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Article: 2-Step self-assembly method to fabricate broadband omnidirectional antireflection coating in large scale
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Title2-Step self-assembly method to fabricate broadband omnidirectional antireflection coating in large scale
 
AuthorsYeung, KM2
Luk, WC2
Tam, KC2
Kwong, CY2
Tsai, MA3
Kuo, HC3
Ng, AMC1
Djurisic, AB1
 
KeywordsAnti-reflection
Broadband
Nano silica
Self-assembly method
Omnidirectional
 
Issue Date2011
 
PublisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/solmat
 
CitationSolar Energy Materials & Solar Cells, 2011, v. 95 n. 2, p. 699-703 [How to Cite?]
DOI: http://dx.doi.org/10.1016/j.solmat.2010.10.005
 
AbstractWe have developed a simple and reproducible 2-step self-assembly method for the fabrication of broadband, omnidirectional antireflection coating on glass substrate with 4 in. size. The glass surface has been modified to be positively charged, then the negatively charged nano silica is self-assembled to the glass substrate by electrostatic attraction. The nanostructure on the glass substrate reduces the reflection significantly, which results in enhanced transmittance. Transmittance as high as 97.7% at 499 nm has been obtained for a double-side coated glass substrate. Obvious reduction in weighted reflectance is still observed up to 60° incident angle. © 2010 Elsevier B.V. All rights reserved.
 
ISSN0927-0248
2012 Impact Factor: 4.63
2012 SCImago Journal Rankings: 2.153
 
DOIhttp://dx.doi.org/10.1016/j.solmat.2010.10.005
 
ISI Accession Number IDWOS:000287006900044
Funding AgencyGrant Number
HKSARITP/030/09NP
Funding Information:

This work has been supported by HKSAR Innovation and Technology Fund (ITP/030/09NP).

 
DC FieldValue
dc.contributor.authorYeung, KM
 
dc.contributor.authorLuk, WC
 
dc.contributor.authorTam, KC
 
dc.contributor.authorKwong, CY
 
dc.contributor.authorTsai, MA
 
dc.contributor.authorKuo, HC
 
dc.contributor.authorNg, AMC
 
dc.contributor.authorDjurisic, AB
 
dc.date.accessioned2011-10-28T02:46:49Z
 
dc.date.available2011-10-28T02:46:49Z
 
dc.date.issued2011
 
dc.description.abstractWe have developed a simple and reproducible 2-step self-assembly method for the fabrication of broadband, omnidirectional antireflection coating on glass substrate with 4 in. size. The glass surface has been modified to be positively charged, then the negatively charged nano silica is self-assembled to the glass substrate by electrostatic attraction. The nanostructure on the glass substrate reduces the reflection significantly, which results in enhanced transmittance. Transmittance as high as 97.7% at 499 nm has been obtained for a double-side coated glass substrate. Obvious reduction in weighted reflectance is still observed up to 60° incident angle. © 2010 Elsevier B.V. All rights reserved.
 
dc.description.natureLink_to_subscribed_fulltext
 
dc.identifier.citationSolar Energy Materials & Solar Cells, 2011, v. 95 n. 2, p. 699-703 [How to Cite?]
DOI: http://dx.doi.org/10.1016/j.solmat.2010.10.005
 
dc.identifier.doihttp://dx.doi.org/10.1016/j.solmat.2010.10.005
 
dc.identifier.epage703
 
dc.identifier.hkuros184607
 
dc.identifier.isiWOS:000287006900044
Funding AgencyGrant Number
HKSARITP/030/09NP
Funding Information:

This work has been supported by HKSAR Innovation and Technology Fund (ITP/030/09NP).

 
dc.identifier.issn0927-0248
2012 Impact Factor: 4.63
2012 SCImago Journal Rankings: 2.153
 
dc.identifier.issue2
 
dc.identifier.scopuseid_2-s2.0-78650707079
 
dc.identifier.spage699
 
dc.identifier.urihttp://hdl.handle.net/10722/142473
 
dc.identifier.volume95
 
dc.languageeng
 
dc.publisherElsevier BV. The Journal's web site is located at http://www.elsevier.com/locate/solmat
 
dc.relation.ispartofSolar Energy Materials & Solar Cells
 
dc.subjectAnti-reflection
 
dc.subjectBroadband
 
dc.subjectNano silica
 
dc.subjectSelf-assembly method
 
dc.subjectOmnidirectional
 
dc.title2-Step self-assembly method to fabricate broadband omnidirectional antireflection coating in large scale
 
dc.typeArticle
 
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<contributor.author>Luk, WC</contributor.author>
<contributor.author>Tam, KC</contributor.author>
<contributor.author>Kwong, CY</contributor.author>
<contributor.author>Tsai, MA</contributor.author>
<contributor.author>Kuo, HC</contributor.author>
<contributor.author>Ng, AMC</contributor.author>
<contributor.author>Djurisic, AB</contributor.author>
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<subject>Anti-reflection</subject>
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Author Affiliations
  1. The University of Hong Kong
  2. Nano and Advanced Materials Institute Limited
  3. National Chiao Tung University Taiwan