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Conference Paper: Large-area metal grid ultraviolet filter fabricated by nanoimprint lithography
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TitleLarge-area metal grid ultraviolet filter fabricated by nanoimprint lithography
 
AuthorsLi, WD1
Chou, SY1
 
KeywordsUltraviolet Lasers
 
Issue Date2007
 
CitationConference On Lasers And Electro-Optics, 2007, Cleo 2007, 2007 [How to Cite?]
DOI: http://dx.doi.org/10.1109/CLEO.2007.4452830
 
AbstractFor the first time, a wafer-scale metal grid UV filter is fabricated by nanoimprint lithography and demonstrates cut-off wavelength of 350nm, peak transmission of 27% at 285nm and rejection ratio of 20dB at visible wavelength. © 2007 Optical Society of America.
 
DOIhttp://dx.doi.org/10.1109/CLEO.2007.4452830
 
ReferencesReferences in Scopus
 
DC FieldValue
dc.contributor.authorLi, WD
 
dc.contributor.authorChou, SY
 
dc.date.accessioned2012-02-23T12:10:51Z
 
dc.date.available2012-02-23T12:10:51Z
 
dc.date.issued2007
 
dc.description.abstractFor the first time, a wafer-scale metal grid UV filter is fabricated by nanoimprint lithography and demonstrates cut-off wavelength of 350nm, peak transmission of 27% at 285nm and rejection ratio of 20dB at visible wavelength. © 2007 Optical Society of America.
 
dc.description.natureLink_to_subscribed_fulltext
 
dc.identifier.citationConference On Lasers And Electro-Optics, 2007, Cleo 2007, 2007 [How to Cite?]
DOI: http://dx.doi.org/10.1109/CLEO.2007.4452830
 
dc.identifier.doihttp://dx.doi.org/10.1109/CLEO.2007.4452830
 
dc.identifier.scopuseid_2-s2.0-82955217262
 
dc.identifier.urihttp://hdl.handle.net/10722/145467
 
dc.languageeng
 
dc.relation.ispartofConference on Lasers and Electro-Optics, 2007, CLEO 2007
 
dc.relation.referencesReferences in Scopus
 
dc.subjectUltraviolet Lasers
 
dc.titleLarge-area metal grid ultraviolet filter fabricated by nanoimprint lithography
 
dc.typeConference_Paper
 
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Author Affiliations
  1. Princeton University