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postgraduate thesis: Optimization schemes for process robustness enhancement in optical lithography

TitleOptimization schemes for process robustness enhancement in optical lithography
Authors
Advisors
Advisor(s):Lam, EYM
Issue Date2011
PublisherThe University of Hong Kong (Pokfulam, Hong Kong)
Citation
Jia, N. [贾宁宁]. (2011). Optimization schemes for process robustness enhancement in optical lithography. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b4702859
DegreeDoctor of Philosophy
SubjectMicrolithography.
Semiconductors - Etching.
Dept/ProgramElectrical and Electronic Engineering

 

DC FieldValueLanguage
dc.contributor.advisorLam, EYM-
dc.contributor.authorJia, Ningning.-
dc.contributor.author贾宁宁.-
dc.date.issued2011-
dc.identifier.citationJia, N. [贾宁宁]. (2011). Optimization schemes for process robustness enhancement in optical lithography. (Thesis). University of Hong Kong, Pokfulam, Hong Kong SAR. Retrieved from http://dx.doi.org/10.5353/th_b4702859-
dc.languageeng-
dc.publisherThe University of Hong Kong (Pokfulam, Hong Kong)-
dc.relation.ispartofHKU Theses Online (HKUTO)-
dc.rightsThe author retains all proprietary rights, (such as patent rights) and the right to use in future works.-
dc.rightsCreative Commons: Attribution 3.0 Hong Kong License-
dc.source.urihttp://hub.hku.hk/bib/B47028592-
dc.subject.lcshMicrolithography.-
dc.subject.lcshSemiconductors - Etching.-
dc.titleOptimization schemes for process robustness enhancement in optical lithography-
dc.typePG_Thesis-
dc.identifier.hkulb4702859-
dc.description.thesisnameDoctor of Philosophy-
dc.description.thesislevelDoctoral-
dc.description.thesisdisciplineElectrical and Electronic Engineering-
dc.description.naturepublished_or_final_version-
dc.identifier.doi10.5353/th_b4702859-
dc.date.hkucongregation2012-

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