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Article: Deep level transient spectroscopic study of oxygen implanted melt grown ZnO single crystal
Title | Deep level transient spectroscopic study of oxygen implanted melt grown ZnO single crystal | ||||||||
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Authors | |||||||||
Keywords | Annealing temperatures Deep level trap Intrinsic defects Melt-grown Oxygen implantation | ||||||||
Issue Date | 2011 | ||||||||
Publisher | Institute of Physics Publishing. The Journal's web site is located at http://www.iop.org/journals/sst | ||||||||
Citation | Semiconductor Science And Technology, 2011, v. 26 n. 9, article no. 095016 How to Cite? | ||||||||
Abstract | Deep level traps in melt grown ZnO single crystal created by oxygen implantation and subsequent annealing in air were studied by deep level transient spectroscopy measurement between 80 and 300 K. The E C-0.29 eV trap (E3) was the dominant peak in the as-grown sample and no new defects were created in the as-O-implanted sample. The single peak feature of the deep level transient spectroscopy (DLTS) spectra did not change with the annealing temperature up to 750 °C, but the activation energy decreased to 0.22 eV. This was explained in terms of a thermally induced defect having a peak close to but inseparable from the original 0.29 eV peak. A systematic study on a wide range of the rate window for the DLTS measurement successfully separated the Arrhenius plot data originated from different traps. It was inferred that the E3 concentration in the samples did not change after the O-implantation. The traps at E C-0.11, E C-0.16 and E C-0.58 eV were created after annealing. The E C-0.16 eV trap was assigned to an intrinsic defect. No DLTS signal was found after the sample was annealed to 1200 °C. © 2011 IOP Publishing Ltd. | ||||||||
Persistent Identifier | http://hdl.handle.net/10722/139657 | ||||||||
ISSN | 2023 Impact Factor: 1.9 2023 SCImago Journal Rankings: 0.411 | ||||||||
ISI Accession Number ID |
Funding Information: This work was supported by the GRF (7031/08P) awarded by the Research Grant Council, HKSAR; the Small Project Grant and the University Development Fund awarded by The University of Hong Kong. | ||||||||
References |
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Ye, ZR | en_HK |
dc.contributor.author | Lu, XH | en_HK |
dc.contributor.author | Ding, GW | en_HK |
dc.contributor.author | Fung, S | en_HK |
dc.contributor.author | Ling, CC | en_HK |
dc.contributor.author | Brauer, G | en_HK |
dc.contributor.author | Anwand, W | en_HK |
dc.date.accessioned | 2011-09-23T05:52:59Z | - |
dc.date.available | 2011-09-23T05:52:59Z | - |
dc.date.issued | 2011 | en_HK |
dc.identifier.citation | Semiconductor Science And Technology, 2011, v. 26 n. 9, article no. 095016 | en_HK |
dc.identifier.issn | 0268-1242 | en_HK |
dc.identifier.uri | http://hdl.handle.net/10722/139657 | - |
dc.description.abstract | Deep level traps in melt grown ZnO single crystal created by oxygen implantation and subsequent annealing in air were studied by deep level transient spectroscopy measurement between 80 and 300 K. The E C-0.29 eV trap (E3) was the dominant peak in the as-grown sample and no new defects were created in the as-O-implanted sample. The single peak feature of the deep level transient spectroscopy (DLTS) spectra did not change with the annealing temperature up to 750 °C, but the activation energy decreased to 0.22 eV. This was explained in terms of a thermally induced defect having a peak close to but inseparable from the original 0.29 eV peak. A systematic study on a wide range of the rate window for the DLTS measurement successfully separated the Arrhenius plot data originated from different traps. It was inferred that the E3 concentration in the samples did not change after the O-implantation. The traps at E C-0.11, E C-0.16 and E C-0.58 eV were created after annealing. The E C-0.16 eV trap was assigned to an intrinsic defect. No DLTS signal was found after the sample was annealed to 1200 °C. © 2011 IOP Publishing Ltd. | en_HK |
dc.language | eng | en_US |
dc.publisher | Institute of Physics Publishing. The Journal's web site is located at http://www.iop.org/journals/sst | en_HK |
dc.relation.ispartof | Semiconductor Science and Technology | en_HK |
dc.rights | Semiconductor Science and Technology. Copyright © Institute of Physics Publishing. | - |
dc.subject | Annealing temperatures | - |
dc.subject | Deep level trap | - |
dc.subject | Intrinsic defects | - |
dc.subject | Melt-grown | - |
dc.subject | Oxygen implantation | - |
dc.title | Deep level transient spectroscopic study of oxygen implanted melt grown ZnO single crystal | en_HK |
dc.type | Article | en_HK |
dc.identifier.email | Fung, S: sfung@hku.hk | en_HK |
dc.identifier.email | Ling, CC: ccling@hkucc.hku.hk | en_HK |
dc.identifier.authority | Fung, S=rp00695 | en_HK |
dc.identifier.authority | Ling, CC=rp00747 | en_HK |
dc.description.nature | postprint | - |
dc.identifier.doi | 10.1088/0268-1242/26/9/095016 | en_HK |
dc.identifier.scopus | eid_2-s2.0-80051977253 | en_HK |
dc.identifier.hkuros | 195702 | en_US |
dc.relation.references | http://www.scopus.com/mlt/select.url?eid=2-s2.0-80051977253&selection=ref&src=s&origin=recordpage | en_HK |
dc.identifier.volume | 26 | en_HK |
dc.identifier.issue | 9 | en_HK |
dc.identifier.isi | WOS:000293904400018 | - |
dc.publisher.place | United Kingdom | en_HK |
dc.identifier.scopusauthorid | Ye, ZR=49962492400 | en_HK |
dc.identifier.scopusauthorid | Lu, XH=7404840069 | en_HK |
dc.identifier.scopusauthorid | Ding, GW=49961280800 | en_HK |
dc.identifier.scopusauthorid | Fung, S=7201970040 | en_HK |
dc.identifier.scopusauthorid | Ling, CC=13310239300 | en_HK |
dc.identifier.scopusauthorid | Brauer, G=7101650540 | en_HK |
dc.identifier.scopusauthorid | Anwand, W=9432786300 | en_HK |
dc.identifier.citeulike | 9685000 | - |
dc.identifier.issnl | 0268-1242 | - |