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Article: Quantized patterning using nanoimprinted blanks

TitleQuantized patterning using nanoimprinted blanks
Authors
Issue Date2009
PublisherInstitute of Physics Publishing. The Journal's web site is located at http://www.iop.org/journals/nano
Citation
Nanotechnology, 2009, v. 20 n. 15 How to Cite?
AbstractQuantum lithography (QL) is a revolutionary approach, increasing the throughput and lowering the cost of scanning electron beam lithography (EBL). But it has not been pursued since its inception 17 years ago, due to the lack of a viable method for making the blanks needed. Here we propose and demonstrate a new general viable approach to QL blank fabrication, that is based on (a) nanoimprinting and (b) a new wafer-scale nanoimprint mold fabrication that uses not EBL but a unique combination of interference lithography, self-perfection, multiple nanoimprinting, and other novel nanopatterning. We fabricated QL blanks (a 2D Cr square tile array of 200nm pitch, 9nm gap, and sub-10nm corners, corresponding to a 50nm node 4 × photomask) and demonstrated that QL can greatly relax the requirements for the EBL tool, increase the throughput and reduce the cost of EBL by orders of magnitude, and is scalable to the 22nm node. © 2009 IOP Publishing Ltd.
Persistent Identifierhttp://hdl.handle.net/10722/145466
ISSN
2015 Impact Factor: 3.573
2015 SCImago Journal Rankings: 1.196
ISI Accession Number ID
Funding AgencyGrant Number
DARPA
Funding Information:

The work was supported in part by DARPA. Authors thank Patrick Murphy for proof reading the manuscript.

References

 

DC FieldValueLanguage
dc.contributor.authorChou, SYen_HK
dc.contributor.authorLi, WDen_HK
dc.contributor.authorLiang, Xen_HK
dc.date.accessioned2012-02-23T12:10:51Z-
dc.date.available2012-02-23T12:10:51Z-
dc.date.issued2009en_HK
dc.identifier.citationNanotechnology, 2009, v. 20 n. 15en_HK
dc.identifier.issn0957-4484en_HK
dc.identifier.urihttp://hdl.handle.net/10722/145466-
dc.description.abstractQuantum lithography (QL) is a revolutionary approach, increasing the throughput and lowering the cost of scanning electron beam lithography (EBL). But it has not been pursued since its inception 17 years ago, due to the lack of a viable method for making the blanks needed. Here we propose and demonstrate a new general viable approach to QL blank fabrication, that is based on (a) nanoimprinting and (b) a new wafer-scale nanoimprint mold fabrication that uses not EBL but a unique combination of interference lithography, self-perfection, multiple nanoimprinting, and other novel nanopatterning. We fabricated QL blanks (a 2D Cr square tile array of 200nm pitch, 9nm gap, and sub-10nm corners, corresponding to a 50nm node 4 × photomask) and demonstrated that QL can greatly relax the requirements for the EBL tool, increase the throughput and reduce the cost of EBL by orders of magnitude, and is scalable to the 22nm node. © 2009 IOP Publishing Ltd.en_HK
dc.languageengen_US
dc.publisherInstitute of Physics Publishing. The Journal's web site is located at http://www.iop.org/journals/nanoen_HK
dc.relation.ispartofNanotechnologyen_HK
dc.titleQuantized patterning using nanoimprinted blanksen_HK
dc.typeArticleen_HK
dc.identifier.emailLi, WD:liwd@hku.hken_HK
dc.identifier.authorityLi, WD=rp01581en_HK
dc.description.naturelink_to_subscribed_fulltexten_US
dc.identifier.doi10.1088/0957-4484/20/15/155303en_HK
dc.identifier.scopuseid_2-s2.0-65549141686en_HK
dc.relation.referenceshttp://www.scopus.com/mlt/select.url?eid=2-s2.0-65549141686&selection=ref&src=s&origin=recordpageen_HK
dc.identifier.volume20en_HK
dc.identifier.issue15en_HK
dc.identifier.eissn1361-6528-
dc.identifier.isiWOS:000264539600007-
dc.publisher.placeUnited Kingdomen_HK
dc.identifier.scopusauthoridChou, SY=7401538612en_HK
dc.identifier.scopusauthoridLi, WD=35181575900en_HK
dc.identifier.scopusauthoridLiang, X=35300036600en_HK

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