of 27% at 285nm and rejection ratio of 20dB at visible wavelength. © 2007 Optical Society of America.
dc.description.natureLink_to_subscribed_fulltext
dc.identifier.citationConference On Lasers And Electro-Optics, 2007, Cleo 2007, 2007 [How to Cite?]
DOI: http://dx.doi.org/10.1109/CLEO.2007.4452830
dc.identifier.doihttp://dx.doi.org/10.1109/CLEO.2007.4452830
dc.identifier.scopuseid_2-s2.0-82955217262
dc.identifier.urihttp://hdl.handle.net/10722/145467
dc.languageeng
dc.relation.ispartofConference on Lasers and Electro-Optics, 2007, CLEO 2007
dc.relation.referencesReferences in Scopus
dc.subjectUltraviolet Lasers
dc.titleLarge-area metal grid ultraviolet filter fabricated by nanoimprint lithography
dc.typeConference_Paper
Author Affiliations
  1. Princeton University